IP Library › Granted Patent US 12,283,615
Granted Patent B2
US 12,283,615 · App. 17/669,309 · Granted Apr 22, 2025

Semiconductor device with multiple electrodes and an insulation film

Inventors: Hiroki Hatada (Kanazawa Ishikawa, JP); Kohei Oasa (Setagaya Tokyo, JP)
Assignees: Kabushiki Kaisha Toshiba; Toshiba Electronic Devices & Storage Corporation
H01L29/41775H01L29/0696H01L29/404H01L29/407H01L29/66734H01L29/7813
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,283,615
App. No.
17/669,309
Granted
Apr 22, 2025
Kind
B2
Abstract

A semiconductor device includes: a second electrode, located in a semiconductor part, extending in a first direction; a third electrode, located in the semiconductor part, including a first portion, a second portion, and a first middle portion positioned below the second electrode between the first portion and the second portion, the second electrode being located between the first portion and the second portion in the first direction; a fourth electrode, located above the semiconductor part, including a pad portion separated from the second electrode and the second portion in a second direction, and a protrusion protruding from the pad portion and covering the second electrode and being connected to the second electrode; and a fifth electrode, located above the semiconductor part, including a first covering portion being connected to the first contact portion and a second covering portion being connected to the first portion.

Claims (39)

1. A semiconductor device, comprising:

a first electrode;

a semiconductor part located on the first electrode;

a second electrode located in the semiconductor part, the second electrode extending in a first direction when viewed from above;

a third electrode located in the semiconductor part, the third electrode extending in the first direction, the third electrode including a first portion, a second portion, and a first middle portion positioned below the second electrode between the first portion and the second portion, the second electrode being located between the first portion and the second portion in the first direction;

a fourth electrode located above the semiconductor part, the fourth electrode including

a pad portion separated from the second electrode and the second portion in a second direction crossing the first direction when viewed from above, and

a protrusion protruding from the pad portion and covering the second electrode, the protrusion being connected to the second electrode;

a fifth electrode located above the semiconductor part and separated from the fourth electrode, the fifth electrode including

a first covering portion covering a first contact portion of the semiconductor part adjacent to the second portion when viewed from above, the first covering portion being connected to the first contact portion, and

a second covering portion covering the first portion, the second covering portion being connected to the first portion; and

a first insulating film located between the semiconductor part and the second electrode, between the semiconductor part and the third electrode, and between the second electrode and the third electrode;

wherein the pad portion includes an end portion in a direction from the second portion toward the first portion, and the protrusion protrudes from the end portion of the pad portion.

2. The device according to claim 1 , wherein

the first covering portion also covers the second portion, and

the first covering portion also is connected to the second portion.

3. The device according to claim 1 , wherein

a recess is provided in the fifth electrode, the recess is positioned between the first covering portion and the second covering portion, and

the protrusion is located in the recess.

4. The device according to claim 1 , further comprising:

a sixth electrode located in the semiconductor part, the sixth electrode being next to the second electrode in the second direction, the sixth electrode extending in the first direction; and

a seventh electrode located in the semiconductor part, the seventh electrode extending in the first direction, the seventh electrode including a third portion, a fourth portion, and a second middle portion positioned below the sixth electrode between the third portion and the fourth portion, the sixth electrode being located between the third portion and the fourth portion in the first direction; and

a second insulating film located between the semiconductor part and the sixth electrode, between the semiconductor part and the seventh electrode, and between the sixth electrode and the seventh electrode,

the protrusion covering the sixth electrode when viewed from above,

the protrusion being connected to the sixth electrode,

the third portion being next to the first portion in the second direction,

the second covering portion also covering the third portion when viewed from above,

the second covering portion also being connected to the third portion.

5. The device according to claim 4 , wherein

the second covering portion also covers a second contact portion of the semiconductor part positioned between the second electrode and the sixth electrode when viewed from above, and

the second covering portion also is connected to the second contact portion.

6. The device according to claim 5 , wherein the semiconductor part includes:

a first semiconductor layer of a first conductivity type;

a second semiconductor layer located in an upper layer portion of the first semiconductor layer, the second semiconductor layer being next to the second electrode with the first insulating film interposed, the second semiconductor layer being of a second conductivity type; and

a third semiconductor layer located in an upper layer portion of the second semiconductor layer, the third semiconductor layer being of the first conductivity type,

the third semiconductor layer being located in the second contact portion.

7. The device according to claim 6 , wherein

the third semiconductor layer also is located under the first covering portion, and

the first covering portion also is connected to the third semiconductor layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 28, 2024
From: HATADA, HIROKI; OASA, KOHEI
To: KABUSHIKI KAISHA TOSHIBA; TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
Reel/Frame 066585/0973 →
Priority Claims (1)
JP 2021-150214 · Sep 15, 2021 · national
Continuity (1)
Related Publication 20230085094A1 · Mar 16, 2023
References Cited (11)
US 8431998B2 · Miyata · 2013 [cited by applicant]
US 20100123220A1 · Burke et al. · 2010 [cited by applicant]
US 20100140695A1 · Yedinak et al. · 2010 [cited by applicant]
US 20120326207A1 · Yoshimochi · 2012 [cited by applicant]
US 20190081173A1 · Nishiwaki et al. · 2019 [cited by applicant]
US 20210057573A1 · Shimomura · 2021 [cited by applicant]
US 20220037523A1 · Oda · 2022 [cited by examiner]
JP 2002203964A · 2002 [cited by applicant]
JP 2010177454A · 2010 [cited by applicant]
JP 2013033931A · 2013 [cited by applicant]
JP 2019054071A · 2019 [cited by applicant]