Corrosion-resistant permanent magnet and intravascular blood pump comprising the magnet
This invention is directed to a corrosion-resistant permanent magnet, to a method for producing a corrosion-resistant permanent magnet, and to an intravascular blood pump comprising the magnet. The magnet is corrosion resistant due to a composite coating comprising a first layer structure and optionally a second layer structure on the first layer structure, each layer structure comprising an inorganic layer, a linker layer on the inorganic layer, and an organic layer formed from poly(2-chloro-p-xylylene) on the linker layer. The inorganic layers comprise aluminum and/or aluminum oxide.
1 . A method for producing a corrosion-resistant permanent magnet, the method comprising:
providing a non-magnetized magnet body,
forming a first layer structure on the magnet body by depositing an inorganic layer on surfaces of the magnet body, depositing a linker layer on the inorganic layer, and depositing a layer of poly(2-chloro-p-xylylene) on the linker layer, and optionally
forming a second layer structure on the first layer structure by depositing an inorganic layer on the first layer structure, depositing a linker layer on the inorganic layer, and depositing a layer of poly(2-chloro-p-xylylene) on the linker layer, and
magnetizing the magnet body,
wherein
depositing of the inorganic layer of the first layer structure either comprises depositing an aluminum layer on the magnet body, or comprises depositing an aluminum layer on the magnet body and an aluminum oxide layer on the aluminum layer,
depositing of the inorganic layer of the second layer structure comprises depositing an aluminum layer on the first layer structure, or comprises depositing an aluminum oxide layer on the first layer structure, or comprises depositing an aluminum layer on the first layer structure and an aluminum oxide layer on the aluminum layer,
at least one of the aluminum layers is deposited by a physical vapor deposition process, and
at least one aluminum oxide layer is deposited by an atomic layer deposition process to a thickness of at least 50 nm.
2 . The method of claim 1 , wherein a linker layer is deposited on the first layer structure.
3 . The method of claim 1 , wherein an aluminum oxide layer is deposited as the inorganic layer of the second layer structure.
4 . The method of claim 1 , wherein the magnet body is one of sintered magnet body, a rare-earth metal iron boron permanent magnet, or is rod shaped with rounded edges.
5 . The method of claim 1 , wherein the aluminum oxide layer of the first layer structure and/or the second layer structure is formed from AlX 3 as a first precursor compound and H 2 O as a second precursor compound, with X representing lower alkyl groups, which may be the same or different, or representing a hydrogen atom and lower alkyl groups, which may be the same or different, or representing halogen atoms, which may be the same or different.
6 . The method of claim 5 , wherein AlX 3 is selected from the group consisting of trimethyl aluminum (TMA), triethyl aluminum (TEA), triisobutyl aluminum (TIBA), dimethyl aluminum (DMAIH) and AlCl 3 .
7 . The method of claim 1 , wherein at least one of the linker layers is formed by applying a linker by physical vapor deposition using plasma, or by physical vapor deposition without using plasma, or from a solution.
8 . The method of claim 1 , wherein the linker of at least one of the linker layers comprises one of a silane or a silane having one of a thiol, phosphine or disulfide group.
9 . The method of claim 1 , wherein the layer of poly(2-chloro-p-xylylene) of the first layer structure and/or the second layer structure is formed by plasma deposition of dichloro[2.2]paracyclophane.
10 . The method of claim 1 , wherein the aluminum layers of the first layer structure and/or the second layer structure have a thickness of 0.5 μm to 15 μm.
11 . The method of claim 1 , wherein the linker is selected from 3-(2-pyridylethyl)thiopropyl trimethoxysilane, 3-(4-pyridylethyl)thiopropyl trimethoxysilane, and 2-(diphenylphosphino)ethyl triethoxysilane.
12 . The method of claim 1 , wherein the thickness of the aluminum oxide layer of the first layer structure and/or the second layer structure is 50 nm to 200 nm.
13 . The method of claim 1 , wherein a combined thickness of the aluminum layer and the aluminum oxide layer of the first layer structure and/or the second layer structure is in a range from 5 μm to 15 μm.
14 . The method of claim 1 , wherein the linker layer has a thickness in a range from 20 nm to 50 nm.
15 . The method of claim 1 , wherein the thickness of the layer formed from poly(2-chloro-p-xylylene) of the first layer structure and/or the second layer structure is in a range from 5 μm to 20 μm.
16 . The method of claim 1 , wherein the thickness of the composite coating is no more than 200 μm.
17 . The method of claim 10 , wherein the thickness of the aluminum layers of the first layer structure or the second layer structure is 1 μm to 10 μm.
18 . The method of claim 10 , wherein the thickness of the aluminum layers of the first layer structure or the second layer structure is 1 μm to 5 μm.
19 . The method of claim 12 , wherein the thickness of the aluminum oxide layer of the first layer structure and/or the second layer structure is 80 nm to 120 nm.
20 . The method of claim 16 , wherein the thickness of the composite coating is no more than about 50 μm.