IP Library › Granted Patent US 12,676,593
Granted Patent B2
US 12,676,593 · App. 17/753,428 · Granted Jul 7, 2026

Transducer structure for an acoustic wave device

Inventors: Sylvain Ballandras (Besançon, FR); Emilie Courjon (Besançon, FR); Florent Bernard (Besançon, FR)
Assignee: Soitec
H03H9/145H03H3/02H03H9/02031H03H9/0207H03H9/02102H03H9/02149H03H9/02228H03H9/02559H03H9/132H03H9/175H03H9/176H03H9/25
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Quick Facts
Patent No.
US 12,676,593
App. No.
17/753,428
Filed
Mar 2, 2022
Granted
Jul 7, 2026
Kind
B2
Art Unit
2837
USPC
310/313B
Abstract

A transducer structure for a surface acoustic device comprises a composite substrate comprising a piezoelectric layer, a pair of inter-digitated comb electrodes, comprising a plurality of electrode means with a pitch p satisfying the Bragg condition, wherein the inter-digitated comb electrodes are embedded in the piezoelectric layer such that, in use, the excitation of a wave propagating mode in the volume of the electrode means is taking place and is the predominant propagating mode of the structure. The present disclosure relates also to an acoustic wave device comprising at least one transducer structure as described above and to a method for fabricating the transducer structure. The present disclosure relates also to the use of the frequency of the bulk wave propagating in the electrode means of the transducer structure in an acoustic wave device to generate contribution at high frequency, in particular, above 3 GHz.

Claims (52)

1 . A transducer structure for an acoustic device, comprising:

a base substrate;

a piezoelectric layer disposed over the base substrate;

a trap rich layer between the piezoelectric layer and the base substrate;

a pair of inter-digitated comb electrodes, comprising a plurality of electrode means with a pitch p;

wherein the electrode means of the inter-digitated comb electrodes are embedded in the piezoelectric layer, and the acoustic impedance of the electrode means is less than the acoustic impedance of the piezoelectric layer.

2 . The transducer structure according to claim 1 , wherein the pitch p satisfies the Bragg condition given by p=λ/2, λ being the operating acoustic wavelength of the transducer.

3 . The transducer structure according to claim 1 , wherein the aspect ratio a/p, with “a” the width and “p” the pitch of the electrode means, is between 0.3 and 0.75.

4 . The transducer structure according to claim 1 , further comprising an attachment layer between the piezoelectric layer and the base substrate.

5 . The transducer structure according to claim 4 , further comprising a high velocity layer between the piezoelectric layer and the base substrate, wherein the high velocity layer is made of a material allowing a higher phase velocity of a shear wave than the material and crystal orientation of the piezoelectric layer.

6 . The transducer structure according to claim 5 , wherein the high velocity layer is positioned between the attachment layer and the base substrate.

7 . The transducer structure according to claim 6 , wherein the trap-rich layer is positioned between the high velocity layer and the base substrate.

8 . The transducer structure according to claim 1 , further comprising a covering layer on top of the embedded electrode means and the piezoelectric layer.

9 . The transducer structure according to claim 8 , wherein the covering layer is made of a material and/or having a crystal orientation allowing a higher phase velocity of a shear wave than the material and/or crystal orientation of the piezoelectric layer.

10 . The transducer structure according to claim 1 , further comprising a Bragg mirror underneath the piezoelectric layer and/or the electrode means.

11 . The transducer structure according to claim 1 , wherein the thickness of the embedded electrode means is less than or equal to the thickness of the piezoelectric layer.

12 . The transducer structure according to claim 11 , wherein the thickness t e of the electrode means satisfies λ>t e >0.1*λ.

13 . The transducer structure according to claim 1 , wherein the acoustic impedance of the base substrate is of the order of the acoustic impedance of the piezoelectric layer.

14 . The transducer structure according to claim 1 , wherein the embedded electrodes means are filled into grooves in the piezoelectric layer.

15 . The transducer structure according to claim 14 , wherein the grooves have a cross-section with a pyramidal shape or a trapezoidal shape or a V-shape or a U-shape, and/or wherein the sidewalls and/or the bottom of the grooves have a convex or concave or scalloped shape.

16 . The transducer structure according to claim 14 , wherein a dielectric layer is provided on the bottom of the grooves.

17 . The transducer structure according to claim 16 , wherein the dielectric material is a material with a higher shear wave phase velocity than the conductive material.

