IP Library Granted Patent US 12,303,831
Granted Patent B2
US 12,303,831 · App. 17/792,756 · Granted May 20, 2025

Exhaust gas purification system

Inventors: Takashi Baba (Saitama, JP); Hiroki Kurihara (Saitama, JP)
Assignee: Mitsui Mining & Smelting Co., Ltd.
B01D53/94B01J23/63B01J35/56F01N3/022F01N3/035F01N3/28
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Quick Facts
Patent No.
US 12,303,831
App. No.
17/792,756
Granted
May 20, 2025
Kind
B2
Abstract

An object of the present invention is to provide an exhaust gas purification system including a first exhaust gas treatment section provided upstream in an exhaust pathway of an internal-combustion engine, a second exhaust gas treatment section provided upstream in the exhaust pathway of the internal-combustion engine, wherein the exhaust gas purification system allows rhodium element contained in a catalyst layer of the second exhaust gas treatment section to efficiently exhibit the catalytic activity, and the present invention provides an exhaust gas purification system ( 1 ) configured to purify exhaust gas emitted from an internal-combustion engine, the exhaust gas purification system ( 1 ) including an exhaust gas path ( 2 ) through which exhaust gas flows, a first exhaust gas treatment section ( 3 ) provided upstream in the exhaust gas path ( 2 ), and a second exhaust gas treatment section ( 4 ) provided downstream in the exhaust gas path ( 2 ); wherein first catalyst layers of the first exhaust gas treatment section ( 3 ) each contain cerium element; wherein a percentage of the mass of the cerium element contained in the first catalyst layers in terms of cerium oxide, to the mass of the first catalyst layers, is 5.0% by mass or more and 13.0% by mass or less; and wherein second catalyst layers of the second exhaust gas treatment section ( 4 ) each contain rhodium element.

Claims (43)

1. An exhaust gas purification system configured to purify exhaust gas emitted from an internal combustion engine,

the exhaust gas purification system comprising:

an exhaust gas path through which exhaust gas flows;

a first exhaust gas treatment section provided upstream in the exhaust gas path; and

a second exhaust gas treatment section provided downstream in the exhaust gas path,

wherein the first exhaust gas treatment section comprises:

a flow-through type substrate; and

first catalyst layers,

wherein the flow-through type substrate comprises:

cells each extending in the exhaust gas flow direction, and each having an open end on an exhaust gas inflow side thereof in the exhaust gas flow direction and an open end on an exhaust gas outflow side thereof in the exhaust gas flow direction; and

a partition wall separating the cells from one another,

wherein the first catalyst layers each comprise a portion that is formed on a surface of the partition wall,

wherein the second exhaust gas treatment section comprises:

a wall-flow type substrate;

second catalyst layers; and

third catalyst layers,

wherein the wall-flow type substrate comprises:

inflow-side cells each extending in the exhaust gas flow direction, and each having an open end on an exhaust gas inflow side thereof in the exhaust gas flow direction and a closed end on an exhaust gas outflow side thereof in the exhaust gas flow direction;

outflow-side cells each extending in the exhaust gas flow direction, and each having a closed end on an exhaust gas inflow side thereof in the exhaust gas flow direction and an open end on an exhaust gas outflow side thereof in the exhaust gas flow direction; and

a porous partition wall separating the inflow-side cells and the outflow- side cells from one another,

wherein the second catalyst layers each have a portion that is formed on a surface on an inflow-side cell side of the partition wall, and extends from an end on an exhaust gas inflow side of the partition wall along the exhaust gas flow direction,

wherein the third catalyst layers each have a portion that is formed on a surface on an outflow-side cell side of the partition wall, and extends from an end on an exhaust gas outflow side of the partition wall along a direction opposite to the exhaust gas flow direction,

wherein the first catalyst layers each contain cerium element,

wherein a percentage P 1 of a mass of the cerium element contained in the first catalyst layers in terms of cerium oxide, to a mass of the first catalyst layers, is 5.0% by mass or more and 13.0% by mass or less,

wherein the second catalyst layers each contain rhodium element,

wherein the second catalyst layers and the third catalyst layers each contain cerium element, and

wherein a percentage P 23 of a total of a mass of the cerium element contained in the second catalyst layers in terms of cerium oxide, and a mass of the cerium element contained in the third catalyst layers in terms of cerium oxide, to a total of a mass of the second catalyst layers and a mass of the third catalyst layers, is 1.1 times or more and 5.3 times or less larger than the percentage P 1 .

2. The exhaust gas purification system according to claim 1 , wherein a percentage P 2 of a mass of the cerium element contained in the second catalyst layers in terms of cerium oxide, to a mass of the second catalyst layers, is larger than the percentage P 1 .

3. The exhaust gas purification system according to claim 2 , wherein the percentage P 2 is 1.1 times or more and 5.3 times or less larger than the percentage P 1 .

4. The exhaust gas purification system according to claim 1 , wherein a percentage P 3 of a mass of the cerium element contained in the third catalyst layers in terms of cerium oxide, to a mass of the third catalyst layers, is larger than the percentage P 1 .

5. The exhaust gas purification system according to claim 4 , wherein the percentage P 3 is 1.1 times or more and 5.3 times or less larger than the percentage P 1 .

6. The exhaust gas purification system according to claim 1 , wherein the third catalyst layers each contain a palladium element.

7. The exhaust gas purification system according to claim 1 wherein a density of the cells of the wall-flow type substrate is 200 cells per square inch or more and 400 cells per square inch or less.

8. The exhaust gas purification system according to claim 1 , wherein a density of the cells in the flow-through type substrate is 400 cells per square inch or more and 1200 cells per square inch or less.

9. The exhaust gas purification system according to claim 1 , wherein the percentage P 1 is 7.0% by mass or more and 11.0% by mass or less.

10. The exhaust gas purification system according to claim 1 , wherein the percentage P 23 l is 1.3 times or more and 4.2 times or less larger than the percentage P 1 .

11. The exhaust gas purification system according to claim 1 , wherein the percentage P 1 is 7.0% by mass or more and 11.0% by mass or less, the percentage P 23 is 1.3 times or more and 4.2 times or less larger than the percentage P 1 .

12. The exhaust gas purification system according to claim 2 , wherein the percentage P 2 is 1.1 times or more and 1.4 times or less larger than the percentage P 1 .

13. The exhaust gas purification system according to claim 4 , wherein the percentage P 3 is 1.1 times or more and 3.0 times or less larger than the percentage P 1 .

14. The exhaust gas purification system according to claim 1 , wherein the first catalyst layers each contain rhodium element.

15. The exhaust gas purification system according to claim 1 , wherein the third catalyst layers each contain rhodium element.

16. The exhaust gas purification system according to claim 1 , wherein the first catalyst layers each have a laminated structure.

17. The exhaust gas purification system according to claim 16 , wherein the first catalyst layers each have a lower layer comprising palladium element, and an upper layer comprising rhodium element.

Assignments (2)
CHANGE OF NAME Recorded Mar 31, 2026
From: MITSUI MINING AND SMELTING COMPANY, LIMITED
To: MITSUI KINZOKU COMPANY, LIMITED
Reel/Frame 075357/0342 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2022
From: BABA, TAKASHI; KURIHARA, HIROKI
To: MITSUI MINING & SMELTING CO., LTD.
Reel/Frame 061398/0442 →
Priority Claims (1)
JP 2020-003874 · Jan 14, 2020 · national
Continuity (1)
Related Publication 20230050366A1 · Feb 16, 2023
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