IP Library Patent Application 17940682
Patent Application Utility
App. No. 17/940,682 · Confirmation No. 1720

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

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2025-07-07 CTNF Non-Final Rejection 11 View
2025-07-07 892 List of references cited by examiner 1 View
2025-07-07 SRFW Search information including classification, databases and other search related notes 1 View
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2025-07-07 1449 List of References cited by applicant and considered by examiner 4 View
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2022-10-18 PEFR Applicant Response to Pre-Exam Formalities Notice 2 View
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2022-09-27 WFEE Fee Worksheet (SB06) 1 View
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2022-09-08 A.PE Preliminary Amendment 1 View
2022-09-08 SPEC Specification 1 View
2022-09-08 CLM Claims 3 View
2022-09-08 REM Applicant Arguments/Remarks Made in an Amendment 1 View
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2022-09-08 CLM Claims 2 View
2022-09-08 ABST Abstract 1 View
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Quick Facts
App. No.
17/940,682
Filed
2022-09-08
Pub. No.
US20230152697A1
Art Unit
1700