IP Library Granted Patent US 12,390,345
Granted Patent B2
US 12,390,345 · App. 17/795,821 · Granted Aug 19, 2025

Spinal implant and method of manufacturing spinal implant

Inventors: Kazuya Matsunaga (Kyoto, JP); Fumiya Nakada (Kyoto, JP); Masaaki Mawatari (Saga, JP); Tadatsugu Morimoto (Saga, JP)
Assignees: KYOCERA Corporation; SAGA University
A61F2/447A61F2002/3006A61F2002/30774A61F2002/30904A61F2002/448
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,390,345
App. No.
17/795,821
Granted
Aug 19, 2025
Kind
B2
Abstract

A spinal implant includes a base and a coating film disposed on the base and including a calcium phosphate-based material and an antimicrobial agent. A surface of the base includes a first region in which the coating film is disposed and a second region exposed from the coating film.

Claims (41)

1. A spinal implant comprising:

a base made of metal material and including a top face, a bottom face, and a side face; and

a coating film disposed on the base, the coating film comprising a calcium phosphate-based material and an antimicrobial agent, wherein

a surface of the base comprises a first region and a second region, the first region being disposed with the coating film, and the second region being disposed with no coating film,

part of the first region is located in the side face,

the first region further comprises a first location having a smaller coating film thickness than a second location of the first region, and

the first location is at least one of

(a) an inner surface of a first penetrating portion penetrating through the base in a first direction,

(b) an inner surface of a second penetrating portion penetrating through the base in a second direction that intersects the first direction, or

(c) a recessed portion provided on a rear face of the base.

2. The spinal implant according to claim 1 , further comprising:

an engagement portion disposed in the second region, the engagement portion configured to engage with an engagement tool.

3. The spinal implant according to claim 2 , wherein the engagement portion comprises a locking mechanism; and the locking mechanism comprises a recessed portion or a protruding portion configured to lock the engagement tool and the base.

4. The spinal implant according to claim 3 , wherein

the locking mechanism comprises a hole portion in the second region and a tip portion,

a diameter of an inner portion of the hole portion is larger than a diameter at an opening portion of the hole portion, and

the tip portion is disposed in the engagement tool, is configured to be inserted into the hole portion, and has a variable outer diameter.

5. The spinal implant according to claim 3 , wherein the locking mechanism comprises a clamping portion disposed in the engagement tool, and is configured to clamp the engagement portion.

6. The spinal implant according to claim 1 , wherein the second region comprises a screw hole.

7. The spinal implant according to claim 1 , wherein the base comprises a rough surface portion, and the coating film covers at least a part of the rough surface portion.

8. The spinal implant according to claim 7 , wherein

the rough surface portion is disposed in the first region, and a surface roughness of the rough surface portion is greater than a surface roughness of the second region.

9. The spinal implant according to claim 1 , wherein the coating film is disposed directly on the base.

10. The spinal implant according to claim 1 , further comprising: the first penetrating portion penetrating through the base in the first direction.

11. The spinal implant according to claim 10 , further comprising:

the second penetrating portion penetrating through the base in the second direction that intersects the first direction.

12. The spinal implant according to claim 11 , wherein the second penetrating portion comprises a plurality of through holes disposed separately from each other.

13. The spinal implant according to claim 1 , wherein

antler surface of the base comprises two zones having different surface roughnesses.

14. The spinal implant according to claim 13 , wherein the first region overlaps with a zone having a larger surface roughness among the two zones having different surface roughnesses.

15. A spinal implant comprising:

a base made of metal material and including a top face, a bottom face, and a side face; and

a coating film disposed on the base and comprising a calcium phosphate-based material and an antimicrobial agent, wherein

the coating film comprises a first region and a region having a smaller film thickness than a film thickness of the first region,

part of the first region is located in the side face, and

the region having a smaller film thickness is at least one of

(a) an inner surface of a first penetrating portion penetrating through the base in a first direction,

(b) an inner surface of a second penetrating portion penetrating through the base in a second direction that intersects the first direction, or

(c) a recessed portion provided on a rear face of the base.

16. The spinal implant according to claim 15 , wherein

a surface of the base comprises two regions having different surface roughnesses, and the region having a smaller film thickness than the film thickness of the first region overlaps with a region having a smaller surface roughness among the two regions having different surface roughnesses.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 15, 2026
From: KYOCERA CORPORATION
To: KYOCERA MEDICAL CORPORATION
Reel/Frame 074671/0210 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 29, 2022
From: MATSUNAGA, KAZUYA; MAWATARI, MASAAKI; MORIMOTO, TADATSUGU; NAKADA, FUMIYA
To: KYOCERA CORPORATION; SAGA UNIVERSITY
Reel/Frame 060676/0001 →
Priority Claims (2)
JP 2020-015252 · Jan 31, 2020 · national
JP 2020-015253 · Jan 31, 2020 · national
Continuity (1)
Related Publication 20230076858A1 · Mar 9, 2023
References Cited (38)
US 20020004683A1 · Michelson · 2002 [cited by examiner]
US 20030023306A1 · Liu · 2003 [cited by applicant]
US 20060282166A1 · Molz · 2006 [cited by applicant]
US 20070118220A1 · Liu · 2007 [cited by applicant]
US 20090280156A1 · Hotokebuchi · 2009 [cited by applicant]
US 20100114105A1 · Butters et al. · 2010 [cited by applicant]
US 20100228296A1 · Vraney · 2010 [cited by examiner]
US 20110008407A1 · Gan · 2011 [cited by applicant]
US 20110190888A1 · Bertele · 2011 [cited by examiner]
US 20110264152A1 · Weiman · 2011 [cited by examiner]
US 20130116790A1 · Seifert · 2013 [cited by applicant]
US 20130138223A1 · Mawatari · 2013 [cited by examiner]
US 20140228958A1 · Niemiec · 2014 [cited by applicant]
US 20140287018A1 · Soo et al. · 2014 [cited by applicant]
US 20150018965A1 · Mawatari · 2015 [cited by applicant]
US 20150056264A1 · Gan · 2015 [cited by applicant]
US 20160058568A1 · Bagga · 2016 [cited by applicant]
US 20170119932A1 · Mawatari · 2017 [cited by applicant]
US 20170348114A1 · Jones et al. · 2017 [cited by applicant]
US 20180192939A1 · Roth · 2018 [cited by applicant]
US 20180303629A1 · Lauf · 2018 [cited by examiner]
US 20180361022A1 · Hotokebuchi · 2018 [cited by applicant]
US 20190254840A1 · Gray · 2019 [cited by applicant]
US 20190290361A1 · Shalayev · 2019 [cited by applicant]
US 20200215230A1 · Hotokebuchi · 2020 [cited by applicant]
US 20210052780A1 · Mawatari · 2021 [cited by applicant]
AU 2019219236A1 · 2020 [cited by applicant]
JP H02241461A · 1990 [cited by applicant]
JP H10155822A · 1998 [cited by applicant]
JP 2003526458A · 2003 [cited by applicant]
JP 2008073098A1 · 2008 [cited by applicant]
JP 2011512959A · 2011 [cited by applicant]
JP 2011234924A · 2011 [cited by applicant]
JP 2012040194A · 2012 [cited by applicant]
JP 2013518619A · 2013 [cited by applicant]
JP 2014533178A · 2014 [cited by applicant]
WO 2013114947A · 2013 [cited by applicant]
WO 2019155021A · 2019 [cited by applicant]