IP Library › Granted Patent US 11,530,480
Granted Patent B2
US 11,530,480 · App. 17/666,881 · Granted Dec 20, 2022

Injector for batch processing and methods of use

Inventors: Joseph Yudovsky (Campbell, CA); Kevin Griffin (Livermore, CA); Mandyam Sriram (San Jose, CA)
Assignee: Applied Materials, Inc.
C23C16/45502C23C16/45546C23C16/45563
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Quick Facts
Patent No.
US 11,530,480
App. No.
17/666,881
Granted
Dec 20, 2022
Kind
B2
Abstract

Apparatus and methods for processing a substrate including an injector unit, comprising a leading reactive gas port extending along a length of the injector unit, a trailing reactive gas port extending along the length of the injector unit, and a merge vacuum port forming a boundary around and enclosing the leading reactive gas port and the trailing reactive gas port.

Claims (17)

1. A processing method comprising:

laterally moving a substrate surface through a gas curtain to a mixed region of a processing chamber; and

exposing at least a portion of the substrate surface a mixed process region enclosed within a merge vacuum port of an injector unit, the mixed process region comprising a leading reactive gas from a leading reactive gas port, a trailing reactive gas same as the leading reactive gas from a trailing reactive gas port, and an intermediate reactive gas different from the first reactive gas and second reactive gas from at least one intermediate gas port positioned in the mixing zone between the leading reactive gas port and the trailing reactive gas port, the at least one intermediate gas port occupying in the range of about 10% to about 60% of an area of the mixed process region,

wherein a combination of the reactive gas ports within the merge vacuum port occupy greater than or equal to about 50% of the area enclosed within the merge vacuum port.

2. The processing method of claim 1 , wherein the merge vacuum port acts as a boundary that allows gases from the leading reactive gas port and the trailing reactive gas port to mix within the boundary while preventing the gases from diffusing out of the boundary.

3. The processing method of claim 1 , wherein the injector unit has a leading edge and a trailing edge defining a width of the injector unit and an inner peripheral edge and an outer peripheral edge connecting the leading edge and trailing edge and defining a length of the injector unit.

4. The processing method of claim 3 , wherein the injector unit forms a portion of a circle so that the leading edge and trailing edge form an angle in the range of about 60° to about 120°.

5. The processing method of claim 1 , wherein one or more of the leading reactive gas or the trailing reactive gas comprise a plasma from at least one remote plasma source connected to one or more of the leading reactive gas port or the trailing reactive gas port.

6. The processing method of claim 1 , further comprising a leading remote plasma source connected to the leading reactive gas port and a trailing remote plasma source connected to the trailing reactive gas port.

7. The processing method of claim 1 , further comprising a purge gas port adjacent one side of the merge vacuum port.

8. The processing method of claim 1 , wherein the at least one intermediate gas port is in fluid communication with one of the leading reactive gas port and the trailing reactive gas port.

9. The processing method of claim 1 , wherein the at least one intermediate gas port is in fluid communication with a different gas than the leading reactive gas port and the trailing reactive gas port.

10. The processing method of claim 1 , further comprising:

exposing at least a portion of the substrate surface to a first reactive gas from a first reactive gas port surrounded by a first vacuum port in a first region of the processing chamber;

laterally moving the substrate surface through a gas curtain to a second region of the processing chamber; and

exposing at least a portion of the substrate surface to a second reactive gas from a second reactive gas from a second reactive gas port surrounded by a second vacuum port in the second region of the processing chamber.

11. The processing method of claim 10 , wherein the substrate surface is moved in a circular motion adjacent a circular gas distribution assembly having an inner peripheral edge and an outer peripheral edge, the gas distribution assembly comprising two first injector units and two second injector units arranged so that the first injector unit and second injector unit alternate, each first injector unit comprising a first reactive gas port extending along a length of the first injector unit, a first vacuum port surrounding the first reactive gas port, a first purge gas port adjacent a side of the first vacuum port, a second reactive gas port extending along a length of the first injector unit and a second vacuum port surrounding the second reactive gas port, each second injector unit comprising the mixed process region within the merge vacuum port of claim 1 .

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 17, 2022
From: YUDOVSKY, JOSEPH; GRIFFIN, KEVIN; SRIRAM, MANDYAM
To: APPLIED MATERIALS, INC.
Reel/Frame 059033/0163 →
Continuity (3)
Division 15184617 · Jun 16, 2016
Provisional Application 62182359 · Jun 19, 2015
Related Publication 20220162748A1 · May 26, 2022
Cited By (2)
US 1,148,718 US 12,635,475