Laser annealing apparatus and laser annealing method using the same
A laser annealing apparatus includes a plurality of lasers, a laser controller that controls the plurality of lasers such that a plurality of laser beams generated from the plurality of lasers is emitted at different timings, beam mixer optics that outputs a processing beam by mixing the plurality of laser beams of which output timings are adjusted, and focus optics that outputs the processing beam of which focus is adjusted. The processing beam includes a first processing laser beam having a first pulse, a second processing laser beam having a second pulse following the first pulse, and a third processing laser beam having a third pulse following the second pulse. A first peak of the first pulse is smaller than a second peak of the second pulse, and a third peak of the third pulse is smaller than the second peak.
1 . A laser annealing apparatus comprising:
a plurality of lasers;
a laser controller which controls emitting timings of a plurality of laser beams generated by the plurality of lasers;
beam mixer optics which output a processing beam by combining the plurality of laser beams of which output timings are adjusted, the processing beam including:
a first processing laser beam having a first pulse;
a second processing laser beam having a second pulse following the first pulse; and
a third processing laser beam having a third pulse following the second pulse; and
focus optics which output the processing beam of which focus is adjusted,
wherein a first peak of the first pulse is smaller than a second peak of the second pulse, and a third peak of the third pulse is smaller than the second peak, and
the first pulse is spaced apart from the second pulse, and the second pulse and the third pulse partially overlap each other.
2 . The laser annealing apparatus of claim 1 ,
wherein a first valley between the first pulse and the second pulse is set to percent or less of the second peak.
3 . The laser annealing apparatus of claim 1 , wherein a second valley between the second pulse and the third pulse is set to 60 percent or less of the second peak.
4 . The laser annealing apparatus of claim 1 , wherein a time interval between a left point of the second pulse corresponding to 50 percent of the second peak and a right point of the third pulse corresponding to 50 percent of the third peak is set to about 40 nanoseconds to about-200 nanoseconds.
5 . The laser annealing apparatus of claim 1 , wherein each of the first, second, and third processing laser beams is generated by combining at least two laser beams among the plurality of laser beams.
6 . The laser annealing apparatus of claim 5 , wherein a number of laser beams constituting the second processing laser beam, among the plurality of laser beams, is greater than a number of laser beams constituting the third processing laser beam, among the plurality of laser beams, and a number of laser beams constituting the first processing laser beam, among the plurality of laser beams.
7 . The laser annealing apparatus of claim 1 , wherein the first pulse and the second pulse partially overlap each other, and the second pulse and the third pulse partially overlap each other.
8 . The laser annealing apparatus of claim 1 , wherein the third peak is greater than the first peak.
9 . The laser annealing apparatus of claim 1 , wherein the third peak is equal to the first peak.
10 . The laser annealing apparatus of claim 1 , wherein the third peak is smaller than the first peak.
11 . The laser annealing apparatus of claim 1 , wherein the first peak includes a plurality of sub-peaks having different values from each other.
12 . The laser annealing apparatus of claim 1 , further comprising:
a plurality of attenuators which adjust powers of the plurality of laser beams provided from the plurality of lasers and provide the plurality of laser beams to the beam mixer optics,
wherein powers of at least two laser beams among the plurality of laser beams are adjusted by the attenuators so as to be different from each other.
13 . The laser annealing apparatus of claim 1 , wherein the processing beam further includes a fourth processing laser beam having a fourth pulse following the third processing pulse, and
wherein the third pulse and the fourth pulse partially overlap each other, and a fourth peak of the fourth pulse is smaller than the third peak.
14 . The laser annealing apparatus of claim 13 , wherein the fourth peak is smaller than the first peak.