18 . The transducer structure according to claim 16 , wherein the dielectric material has a temperature coefficient frequency with a sign opposite to the temperature coefficient frequency of the conductive material.

19 . The transducer structure according to claim 16 , further comprising a covering layer on top of the embedded electrode means and the piezoelectric layer, and wherein a dielectric material of the covering layer and the dielectric material filled in the grooves is the same.

20 . The transducer structure according to claim 1 , wherein the electrode means is made of a material that is lighter than manganese.

21 . The transducer structure according to claim 1 , wherein the piezoelectric layer is Lithium Tantalate or Lithium Niobate.

22 . The transducer structure according to claim 1 , wherein the base substrate is one of silica, quartz, fused quartz or glass or LiTaO 3 or LiNbO 3 or silicon.

23 . The transducer structure according to claim 5 , wherein the high velocity layer is one of AlN, Al 2 O 3 , Si 3 N 4 , SiC or carbon based.

24 . The transducer structure according to claim 8 , wherein the covering layer is one of AlN, Al 2 O 3 , Si 3 N 4 , SiC or carbon based.

25 . The transducer structure according to claim 16 , wherein the dielectric material is carbon based, or AlN or SiO 2 .

26 . The transducer structure according to claim 1 , wherein the pair of inter-digitated comb electrodes comprises one region or more regions in which two or more neighboring electrode means belong to the same comb electrode while having the same distance to each other as the neighboring electrode means belonging to different comb electrodes.

27 . The transducer structure according to claim 26 , wherein the two or more neighboring electrode means belonging to the same comb electrode have the same geometry as the neighboring electrode means belonging to different comb electrodes.

28 . The transducer structure according to claim 1 , wherein the electrode means have dimensions that are realizable by I-line lithography.

29 . An acoustic wave device comprising at least one transducer structure according to claim 1 , wherein the device is an acoustic wave resonator, and/or an acoustic wave filter, and/or an acoustic wave sensor, and/or a frequency source.

30 . The acoustic wave device according to claim 29 , further comprising a radio frequency (RF) supply means configured to drive the transducer structure with an RF signal above 3 GHZ.

31 . A method of using a transducer structure according to claim 1 , comprising a step of applying an alternating potential to the two inter-digitated comb electrodes to excite a shear mode that has a larger vibration amplitude in the electrode means compared to the piezoelectric layer and having an equivalent velocity higher than the fundamental shear wave mode of the piezoelectric layer.

32 . The method according to claim 31 , wherein the shear mode is predominantly occurring within the electrode means compared to the piezoelectric layer.

33 . A method of using a transducer structure according to claim 1 , comprising a step of applying an alternating potential to the two inter-digitated comb electrodes to excite a shear mode in the electrode means with a pair number of neutral lines without exhibiting shear movement inside the electrode and having an equivalent velocity higher than the fundamental shear wave mode of the piezoelectric layer.

34 . The method according to claim 31 , wherein the transducer structure is part of a filter, or a resonator, or a delay line, or a sensor.

35 . The method according to claim 26 , wherein the filter is used at a frequency higher than 3 GHz.

36 . A transducer structure for an acoustic device, comprising:

a piezoelectric layer;

a pair of inter-digitated comb electrodes, comprising a plurality of electrode means with a pitch p;

wherein the electrode means of the inter-digitated comb electrodes are embedded in the piezoelectric layer, and the acoustic impedance of the electrode means is less than the acoustic impedance of the piezoelectric layer;

wherein the embedded electrodes means are filled into grooves in the piezoelectric layer; and wherein the sidewalls and bottom walls of the grooves are covered with a conductive material and the remainder of the grooves are filled with a dielectric material.

37 . A transducer structure for an acoustic device, comprising:

a piezoelectric layer;

a pair of inter-digitated comb electrodes, comprising a plurality of electrode means with a pitch p;

wherein the electrode means of the inter-digitated comb electrodes are embedded in the piezoelectric layer, and the acoustic impedance of the electrode means is less than the acoustic impedance of the piezoelectric layer;

wherein the embedded electrodes means are filled into grooves in the piezoelectric layer;

wherein the grooves extend through the piezoelectric layer and the sidewalls of the grooves are covered by a conductive material and the remainder of the grooves is filled with a dielectric material.

38 . The transducer structure according to claim 37 , wherein only the sidewalls toward the piezoelectric layer are covered by the conductive material.

