Substrate treatment apparatus having exhaust structure

1. A substrate treatment apparatus comprising:

a substrate support assembly having a spin head adapted to seat a substrate thereonto;

a fluid supply unit for supplying fluid to the substrate;

a bowl assembly having a plurality of bowls overlaid one another outwardly in a radial direction thereof and surrounding the substrate support assembly;

an ascending and descending unit for moving up and down the bowl assembly; and

a chamber for accommodating the substrate support assembly, the fluid supply unit, the bowl assembly, and the ascending and descending unit,

wherein the chamber is configured to have a plurality of process exhaust parts for performing exhaust from the inside of the bowl assembly and an environment exhaust part for performing exhaust from the outside of the bowl assembly,

wherein the outer peripheral surface of the bowl assembly is surrounded by a ring-shaped first duct for communicating with the environment exhaust part,

wherein the first duct has a plurality of first introducing holes spaced apart from one another on top thereof along the periphery thereof to introduce gases of treatment liquids existing in the chamber thereinto.

2. The substrate treatment apparatus according to claim 1 , wherein the bowl assembly comprises a ring-shaped outer wall disposed adjacent to an outer bowl among the bowls downwardly and second introducing holes are formed on the outer wall and communicating with a first process exhaust part of the process exhaust parts.

3. The substrate treatment apparatus according to claim 2 , wherein the outer peripheral surface of the bowl assembly is surrounded by the ring-shaped first duct for communicating with the environment exhaust part, and a ring-shaped second duct is disposed adjacent to the first duct thereunder and communicating with the second introducing holes and the first process exhaust part.

4. The substrate treatment apparatus according to claim 1 , wherein an inner bowl among the bowls comprises a ring-shaped introducing groove formed on the outside thereof in up and down directions, a ring-shaped first compartment formed opposite to the introducing groove in a state of placing an inner wall of the introducing groove therebetween, wherein first connection holes are formed on the inner wall of the introducing groove and communicate with the first compartment, and first exhaust holes are formed on the bottom of the first compartment and communicate with a second process exhaust part of the process exhaust parts.

5. The substrate treatment apparatus according to claim 4 , wherein the first connection holes are slant upwardly from inlets thereof toward outlets thereof.

6. The substrate treatment apparatus according to claim 4 , wherein the first exhaust holes are long holes extended along the periphery of the inner bowl and spaced apart from one another.

7. The substrate treatment apparatus according to claim 4 , wherein a ring-shaped second compartment and a ring-shaped third compartment are formed adjacent to each other in up and down directions on the lower portion of the inner portion spaced apart from the first compartment, the second compartment comprises an introducing hole formed on an outer wall thereof to introduce gases exhausted from the first exhaust holes and second connection holes formed on bottom thereof and communicating with the third compartment, and the third compartment comprises a second exhaust hole communicating with the second process exhaust part.

8. The substrate treatment apparatus according to claim 7 , wherein the bowl assembly has the inner bowl, the intermediate bowl, and the outer bowl, a ring-shaped intermediate wall is formed extended downwardly from the intermediate bowl to separate the first process exhaust part and the second process exhaust part from each other, and a passage between the inner bowl and the intermediate bowl communicates with the first exhaust holes, the second exhaust hole and the second process exhaust part, sequentially.