Method of treating a substrate surface, apparatus therefor, and treated glass articles
Apparatus and method for treating a substrate, for example texturing a substrate. In some embodiments, a masking material is applied to a surface of the substrate in a predetermined pattern, the surface thereafter contacted with an etchant that removes the masking material. Contacting the surface with the etchant produces multiple co-located textures. In other embodiments, the masking step can be eliminated, and the etchant is applied in a predetermined pattern to produce multiple co-located textures. In still other embodiments, the substrate has a chemical composition, and the substrate is exposed to a leachant that leaches at least one constituent of the chemical composition to produce a substrate with a varying chemical composition at the substrate surface.
1. A glass substrate, comprising:
a first major surface comprising a periodic first texture, the first texture comprising a first magnitude and a first spatial period in a first direction along a first axis parallel to the first major surface, the first texture extending a length along the first axis equal to or greater than two times the first spatial period, and an isotropic second texture co-located with the first texture, the second texture comprising an average surface roughness Sa equal to or less than 1 nanometer,
wherein the first magnitude is in a range from 2 nanometers to 500 nanometers, and
wherein the first major surface further comprises a periodic third texture co-located with the first texture, the third texture comprising a second magnitude and a second spatial period along a second axis parallel to the first major surface and different from the first axis, the third texture extending a length along the second axis equal to or greater than two times the second spatial period.
2. The glass substrate of claim 1 , wherein the first spatial period is in a range from 0.1 millimeters to 100 millimeters.
3. The glass substrate of claim 1 , wherein the second axis is orthogonal to the first axis.
4. The glass substrate of claim 1 , wherein the second magnitude is in a range from 2 nanometers to 500 nanometers.
5. The glass substrate of claim 4 , wherein the second spatial period is in a range from 0.1 millimeters to 25 millimeters.
6. The glass substrate of claim 5 , wherein the first major surface further comprises a periodic fourth texture co-located with the third texture, the fourth texture comprising a third magnitude and a third spatial period along the second axis, the fourth texture extending a length along the second axis equal to or greater than two times the third spatial period.