IP Library Granted Patent US 11,909,335
Granted Patent B2
US 11,909,335 · App. 17/550,502 · Granted Feb 20, 2024

Electrostatic chuck and substrate fixing device

Inventors: Takashi Onuma (Nagano, JP); Keiichi Takemoto (Nagano, JP)
Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
H02N13/00H01L21/6831H01L21/6833H01J37/32715H01J2237/2007H01J2237/334
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,909,335
App. No.
17/550,502
Granted
Feb 20, 2024
Kind
B2
Abstract

An electrostatic chuck includes a base body having a placement surface on which a suction target object is placed, and an electrode embedded in the base body. The base body is provided with a groove that opens to the placement surface-side and does not reach the electrode. Aloes-resistance region made of ceramics and a high-resistance region made of ceramics having a volume resistivity higher than the low-resistance region are sequentially arranged from a side close to the groove between a bottom surface of the groove and the electrode, in a thickness direction of the base body.

Claims (20)

1. An electrostatic chuck comprising:

a base body having a placement surface on which a suction target object is placed;

an electrode embedded in the base body; and

a gas discharge portion,

wherein the base body is provided with a groove that opens to the placement surface-side and does not reach the electrode,

wherein a low-resistance region made of ceramics and a high-resistance region made of ceramics having a volume resistivity higher than the low-resistance region are sequentially arranged from a side close to the groove between a bottom surface of the groove and the electrode, in a thickness direction of the base body, and

wherein the gas discharge portion opens to the bottom surface of the groove, and the gas discharge portion is formed to penetrate the high-resistance region.

2. The electrostatic chuck according to claim 1 , wherein the high-resistance region is provided in a region overlapping the groove, as seen from above.

3. The electrostatic chuck according to claim 2 , wherein the groove is provided in an annular shape, as seen from above, and

wherein the high-resistance region is provided in an annular shape in the region overlapping the groove.

4. The electrostatic chuck according to claim 3 , wherein a plurality of grooves is provided in a concentric manner so as not to be in contact with each other, as seen from above,

a plurality of gas discharge portions are provided to open to the bottom surface of each of the plurality of grooves, and

wherein the high-resistance region is provided in an annular shape in a region overlapping each of the grooves, as seen from above.

5. The electrostatic chuck according to claim 1 , wherein the high-resistance region has a width greater than the groove.

6. The electrostatic chuck according to claim 1 , wherein the high-resistance region is in contact with a surface of the electrode facing toward the groove.

7. The electrostatic chuck according to claim 1 , wherein the high-resistance region is formed of aluminum oxide and has a volume resistivity of 10 15 Ωm or higher.

8. The electrostatic chuck according to claim 1 , wherein the electrostatic chuck is a Johnsen-Rahbeck type.

9. A substrate fixing device comprising:

a base plate; and

the electrostatic chuck according to claim 1 mounted on a surface of the base plate.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2021
From: ONUMA, TAKASHI; TAKEMOTO, KEIICHI
To: SHINKO ELECTRIC INDUSTRIES CO., LTD.
Reel/Frame 058388/0985 →
Priority Claims (1)
JP 2020-208364 · Dec 16, 2020 · national
Continuity (1)
Related Publication 20220190749A1 · Jun 16, 2022