Method for patterning a substrate using photolithography
A method for patterning a substrate includes: forming a first photoresist etch mask with an extreme ultraviolet (EUV) lithography process, the first photoresist etch mask including first through openings, the first photoresist etch mask including a metal-based photoresist material; forming a second photoresist etch mask over the first photoresist etch mask, the second photoresist etch mask including second through openings; and forming first openings, through the first and the second photoresist etch masks, in a region of the substrate that vertically overlaps both the first through openings and the second through openings.
1. A method for patterning a substrate, the method comprising:
forming a first photoresist etch mask with an extreme ultraviolet (EUV) lithography process, the first photoresist etch mask comprising first through openings, the first photoresist etch mask comprising a metal-based photoresist material;
forming a second photoresist etch mask over the first photoresist etch mask, the second photoresist etch mask comprising second through openings; and
forming first openings, through the first and the second photoresist etch masks, in a region of the substrate that vertically overlaps both the first through openings and the second through openings.
2. The method of claim 1 , wherein forming the second photoresist etch mask comprises:
forming a major surface of the substrate with a second photoresist layer, the second photoresist layer comprising a metal-based photoresist material; and
exposing the second photoresist layer to a pattern of EUV radiation and developing the exposed second photoresist layer.
3. The method of claim 1 , further comprising:
forming an intermediate layer after forming the first photoresist etch mask, the second photoresist etch mask being formed over the intermediate layer.
4. The method of claim 3 , wherein forming the intermediate layer comprises:
forming a planarizing layer, the second photoresist etch mask being formed over the planarizing layer.
5. The method of claim 3 , wherein forming the intermediate layer comprises:
forming an underlayer, the second photoresist etch mask being formed over the underlayer.
6. The method of claim 3 , further comprising:
after forming the first openings, removing the second photoresist etch mask and the intermediate layer; and
after removing the second photoresist etch mask and the intermediate layer, forming second openings in a region of the substrate exposed by the first photoresist etch mask.
7. The method of claim 6 ,
wherein the substrate comprises an interlayer dielectric (ILD) layer disposed over a conductive layer;
wherein forming the first openings in the substrate comprises forming a plurality of holes extending through the ILD layer, each of the plurality of holes exposing a portion of a surface of the conductive layer; and
wherein forming the second openings in the substrate comprises forming trenches in the ILD layer, the trenches having a bottom surface formed at a depth less than a thickness of the ILD layer.
8. The method of claim 7 , further comprising:
filling the plurality of holes and the trenches with conductive material, the filling forming an interconnect level in the ILD layer, the interconnect level being a lateral network of conductive lines connected by conductive vias to another vertically adjacent interconnect level.
9. The method of claim 1 , further comprising:
removing the first and the second photoresist etch masks after forming the first openings.
10. The method of claim 1 ,
wherein the substrate comprises a dielectric layer disposed over a conductive layer, and
wherein forming the first openings in the substrate comprises forming a plurality of holes extending through the dielectric layer, each of the plurality of holes exposing a portion of a surface of the conductive layer.
11. The method of claim 1 ,
wherein the metal-based photoresist comprises a metal oxide nanoparticle, the metal comprising hafnium, zirconium, titanium, tin, zinc, indium, or aluminum.
12. The method of claim 1 ,
wherein the metal-based photoresist comprises a tin-oxo nanocluster, OR
wherein the metal-based photoresist comprises an organometallic complex, the metal being antimony, tin, bismuth, tellurium, platinum, palladium, cobalt, iron, or chromium.
13. The method of claim 1 , wherein the second photoresist etch mask comprises a photoresist material.
14. A method for patterning an unpatterned metal layer of a substrate, the method comprising:
forming a first photoresist layer over the unpatterned metal layer, the first photoresist layer comprising a first metal-based photoresist material disposed over the unpatterned metal layer;
forming a first metal-based hard mask directly from the first photoresist layer by exposing the first photoresist layer to a pattern of extreme ultraviolet (EUV) radiation and developing the exposed first photoresist layer;
after forming a first metal-based hard mask, etching the unpatterned metal layer by exposing the substrate to an etchant, the etching selectively removing a portion of the unpatterned metal layer that is exposed to the etchant; and
prior to etching the unpatterned metal layer,
forming a second photoresist layer over the first metal-based hard mask, the second photoresist layer comprising a second metal-based photoresist material, and
forming a second metal-based hard mask directly from the second photoresist layer by exposing the second photoresist layer to a pattern of EUV radiation and developing the exposed second photoresist layer.
15. The method of claim 14 , further comprising:
prior to forming the first photoresist layer over the unpatterned metal layer, forming a thin adhesion layer over the unpatterned metal layer.
16. The method of claim 15 ,
wherein the thin adhesion layer comprises silicon, silicon nitride, titanium nitride or tantalum nitride, and
wherein a thickness of the thin adhesion layer is greater than or equal to 0.5 nm and less than or equal to 5 nm.
17. The method of claim 14 , further comprising:
prior to forming the second photoresist layer over the first metal-based hard mask, performing a surface treatment, the surface treatment chemically modifying the surface to increase an etch resistance of the first metal-based hard mask to a developer used subsequently for developing the exposed second photoresist layer.
18. The method of claim 14 , wherein the unpatterned metal layer comprises ruthenium or molybdenum, wherein the first metal-based photoresist material comprises a tin-oxo nanocluster, and wherein the second metal-based photoresist material comprises a tin-oxo nanocluster.
19. A method for patterning a layer-to-be-patterned in a substrate, the method comprising:
forming, using an extreme ultraviolet (EUV) lithography process, a patterned bilayer hard mask comprising a metal layer, a first metal-based photoresist layer over the metal layer, and an adhesion layer being formed adjacent below the first metal-based photoresist layer, the bilayer hard mask being formed over the layer-to-be-patterned; and
etching the layer-to-be-patterned by exposing the substrate to an etchant, the etching selectively removing a portion of the layer-to-be-patterned that is exposed to the etchant.
20. The method of claim 19 , further comprising:
prior to etching the layer-to-be-patterned, forming an intermediate layer over the patterned bilayer hard mask; and
forming a second metal-based hard mask over the intermediate layer, wherein forming the second metal-based hard mask comprises:
forming a second photoresist layer over the intermediate layer, the second photoresist layer comprising a second metal-based photoresist material; and
exposing the second photoresist layer to a pattern of EUV radiation and developing the exposed second photoresist layer.