Test wafer with optical fiber with Bragg Grating sensors
An apparatuses relating generally to a test wafer, processing chambers, and method relating generally to monitoring or calibrating a processing chamber, are described. In one such an apparatus for a test wafer, there is a platform. An optical fiber with Fiber Bragg Grating sensors is located over the platform. A layer of material is located over the platform and over the optical fiber.
1. An apparatus, comprising:
a platform;
an optical fiber with Fiber Bragg Grating sensors located over the platform;
a layer of material located over the platform and over the optical fiber;
the Fiber Bragg Grating sensors configured for modulations to different center frequencies to detect temperatures; and
the optical fiber between the platform and the layer of material including disposition in a spiral or spiral-like pattern.
2. The apparatus according to claim 1 , wherein the Fiber Bragg Grating sensors are configured to filter wavelengths in a range of 1500 to 1600 nanometers.
3. The apparatus according to claim 1 , wherein the optical fiber includes 50 or more of the Fiber Bragg Grating sensors.
4. The apparatus according to claim 1 , further comprising a sealant disposed between the platform and the layer of material.
5. The apparatus according to claim 1 , wherein an end of the optical fiber is positioned for communication with an optical lift pin.
6. The apparatus according to claim 1 , further comprising:
an optical eye coupled to an end of the optical fiber for optical communication to and from a light source-based detection system for a single-port and a single interface for receiving a source spectrum and transmitting a reflected spectrum.
7. The apparatus according to claim 1 , wherein an end of the optical fiber is configured with a lens for optical communication to and from a light source-based detection system for a single-port and a single interface for receiving a source spectrum and transmitting a reflected spectrum.
8. The apparatus according to claim 1 , wherein the Fiber Bragg Grating sensors are disposed in the spiral or spiral-like pattern along a curved portion thereof.
9. The apparatus according to claim 1 , wherein the spiral or spiral-like pattern is formed as a cavity in the platform.
10. The apparatus according to claim 9 , wherein the Fiber Bragg Grating sensors are disposed in the spiral or spiral-like pattern including along a curved portion thereof in the cavity.
11. The apparatus according to claim 9 , wherein the optical fiber is located below an upper surface of the platform.
12. The apparatus according to claim 9 , wherein the platform is a wafer.
13. The apparatus according to claim 12 , wherein the wafer is a silicon wafer.
14. The apparatus according to claim 1 , wherein the platform is a wafer.
15. The apparatus according to claim 14 , wherein the wafer is a silicon wafer.