Method for producing silicon carbide semiconductor device and silicon carbide semiconductor device

1. A method for producing a silicon carbide semiconductor device, the method comprising:

preparing a silicon carbide substrate;

forming an insulating film on one main surface of the silicon carbide substrate;

forming a contact hole in the insulating film and exposing the one main surface of the silicon carbide substrate at a bottom surface of the contact hole;

forming an Si film on the bottom surface of the contact hole;

forming an Ni film on the Si film;

performing a first heat treatment at a first temperature at which Ni and Si react, after the forming of the Ni film;

removing an unreacted portion of the Ni film that does not react with the Si film, by wet etching after the first heat treatment; and

performing a second heat treatment at a second temperature higher than the first temperature after the removing of the unreacted portion.

2. The method as claimed in claim 1 ,

wherein the forming of the Si film on the bottom surface of the contact hole includes:

forming a first Si film on the bottom surface and side surfaces of the contact hole and on an upper surface of the insulating film; and

removing at least the first Si film on the upper surface of the insulating film by dry etching after the forming of the first Si film.

3. The method as claimed in claim 1 ,

wherein the first temperature is greater than or equal to 200° C. and less than or equal to 400° C.

4. The method as claimed in claim 1 , wherein the second temperature is greater than or equal to 800° C. and less than or equal to 1100° C.

5. The method as claimed in claim 1 , wherein a film thickness of the Si film at the bottom surface of the contact hole is greater than or equal to 5 nm and less than or equal to 100 nm.

6. The method as claimed in claim 1 , wherein a film thickness of the Ni film at the bottom surface of the contact hole is greater than or equal to 5 nm and less than or equal to 100 nm.

7. The method as claimed in claim 1 , wherein the Si film is also formed on side surfaces of the contact hole.

8. The method as claimed in claim 1 , wherein a relationship of N Ni ≥N Si /2 is established when, at the bottom surface of the contact hole in a state in which the Ni film is formed on the Si film, a number of Si atoms contained in the Si film per unit area that is accumulated in a thickness direction is N Si , and a number of Ni atoms contained in the Ni film per unit area that is accumulated in the thickness direction is N Ni .

9. A silicon carbide semiconductor device comprising:

a silicon carbide substrate having a main surface;

an insulating film provided on the main surface of the silicon carbide substrate;

a contact hole provided in the insulating film;

a first electrode provided on a portion of a bottom surface of the contact hole, the first electrode being in contact with the silicon carbide substrate; and

second electrodes provided on side surfaces of the contact hole, the second electrodes being provided apart from the first electrode,

wherein the first electrode contains Si and Ni, and is in ohmic contact with the silicon carbide substrate, and

wherein the first electrode is not in direct contact with the second electrodes.

10. The silicon carbide semiconductor device as claimed in claim 9 , wherein a distance between the first electrode and each of the second electrodes at the bottom surface of the contact hole is greater than or equal to 0.1 μm and less than or equal to 1 μm.

11. The silicon carbide semiconductor device as claimed in claim 9 , wherein the first electrode is arranged so as to be between the second electrodes with a gap therebetween.