Apparatus for treating substrate and method for treating substrate
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having an inner space; a plate separating the inner space into a first space which is above and a second space which is below and having a plurality of through holes; a first gas supply unit configured to supply a first gas to the first space; a plasma source for generating a plasma at the first space or the second space; and a monitoring unit installed at the plate and configured to monitor a characteristic of the plasma generated at the first space or the second space.
1 . A substrate treating apparatus comprising: a housing having an inner space; a plate separating the inner space into a first space which is above and a second space which is below and having a plurality of through holes; a first gas supply unit configured to supply a first gas to the first space; a plasma source for generating a plasma at the first space or the second space; and a monitoring unit installed at the plate and configured to monitor a characteristic of the plasma generated at the first space or the second space; wherein an optical path connecting the first space or the second space, and the monitoring unit is formed at the plate; and wherein the plasma source comprises: a first electrode applied with a first high frequency power and generating a first plasma at the first space; and a second electrode applied with a second high frequency power and generating a second plasma at the second space, and wherein the optical path has a first path which penetrates the plate in an up/down direction and a second path which connects to the first path and extends in a direction toward a side wall of the plate.
2 . The substrate treating apparatus of claim 1 , wherein the monitoring unit includes a polarizing plate installed at a position at which the first path and the second path intersect, and which has a polarization direction in a first direction, the light includes a first polarization which vibrates in the first direction and a second polarization which vibrates in a second direction which is different from the first direction, and the polarization plate is formed inclined with respect to the first path so the second polarization among the light incident to the first path is reflected from the polarizing plate to face a direction parallel to the second path.
3 . The substrate treating apparatus of claim 2 , wherein the monitoring unit further comprises: a receiving member installed at a side of the second path which is adjacent to the side wall and which receives the light; and a refraction member installed at the other side facing a side of the second path and which changes a characteristic of the second polarization so the second polarization which is reflected from the polarizing plate vibrates in the first direction.
4 . The substrate treating apparatus of claim 1 , wherein the monitoring unit further includes a reflective member installed on the first path and which reflects the light which is incident from the first path to the second path.
5 . The substrate treating apparatus of claim 1 , wherein a transparent cover is further installed at each of an end and the other end of the first path at the monitoring unit.
6 . The substrate treating apparatus of claim 1 , wherein the plate is grounded and captures ions included in a plasma generated in the first space to supply radicals to the second space.
7 . A substrate treating apparatus comprising: a housing having a plasma region and a substrate treating region; a plate separating the plasma region and the substrate treating region and having a plurality of through holes; a first gas supply unit configured to supply a gas to the plasma region; a plasma source for generating a plasma at the plasma region; and a monitoring unit installed at the plate and configured to monitor a characteristic of the plasma generated at the plasma region; wherein an optical path is formed connecting the plasma region or the substrate treating region, and the monitoring unit at the plate; and wherein the optical path has a first path which penetrates the plate in an up/down direction and a second path which connects to the first path and extends in a direction toward a side wall of the plate.
8 . The substrate treating apparatus of claim 7 , wherein the monitoring unit includes a polarizing plate installed at a position at which the first path and the second path intersect, and which has a polarization direction in a first direction, the light includes a first polarization which vibrates in the first direction and a second polarization which vibrates in a second direction which is different from the first direction, and the polarization plate is formed inclined with respect to the first path so the second polarization among the light incident to the first path is reflected from the polarizing plate to face a direction parallel to the second path.
9 . The substrate treating apparatus of claim 7 , wherein the monitoring unit includes a reflective member plate installed at a position at which the first path and the second path intersect, and which reflects the light incident to the first path in a direction of the second path.
10 . The substrate treating apparatus of claim 7 , wherein a transparent cover is further installed at each of an end and the other end of the first path at the monitoring unit.
11 . The substrate treating apparatus of claim 7 , wherein the monitoring unit further comprises: a receiving member installed at a side of the second path which is adjacent to the side wall and which receives the light; and a refraction member installed at the other side facing a side of the second path and which changes a characteristic of the second polarization so the second polarization which is reflected from the polarizing plate vibrates in the first direction.
12 . A substrate treating apparatus comprising: a housing having a treating space; an ion blocker dividing the treating space and a plasma space and which is grounded; a first gas supply unit configured to supply a first gas to the treating space; a second gas supply unit configured to supply a second gas to the plasma space; a top electrode positioned above the ion blocker and facing the ion blocker, which connects with a top source to be applied with a high frequency power, and which excites a first gas to generate a first plasma at a plasma space; a bottom electrode positioned below the ion blocker and facing the ion blocker, which excites the second gas to generate a second plasma at the treating space; and a monitoring unit configured to monitor a characteristic of the first plasma generated at the treating space and/or the second plasma generated at the plasma space, and wherein the monitoring unit is installed at the ion blocker, an optical path which connects the treating space or the plasma space, and the monitoring unit is formed at the ion blocker, and the optical path has a first path which penetrates the ion blocker in an up/down direction and a second path which connects to the first path and extends in a direction toward a side wall of the ion blocker.
13 . The substrate treating apparatus of claim 12 , wherein the monitoring unit includes a polarizing plate installed at a position at which the first path and the second path intersect, and which has a polarization direction in a first direction, the light includes a first polarization which vibrates in the first direction and a second polarization which vibrates in a second direction which is different from the first direction, and the polarization plate is formed inclined with respect to the first path so the second polarization among the light incident to the first path is reflected from the polarizing plate to face a direction parallel to the second path.
14 . The substrate treating apparatus of claim 12 , wherein the monitoring unit further includes a reflective member installed on the first path and which reflects the light which is incident from the first path to the second path.