Granted Patent B2

US 12,389,604 · App. 17/878,686 · Granted Aug 12, 2025

Inventor: Yung-Tin Chen (Taoyuan, TW)

Assignee: SAMSUNG ELECTRONICS CO., LTD.

H10B51/20G11C11/223G11C11/2257H10B51/10

Abstract

Claims (28)

1. A memory string formed above a planar surface of substrate, comprising:

a gate electrode extending lengthwise along a first direction substantially orthogonal to the planar surface,

a ferroelectric layer provided over at least a portion of the gate electrode along a second direction orthogonal to the first direction and extending lengthwise along the first direction;

a gate oxide layer provided over at least a portion of the ferroelectric layer along the second direction and extending lengthwise along the first direction;

a plurality of semiconductor structure provided along the first direction adjacent the gate oxide layer, wherein each semiconductor structure comprises ( i ) a first semiconductor material of a first conductivity type; and ( ii ) second and third semiconductor materials electrically being isolated from each other and each being coplanar with and adjacent the first semiconductor material, the second and third semiconductor materials each being of a second conductivity type different from the first conductivity type, (iii) wherein at least one of the first, the second and the third semiconductor materials comprise silicon carbide (SiC), (iv) wherein the gate electrode, the ferroelectric layer, the gate oxide layer and the semiconductor structure form a storage transistor of the memory string, and (v) wherein the first, second and third semiconductor materials form the channel, source and drain regions of the storage transistor.

2. The memory string of claim 1 , wherein the first semiconductor material comprises p-type atomic layer deposited silicon carbide.

3. The memory string of claim 1 , wherein at least one of the second and the third semiconductor materials comprises n + -type chemical vapor deposited silicon carbide.

4. The memory string of claim 1 , further comprising a barrier layer provided between the gate electrode and the ferroelectric layer.

5. The memory string of claim 4 , wherein the barrier layer comprises titanium nitride, tungsten nitride or tantalum nitride.

6. The memory string of claim 1 , wherein the gate electrode comprises tungsten or a heavily doped semiconductor.

7. The memory string of claim 1 , further comprising a conductor adjacent to each of the second and third semiconductor materials of each semiconductor structure.

8. The memory string of claim 7 , wherein the conductor comprises tungsten, a metallic adhesive layer, or a combination thereof.

9. The memory string of claim 7 , wherein the drain or source region each comprise n + polysilicon.

10. The memory string of claim 1 , wherein the memory string is one of a plurality of memory strings in a memory array, wherein the memory array comprises a staircase configuration providing electrical contacts to each of the source or drain electrodes.

11. The memory string of claim 1 , wherein the memory string is one of a plurality of memory strings in a memory array, wherein the memory array comprises a network of global word line conductors each connecting the gate electrodes of a selected group of the memory strings.

12. The memory string of claim 11 , wherein the network of global word line conductors is provided above the memory strings.

13. The memory string of claim 1 , wherein the ferroelectric layer comprises a HfO 2 ferroelectric material.

14. The memory string of claim 13 , wherein the ferroelectric layer is 5.0-30.0 nm thick, preferably 8.0-20.0 nm thick.

15. The memory string of claim 13 , wherein the ferroelectric layer comprises a zirconium-doped hafnium silicon oxide.

16. The memory string of claim 15 , wherein the zirconium-doped hafnium silicon oxide has a zirconium content of 40-60%, preferably 45-55%.

17. The memory string of claim 15 , wherein the zirconium-doped hafnium silicon oxide comprises Hf x Zr 1-x O y ferroelectric thin-films, where x ranges between 0.4 and 0.6, preferably between 0.45 and 0.55, and y ranges between 1.8 and 2.2, preferably between 1.9 to 2.1.

18. The memory string of claim 15 , wherein the zirconium-doped hafnium silicon oxide is prepared by depositing HfO 2 and ZrO 2 using an ALD layer-by-layer lamination step.

19. The memory string of claim 13 , wherein the ferroelectric layer comprises a silicon-doped hafnium silicon oxide.

20. The memory string of claim 19 , wherein the silicon-doped hafnium silicon oxide has a silicon content of 2.0-5.0%, preferably 2.5-4.5%.

21. The memory string of claim 19 , wherein the silicon-doped hafnium silicon oxide comprises Hf x Si 1-x O y ferroelectric thin-films, where x ranges from 0.02 to 0.05, preferably between 0.025 and 0.04, and y ranges from 1.8 to 2.2, preferably between 1.9 and 2.1.

22. The memory string of claim 19 , wherein the silicon-doped hafnium silicon oxide is prepared by depositing HfO 2 and SiO 2 using an ALD layer-by-layer lamination step.

23. The memory string of claim 20 , further comprising a charge-trapping layer between the gate oxide layer and the ferroelectric layer or between the ferroelectric layer and a barrier layer adjacent the gate electrode.

24. The memory string of claim 1 , wherein the barrier layer comprises titanium nitride.

Assignments (1)

Continuity (5)

References Cited (33)