IP Library › Granted Patent US 12,219,693
Granted Patent B2
US 12,219,693 · App. 17/979,262 · Granted Feb 4, 2025

Carrier structure

Inventors: Chin-Wei Hsu (Taichung, TW); Jui-Kun Wang (Taichung, TW); Shu-Yu Ko (Taichung, TW); Fang-Wei Chang (Taichung, TW); Hsiu-Fang Chien (Taichung, TW)
Assignee: SILICONWARE PRECISION INDUSTRIES CO., LTD.
H05K1/0266H01L23/544H05K3/0008H01L2223/54426H01L2223/54453H05K2203/166H05K2203/167
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,219,693
App. No.
17/979,262
Granted
Feb 4, 2025
Kind
B2
Abstract

A carrying structure is defined with a main area and a peripheral area adjacent to the main area, where a plurality of packaging substrates are disposed in the main area in an array manner, a plurality of positioning holes are disposed in the peripheral area, and a plurality of positioning traces are formed along a part of the edges of the plurality of positioning holes, such that the plurality of positioning traces are formed with notches.

Claims (14)

1. A carrier structure being defined with a main area and a peripheral area adjacent to the main area, the carrier structure comprising:

a plurality of packaging substrates disposed in the main area;

a plurality of positioning holes disposed in the peripheral area; and

a plurality of positioning traces disposed in the peripheral area and arranged along a part of edges of the plurality of positioning holes.

2. The carrier structure of claim 1 , wherein the plurality of positioning traces are free from surrounding entire edges of the plurality of positioning holes to form notches.

3. The carrier structure of claim 2 , wherein the notches of the plurality of positioning traces are facing toward the main area.

4. The carrier structure of claim 1 , wherein the plurality of positioning traces are arranged on the edges of the plurality of positioning holes away from sides of the main area.

5. The carrier structure of claim 1 , wherein the plurality of positioning holes are circular, and the plurality of positioning traces surround semicircular edges of the plurality of positioning holes and present semicircular arcs.

6. The carrier structure of claim 1 , wherein the plurality of positioning holes are circular, and the plurality of positioning traces surround quarter-circular edges of the plurality of positioning holes and present quarter-circular arcs.

7. The carrier structure of claim 1 , wherein the plurality of positioning holes are circular, and the plurality of positioning traces surround most of the edges of the plurality of positioning holes and not arranged at top of arcs of the positioning holes.

8. The carrier structure of claim 1 , further comprising an insulating protective layer covering the peripheral area and the main area, wherein the insulating protective layer is formed with a plurality of openings, and the plurality of positioning holes and the plurality of positioning traces are exposed from the plurality of openings.

9. The carrier structure of claim 8 , wherein shapes of the plurality of openings are corresponding to contour shapes formed by the plurality of positioning holes and the plurality of positioning traces on the edges of the positioning holes.

10. The carrier structure of claim 8 , wherein shapes of the plurality of openings are symmetrical.

11. The carrier structure of claim 8 , wherein shapes of the plurality of openings are asymmetrical.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 2, 2022
From: HSU, CHIN-WEI; WANG, JUI-KUN; KO, SHU-YU; CHANG, FANG-WEI; CHIEN, HSIU-FANG
To: SILICONWARE PRECISION INDUSTRIES CO., LTD.
Reel/Frame 061632/0164 →
Priority Claims (1)
TW 111129375 · Aug 4, 2022 · national
Continuity (1)
Related Publication 20240049382A1 · Feb 8, 2024
References Cited (52)
US 5637835A · Matern · 1997 [cited by examiner]
US 5691242A · Nomi · 1997 [cited by examiner]
US 6150614A · Miller · 2000 [cited by examiner]
US 6246015B1 · Kim · 2001 [cited by examiner]
US 6268568B1 · Kim · 2001 [cited by examiner]
US 6324754B1 · DiStefano · 2001 [cited by examiner]
US 6428641B1 · Yoon · 2002 [cited by examiner]
US 6531762B1 · Liao · 2003 [cited by examiner]
US 6573610B1 · Tsai · 2003 [cited by examiner]
US 6615448B2 · Melara · 2003 [cited by examiner]
US 6646349B1 · Pu · 2003 [cited by examiner]
US 6812803B2 · Goergen · 2004 [cited by examiner]
US 6879494B2 · Zu · 2005 [cited by examiner]
US 7079399B2 · Wang · 2006 [cited by examiner]
US 7394159B2 · Goto · 2008 [cited by examiner]
US 7419897B2 · Shih · 2008 [cited by examiner]
US 7553166B2 · Gobron · 2009 [cited by examiner]
US 9177893B2 · Mauder · 2015 [cited by examiner]
US 9236674B2 · Rabinovitz · 2016 [cited by examiner]
US 9263380B2 · Tsai · 2016 [cited by examiner]
US 9699910B2 · Tang · 2017 [cited by examiner]
US 10468181B1 · Vinciarelli · 2019 [cited by examiner]
US 10522453B2 · Lin · 2019 [cited by examiner]
US 10785871B1 · Vinciarelli · 2020 [cited by examiner]
US 10849212B2 · Siu · 2020 [cited by examiner]
US 10863626B1 · Huang · 2020 [cited by examiner]
US 11470714B2 · Feng · 2022 [cited by examiner]
US 20030070931A1 · Kitchens · 2003 [cited by examiner]
US 20070243666A1 · Huang · 2007 [cited by examiner]
US 20070278659A1 · Chang · 2007 [cited by examiner]
US 20160064316A1 · Carpenter · 2016 [cited by examiner]
US 20200128671A1 · Xiang · 2020 [cited by examiner]
US 20220386460A1 · Chang · 2022 [cited by examiner]
US 20240049382A1 · Hsu · 2024 [cited by examiner]
CN 102986307A · 2013 [cited by examiner]
CN 105874590A · 2016 [cited by examiner]
CN 106505059A · 2017 [cited by examiner]
CN 110024115A · 2019 [cited by examiner]
CN 113260134A · 2021 [cited by examiner]
DE 69434160T2 · 2005 [cited by examiner]
DE 60314868T2 · 2008 [cited by examiner]
DE 102011084326A1 · 2013 [cited by examiner]
DE 202019001963U1 · 2019 [cited by examiner]
EP 0645276B1 · 1998 [cited by examiner]
JP H1027861A · 1998 [cited by examiner]
JP H10247656A · 1998 [cited by examiner]
JP 5003359B2 · 2012 [cited by examiner]
KR 20010012575A · 2001 [cited by examiner]
TW I234258B · 2005 [cited by examiner]
TW 201032311A · 2010 [cited by examiner]
TW 202013640A · 2020 [cited by examiner]
TW 202301577A · 2023 [cited by examiner]