Method and system for in-line optical scatterometry
A system for measuring a periodic array of structures on a sample is provided. The system includes an optical source configured to produce an optical beam; an optical system configured to control the polarization of the optical beam and to focus the optical beam with a first NA 1 on a sample surface and to sweep the angle of incidence across a range of angles with an approximately fixed focal position on a sample surface with a second NA 2 wherein NA 2 >NA 1 ; additional optical components configured to receive the optical beam reflected from the sample surface and to focus the reflected beam onto a detector; and a recording system to record the reflectivity of the sample surface as a function of the angle of incidence. In an embodiment, the optical system provides a spot on the sample such that both the angle of incidence and the position on the sample are varied during a sweep. Electronic filtering is provided to separate low frequency signals, corresponding to structural details of the sample, and high frequency signatures, corresponding to localized defects on the sample.
1. A method for 2θ scatterometry defect detection comprising:
providing a beam from a laser light source;
providing collimation and polarization control optics for the beam from the laser light source;
providing a first optical system configured to project the beam from the laser light source onto a surface of a sample with a dynamically continuous variable angle of incidence and dynamically variable position;
defocusing the beam at the surface of the sample by the first optical system, wherein the beam that is defocused provides a laser spot on the sample that scans across the sample with the dynamically continuous variable angle of incidence;
providing a second optical system configured to collect reflected light from the sample and project the reflected light onto an optical detector;
recording the reflected light that is collected by the second optical system; and
analyzing the reflected light that is recorded by a signal analyzer to provide for signal analysis and signal averaging and that provides a scatterometry measurement of local dimensions of a structure of the sample.
2. The method of claim 1 , further comprising projecting a focus of the beam from the laser light source onto the sample by the first optical system.
3. The method of claim 1 , wherein the signal analyzer comprises frequency selective circuitry to separately record first frequency variations of a reflectivity signal that correspond to a scatterometry signature sensitive to dimensions of the structure on the surface and second frequency variations of the reflectivity signal that correspond to defects in the structure on the surface, wherein a spectral range of the first frequency variations is lower than a spectral range of the second frequency variations.
4. The method of claim 1 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59°.
5. The method of claim 1 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59° and a position scan is across a distance of approximately 500 micrometers.
6. A method for 2θ scatterometry defect detection comprising:
collimating, using one or more collimating optical elements, a beam from a laser light source to produce a collimated beam;
polarizing, using one or more polarizing optical element, the collimated beam to produce a polarized and collimated beam;
directing the polarized and collimated beam, by a first optical system, onto a surface of a sample with a dynamically continuous variable angle of incidence and dynamically variable position;
defocusing the beam at the surface of the sample by the first optical system, wherein the beam that is defocused provides a laser spot on the sample that scans across the with the dynamically continuous variable angle of incidence;
collecting, by a second optical system, reflected light from the sample;
projecting the reflected light onto an optical detector;
recording the reflected light that is collected by the second optical system; and
analyzing the reflected light that is recorded by a signal analyzer to provide for signal analysis and signal averaging and that provides a scatterometry measurement of local dimensions of a structure of the sample.
7. The method of claim 6 , further comprising projecting a focus of the beam from the laser light source onto the sample by the first optical system.
8. The method of claim 6 , wherein the signal analyzer comprises frequency selective circuitry to separately record first frequency variations of a reflectivity signal that correspond to a scatterometry signature sensitive to dimensions of the structure on the surface and second frequency variations of the reflectivity signal that correspond to defects in the structure of the surface, wherein a spectral range of the first frequency variations is lower than a spectral range of the second frequency variations.
9. The method of claim 6 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59°.
10. The method of claim 6 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59° and a position scan is across a distance of approximately 500 mm.
11. A system for 2θ scatterometry defect detection comprising:
a laser light source that produces a beam;
one or more control optics that produce a collimated and polarized beam;
a first optical system that projects the collimated and polarized beam from the laser light source onto a surface of a sample with a dynamically continuous variable angle of incidence and dynamically variable position, wherein the one or more control optics defocuses the collimated and polarized beam at the surface of the sample by the first optical system, wherein the beam that is defocused provides a laser spot on the sample that scans across the sample with the dynamically continuous variable angle of incidence;
a second optical system that collects reflected light from the sample and projects the reflected light onto an optical detector;
a signal recorder that records the reflected light that is collected by the second optical system; and
a signal analyzer that analyzes the reflected light that is recorded to provide for signal analysis and signal averaging and that provides a scatterometry measurement of local dimensions of a structure of the sample.
12. The system of claim 11 , wherein the one or more control optics projects a focus of the collimated and polarized beam from the laser light source onto the sample by the first optical system.
13. The system of claim 11 , wherein the signal analyzer comprises frequency selective circuitry to separately record first frequency variations of a reflectivity signal that correspond to a scatterometry signature and dimensions of the structure of the surface and second frequency variations of the reflectivity signal that correspond to defects in the structure of the surface, wherein a spectral range of the first frequency variations is lower than a spectral range of the second frequency variations.
14. The system of claim 11 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59°.
15. The system of claim 11 , wherein an angular scan performed by the first optical system is from approximately 29° to approximately 59° and a position scan is across a distance of approximately 500 mm.