IP Library › Granted Patent US 11,929,336
Granted Patent B2
US 11,929,336 · App. 17/887,385 · Granted Mar 12, 2024

Semiconductor device including resistor element

Inventor: Chan Ho Yoon (Icheon-si, KR)
Assignee: SK hynix inc.
H01L24/08H01L23/5228H01L25/0657H01L25/18H01L2224/08145H01L2924/1431H01L2924/14511H01L2924/19043H01L2924/19104
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Quick Facts
Patent No.
US 11,929,336
App. No.
17/887,385
Granted
Mar 12, 2024
Kind
B2
Abstract

A semiconductor device includes a first pad defined on one surface of a first chip; a second pad defined on one surface of a second chip which is stacked on the first chip, and bonded to the first pad; a first resistor element defined in the first chip, and coupled to the first pad; and a second resistor element defined in the second chip, and coupled to the second pad.

Claims (23)

1. A semiconductor device comprising:

a first pad defined on one surface of a first chip, the first chip includes a memory cell array disposed in a cell region and a first peripheral circuit disposed in a peripheral region outside of the cell region;

a second pad defined on one surface of a second chip, which is stacked on the first chip in a first direction, and bonded to the first pad, the second chip includes a second peripheral circuit disposed in the peripheral region;

a first horizontal resistor pattern defined on the one surface of the first chip and coupled to the first pad; and

a second horizontal resistor pattern defined on the one surface of the second chip and coupled to the second pad,

wherein the first horizontal resistor pattern and the second horizontal resistor pattern are disposed between the first peripheral circuit and the second peripheral circuit in the peripheral region,

wherein the first horizontal resistor pattern and the second horizontal resistor pattern do not overlap with each other in the first direction.

2. The semiconductor device according to claim 1 , further comprising:

a first vertical resistor pattern, defined in the first chip and coupled to the first horizontal resistor pattern, extending in the first direction; and

a second vertical resistor pattern, defined in the second chip and coupled to the second horizontal resistor pattern, extending in the first direction.

3. The semiconductor device according to claim 2 , wherein the first vertical resistor pattern overlaps with the first horizontal resistor pattern in the first direction.

4. The semiconductor device according to claim 2 , wherein the second vertical resistor pattern overlaps with the second horizontal resistor pattern in the first direction.

5. The semiconductor device according to claim 2 , wherein the first vertical resistor pattern and the second vertical resistor pattern do not overlap with each other in the first direction.

6. The semiconductor device according to claim 1 ,

wherein the first horizontal resistor pattern overlaps with at least one of the first peripheral circuit and the second peripheral circuit in the first direction.

7. The semiconductor device according to claim 1 ,

wherein the second horizontal resistor pattern overlaps with at least one of the first peripheral circuit and the second peripheral circuit in the first direction.

8. The semiconductor device according to claim 1 , further comprising:

a first gate resistor pattern disposed on a substrate of the first chip,

wherein the first gate resistor pattern overlaps with the first horizontal resistor pattern in the first direction as the stack direction of the first chip and the second chip.

9. The semiconductor device according to claim 1 , further comprising:

a second gate resistor pattern disposed on a substrate of the second chip,

wherein the second gate resistor pattern overlaps with the second horizontal resistor pattern in the first direction as the stack direction of the first chip and the second chip.

Priority Claims (1)
KR 10-2020-0046620 · Apr 17, 2020 · national
Continuity (2)
Continuation 17007059 · Aug 31, 2020
Related Publication 20220392860A1 · Dec 8, 2022