Assignments (5)
CORRECTIVE ASSIGNMENT TO CORRECT THE RECEIVING PARTY DATA PREVIOUSLY RECORDED AT REEL: 063752 FRAME: 0962. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER. Recorded Jun 2, 2023
From: FREC'N'SYS
To: SOITEC
Reel/Frame 063844/0750 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ADDRESS OF ASSIGNEE PREVIOUSLY RECORDED AT REEL: 063749 FRAME: 0796. ASSIGNOR(S) HEREBY CONFIRMS THE MERGER . Recorded Jun 2, 2023
From: FREC'N'SYS
To: SOITEC
Reel/Frame 064219/0104 →
MERGER Recorded May 24, 2023
From: FREC'N'SYS
To: SOITEC
Reel/Frame 063749/0796 →
MERGER Recorded May 24, 2023
From: FREC'N'SYS
To: SOITEC
Reel/Frame 063752/0962 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2022
From: BALLANDRAS, SYLVAIN; COURJON, EMILIE; BERNARD, FLORENT
To: FREC'N'SYS
Reel/Frame 059489/0879 →
Priority Claims (2)
EP 19306123 · Sep 18, 2019 · regional
EP 19306124 · Sep 18, 2019 · regional
Continuity (1)
Related Publication 20220337220A1 · Oct 20, 2022
References Cited (87)
US 20020153969A1 · Inoue et al. · 2002 [cited by applicant]
US 20030011280A1 · Nakahata et al. · 2003 [cited by applicant]
US 20070090895A1 · Nishizawa · 2007 [cited by examiner]
US 20110037343A1 · Isobe · 2011 [cited by examiner]
US 20110199168A1 · Kadota · 2011 [cited by applicant]
US 20120133246A1 · Yaoi · 2012 [cited by examiner]
US 20130015744A1 · Adkisson et al. · 2013 [cited by applicant]
US 20130285768A1 · Watanabe et al. · 2013 [cited by applicant]
US 20140203893A1 · Kando et al. · 2014 [cited by applicant]
US 20170063332A1 · Gilbert et al. · 2017 [cited by applicant]
US 20170214387A1 · Burak et al. · 2017 [cited by applicant]
US 20170236991A1 · Nakagawa · 2017 [cited by applicant]
US 20170288629A1 · Bhattacharjee · 2017 [cited by examiner]
US 20180375491A1 · Iwaki et al. · 2018 [cited by applicant]
US 20190097604A1 · Saji · 2019 [cited by examiner]
US 20190319603A1 · Kadota et al. · 2019 [cited by applicant]
US 20200036357A1 · Mimura · 2020 [cited by applicant]
US 20200186119A1 · Yamamoto et al. · 2020 [cited by applicant]
US 20200212884A1 · Shin et al. · 2020 [cited by applicant]
US 20200280302A1 · Miyamoto · 2020 [cited by applicant]
US 20200403604A1 · Tani · 2020 [cited by applicant]
US 20210226602A1 · Kishida et al. · 2021 [cited by applicant]
US 20220362162A1 · Gao et al. · 2022 [cited by applicant]
CN 103368522A · 2013 [cited by applicant]
CN 106575637A · 2017 [cited by applicant]
DE 112017005984 · 2019 [cited by applicant]
JP H04207618A · 1992 [cited by applicant]
JP 09083030A · 1997 [cited by applicant]
JP 9167935A · 1997 [cited by applicant]
JP 09214285A · 1997 [cited by applicant]
JP 11266138A · 1999 [cited by applicant]
JP 2000315931A · 2000 [cited by applicant]
JP 2002057549A · 2002 [cited by applicant]
JP 2002111442A · 2002 [cited by applicant]
JP 2002319842A · 2002 [cited by applicant]
JP 2002353769A · 2002 [cited by applicant]
JP 2003152487A · 2003 [cited by applicant]
JP 2003163575A · 2003 [cited by applicant]
JP 2007060412A · 2007 [cited by applicant]
JP 2008294538A · 2008 [cited by applicant]
JP 2010068503A · 2010 [cited by applicant]
JP 2012105252A · 2012 [cited by applicant]
JP 2013520830A · 2013 [cited by applicant]
JP 2014192676A · 2014 [cited by applicant]
JP 2017532758A · 2017 [cited by applicant]
JP 2017228945A · 2017 [cited by applicant]
JP 2018506930A · 2018 [cited by applicant]
JP 2018098671A · 2018 [cited by applicant]
JP 2019062350A · 2019 [cited by applicant]
JP 2019062441A · 2019 [cited by applicant]
JP 2019075704A · 2019 [cited by applicant]
JP 2019077607A · 2019 [cited by applicant]
JP 2019097145A · 2019 [cited by applicant]
JP 2019140456A · 2019 [cited by applicant]
JP 2019526194A · 2019 [cited by applicant]
