Semiconductor package including stress buffers and methods of forming the same
A semiconductor package includes a package substrate; a semiconductor die vertically stacked on the package substrate; a redistribution layer (RDL) including a dielectric material and metal features that electrically connect the semiconductor die to the package substrate, the RDL having a first Young's modulus; a first underfill layer disposed between the RDL and the semiconductor die; and stress buffers embedded in the RDL below corners of the semiconductor die, each stress buffer having a second Youngs modulus that is at least 30% less than the first Youngs modulus.
1 . A semiconductor package comprising:
a package substrate comprising redistribution structures configured to electrically connect the semiconductor package to a supporting substrate;
a semiconductor device vertically stacked on the package substrate;
an interposer comprising a dielectric material and metal features that electrically connect the semiconductor device to the package substrate, the dielectric material of the interposer having a first Young's modulus;
a first underfill layer disposed between the interposer and the semiconductor device; and
a stress buffer embedded in the interposer below a corner of the semiconductor device in a top view and directly contacting the first underfill layer, the stress buffer having a second Young's modulus that is at least 30% less than the first Young's modulus.
2 . The semiconductor package of claim 1 , wherein the stress buffer is disposed between the interposer and the corner of the semiconductor device.
3 . The semiconductor package of claim 2 , wherein the stress buffer extends horizontally outside of a perimeter of the semiconductor device, by a distance ranging from 150 μm to 1000 μm.
4 . The semiconductor package of claim 2 , wherein the stress buffer extends horizontally inside of a perimeter of the semiconductor device, by a distance ranging from 150 μm to 1000 μm.
5 . The semiconductor package of claim 1 , wherein the stress buffer has a thickness that is less than a thickness of the interposer.
6 . The semiconductor package of claim 5 , wherein the thickness of the stress buffer ranges from 10 μm to 1000 μm.
7 . The semiconductor package of claim 1 , wherein the stress buffer has a thickness that is equal to a thickness of the interposer.
8 . The semiconductor package of claim 1 , wherein the second Young's modulus ranges from 0.5 GPa to 2 GPa.
9 . The semiconductor package of claim 8 , wherein the first underfill layer has a third Young's modulus that is greater than the second Young's modulus.
10 . The semiconductor package of claim 1 , wherein:
the stress buffer comprises a silicon-based material; and
the dielectric material comprises an epoxy-based material.
11 . The semiconductor package of claim 1 , wherein the stress buffer has rectangular, L-shaped, or ovoid horizontal cross-sectional profile.
12 . The semiconductor package of claim 11 , wherein the stress buffer is arranged as part of an array below the corner of the semiconductor device.
13 . The semiconductor package of claim 1 , wherein the stress buffer is configured to reduce an amount of thermo-mechanical stress that is applied to the first underfill layer.
14 . A semiconductor package comprising:
a package substrate comprising redistribution structures configured to electrically connect the semiconductor package to a supporting substrate;
a semiconductor die vertically stacked on the package substrate;
a redistribution layer (RDL) comprising a dielectric material and metal features that electrically connect the semiconductor die to the package substrate, the RDL having a first Young's modulus;
a first underfill layer disposed between the RDL and the semiconductor die; and
a stress buffer embedded in a top surface of the RDL below a corner of the semiconductor die in a top view and directly contacting the first underfill layer, the stress buffer having a second Young's modulus that is at least 30% less than the first Young's modulus.
15 . The semiconductor package of claim 14 , wherein the stress buffer is disposed only below the corner of the semiconductor die that is adjacent to a corner of the RDL.
16 . The semiconductor package of claim 14 , wherein the first underfill layer has a third Young's modulus that is at least 30% greater than the second Young's modulus.
17 . The semiconductor package of claim 14 , wherein the stress buffer has a thickness that is less than or equal to a thickness of the RDL.
18 . The semiconductor package of claim 16 , wherein:
the second Young's modulus ranges from 0.5 GPa to 2 GPa;
the stress buffer comprises a silicon-based material; and
the dielectric material comprises an epoxy-based material.
19 . A semiconductor package comprising:
a package substrate comprising redistribution structures configured to electrically connect the semiconductor package to a supporting substrate;
a first semiconductor device and a second semiconductor device disposed on the package substrate;
a first underfill layer disposed under the first and second semiconductor devices;
an interposer disposed under the first underfill layer and comprising a dielectric material and metal features that electrically connect the first semiconductor device and the second semiconductor device to the package substrate, the dielectric material having a first Young's modulus; and
stress buffers embedded in the interposer below first and second corners of at least one of the first semiconductor device or the second semiconductor device in a top view and directly contacting the first underfill layer, the stress buffers having a second Young's modulus that is at least 30% less than the first Young's modulus.
20 . The semiconductor package of claim 19 , wherein the stress buffers comprise multiple stress buffers disposed below at least one of the first corner or the second corner of the at least one of first semiconductor device or the second semiconductor device.