Semiconductor module and method of manufacturing semiconductor module

1. A method of manufacturing a semiconductor module, comprising:

forming, on a semiconductor device, a bonding layer containing nickel or copper so as to be electrically connected to the semiconductor device;

forming an anti-oxidation layer that contains gold on the bonding layer except for on an outer peripheral portion of the bonding layer including an outer peripheral edge of the bonding layer;

forming a protective layer directly on the bonding layer so as to cover the outer peripheral edge of the bonding layer; and

bonding a region of the bonding layer on which the anti-oxidation layer is formed to a wire using solder,

wherein the bonding of the region of the bonding layer on which the anti-oxidation layer is formed to the wire using the solder causes the anti-oxidation layer to be dissolved in the solder.

2. The method according to claim 1 , wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer.

3. The method according to claim 1 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer coincides with as an inner peripheral edge of the protective layer.

4. The method according to claim 1 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer is positioned further inwards than an inner peripheral edge of the protective layer.

5. The method according to claim 2 , wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

6. The method according to claim 3 ,

wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer, and

wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

7. The method according to claim 4 ,

wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer, and

wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

8. A method of manufacturing a semiconductor module, comprising:

forming, on a semiconductor device, a bonding layer containing nickel or copper so as to be electrically connected to the semiconductor device;

forming an anti-oxidation layer that contains gold on the bonding layer except for on an outer peripheral portion of the bonding layer including an outer peripheral edge of the bonding layer;

forming a protective layer directly on the bonding layer so as to cover the outer peripheral edge of the bonding layer; and

bonding a region of the bonding layer on which the anti-oxidation layer is formed to a wire using solder,

wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer.

9. The method according to claim 8 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer coincides with as an inner peripheral edge of the protective layer.

10. The method according to claim 8 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer is positioned further inwards than an inner peripheral edge of the protective layer.

11. The method according to claim 8 , wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

12. The method according to claim 9 , wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

13. The method according to claim 10 , wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

14. A method of manufacturing a semiconductor module, comprising:

forming, on a semiconductor device, a bonding layer containing nickel or copper so as to be electrically connected to the semiconductor device, an entire back surface of the bonding layer being electrically connected to and in direct contact with an electrode in the semiconductor device;

forming an anti-oxidation layer that contains gold on the bonding layer except for on an outer peripheral portion of the bonding layer including an outer peripheral edge of the bonding layer;

forming a protective layer directly on the bonding layer so as to cover the outer peripheral edge of the bonding layer; and

bonding a region of the bonding layer on which the anti-oxidation layer is formed to a wire using solder,

wherein the protective layer is disposed directly on a top surface of the outer peripheral portion of the bonding layer on which the solder portion is absent, covering the outer peripheral edge of the bonding layer, and

wherein the protective layer contains polyimide or polyamide.

15. The method according to claim 14 , wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer.

16. The method according to claim 14 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer coincides with as an inner peripheral edge of the protective layer.

17. The method according to claim 14 , wherein the anti-oxidation layer and the protective layer are formed so that an outer peripheral edge of the anti-oxidation layer is positioned further inwards than an inner peripheral edge of the protective layer.

18. The method according to claim 14 , wherein the bonding of the region of the bonding layer on which the anti-oxidation layer is formed to the wire using the solder causes the anti-oxidation layer to be dissolved in the solder.

19. The method according to claim 15 , wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.

20. The method according to claim 16 ,

wherein the forming of the anti-oxidation layer includes:

forming a layer that contains gold over an entire surface of the bonding layer; and

removing a portion of said layer containing gold that is on the outer peripheral portion of the bonding layer so as to form the anti-oxidation layer, and

wherein the removing of the portion of said layer containing gold that is on the outer peripheral portion of the bonding layer causes an exposed surface of the outer peripheral portion of the bonding layer to have an arithmetic average roughness of greater than or equal to 1 μm and less than or equal to 6 μm.