JP 2022510170A · 2022 [cited by applicant]
KR 1020170038819A · 2017 [cited by applicant]
WO 2010058570A1 · 2010 [cited by applicant]
WO 2011018913A1 · 2011 [cited by applicant]
WO 2012036178A1 · 2012 [cited by applicant]
WO 2012086441A1 · 2012 [cited by applicant]
WO 2014054580A1 · 2014 [cited by applicant]
WO 2017043427A1 · 2017 [cited by applicant]
WO 2018164211A1 · 2018 [cited by applicant]
WO 2018168503A1 · 2018 [cited by applicant]
WO 2019131530A1 · 2019 [cited by applicant]
Ballandras et al., Finite-Element Analysis of Periodic Piezoelectric Transducers, Journal of Applied Physics, vol. 93, No. 1, (Jan. 1, 2003), pp. 702-710. [cited by applicant]
Hirabayashi et al., Optimization of Surface-Acoustic-Wave Withdrawal-Weighted Filters Using Simulated Annealing, Jpn. J. Appl. Phys. vol. 36, (1997), pp. 5371-5372. [cited by applicant]
International Search Report for Application No. PCT/IB2020/000784 dated Mar. 16, 2021, 7 pages. [cited by applicant]
International Written Opinion for Application No. PCT/IB2020/000784 dated Mar. 16, 2021, 14 pages. [cited by applicant]
Japanese Notice of Reasons for Refusal and Search Report for Japanese Application No. 2024-027731, dated Feb. 7, 2025, 88 pages with English translation. [cited by applicant]
Daniel et al., “Damascene technique applied to surface acoustic wave devices”,, Journal of Vacuum Science and Technology: Part B, AVS / AIP, Melville, New York, NY, US, vol. 25, No. 1, Jan. 30, 2007 (Jan. 30, 2007), pp.… [cited by applicant]
European Search Report and Search Opinion Received for EP Application No. 19306123.1, dated on Mar. 20, 2020, 12 pages. [cited by applicant]
Japanese Decision of Refusal for Japanese Application No. 2022-510846, dated Dec. 5, 2023, 12 pages with English translation. [cited by applicant]
Japanese Decision to Grant a Patent for Japanese Application No. 2022-510170, dated Aug. 6, 2024, 5 pages with English translation. [cited by applicant]
Japanese Decision to Grant a Patent for Japanese Application No. 2022-510846, dated May 7, 2024, 5 pages with English translation. [cited by applicant]
Japanese Notice of Reasons for Refusal for Japanese Application No. 2022-510170, dated Nov. 7, 2023, 14 pages with English translation. [cited by applicant]
Japanese Notification of Refusal for Application No. 2022-510846 dated Jun. 5, 2023, 8 pages. [cited by applicant]
Korean Request for the Submission of an Opinion received for Korean Patent Application No. 10-2022-7012796, mailed on Mar. 18, 2024, 13 pages With English Translations. [cited by applicant]
Korean Request for the Submission of an Opinion received for Korean Patent Application No. 10-2022-7012799, mailed on Mar. 18, 2024, 13 pages With English Translations. [cited by applicant]
Japanese Notice of Reasons for Refusal for Application No. 2022-510170 dated Mar. 25, 2024, 8 pages. [cited by applicant]
Japanese Notice of Reasons for Rejection for Application No. 2022-510170 dated Jun. 13, 2023, 7 pages. [cited by applicant]
Korean Request for the Submission of an Opinion for Application No. 10-2022-7012796 dated Apr. 15, 2024, 7 pages. [cited by applicant]
European Communication pursuant to Article 94(3) EPC for European Application No. 20793434.0, dated Jul. 22, 2025, 10 pages. [cited by applicant]
European Communication pursuant to Article 94(3) EPC for European Application No. 20796643.3, dated Jul. 23, 2025, 13 pages. [cited by applicant]
English Translation of CN Office Action received for Chinese Patent Application No. 202080062057, mailed on Dec. 2, 2025, 5 pages. [cited by applicant]
English Translation of CN Office Action received for Chinese Patent Application No. 202080062067, mailed on Dec. 10, 2025, 15 pages. [cited by applicant]