IP Library › Granted Patent US 12,645,123
Granted Patent B2
US 12,645,123 · App. 18/051,852 · Granted Jun 2, 2026

Designing optical and electrical properties of electrochromic devices via tuning of parameters

Inventors: Hannah Leung Ray (Minneapolis, MN); Wen Li (Lakeville, MN); Theo Chevallier (Paris, FR); Frank McGrogan (Faribault, MN); Yigang Wang (Maple Grove, MN); Chloe Bouard (Vincennes, FR); Amaury Patissier (Paris, FR); Elsa Perrin (Paris, FR); Shefali Panse (Northfield, MN); Marie-Caroline Solignac (Paris, FR)
Assignee: SAGE Electrochromics, Inc.
G02F1/163G02F1/1514G02F1/155G02F2001/1555
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Quick Facts
Patent No.
US 12,645,123
App. No.
18/051,852
Granted
Jun 2, 2026
Kind
B2
Abstract

Various embodiments disclosed herein relate to techniques for simultaneously designing optical and electrical properties of an electrochromic device by tuning specific parameters of the electrochromic device. One or more models representing respective relationships of the optical and electrical properties with respect to the individual ones of the parameters of the device may be obtained. Given specific values of the optical and/or electrical properties, at least one of the parameters may be adjusted to simultaneously control the optical and electrical properties according to the given specific values.

Claims (35)

1 . A method, comprising:

receiving, by an electrochromic device design system, information indicative of one or more desired properties for an electrochromic device, the one or more desired properties including at least one of:

a desired optical property of the electrochromic device and including at least one of a level of transparency in a clear state, a level of transparency in a dark state, a contrast, a coloration efficiency, a color in the clear state, or a color in the dark state, or

a desired electrical property of the electrochromic device and including at least one of a control voltage, a current, or a leakage current;

obtaining, by the electrochromic device design system, one or more models representing respective relationships of the desired optical property or the desired electrical property with respect to one or more parameters of the electrochromic device, wherein the one or more parameters include at least one of a deposition temperature, a thickness of a counter-electrode (CE) layer, a thickness of an electrochromic electrode (EC) layer, a ratio of the thickness between the CE layer and the EC layer, or an amount of lithium doping within the electrochromic device; and

adjusting, by the electrochromic device design system based on the obtained one or more models, at least one parameter of the one or more parameters for the electrochromic device to specify a new deposition temperature parameter, a new thickness of a counter-electrode (CE) layer parameter, a new thickness of an electrochromic electrode (EC) layer parameter, a new ratio of the thickness between the CE layer and the EC layer, or a new amount of lithium doping parameter for use in forming the electrochromic device to achieve the one or more desired properties for the electrochromic device.

2 . The method of claim 1 , wherein adjusting the at least one parameter of the one or more parameters for the electrochromic device comprises adjusting the thickness of the CE layer for the electrochromic device.

3 . The method of claim 1 , wherein adjusting the at least one parameter of the one or more parameters for the electrochromic device comprises adjusting the thickness of the EC layer for the electrochromic device.

4 . The method of claim 1 , wherein adjusting the at least one parameter of the one or more parameters for the electrochromic device comprises adjusting the amount of lithium doping for the electrochromic device.

5 . The method of claim 1 , wherein adjusting the at least one parameter of the one or more parameters for the electrochromic device comprises adjusting the ratio between the thickness of the EC layer and the thickness of the CE layer with respect to an amount of lithium doping for the electrochromic device.

6 . The method of claim 1 , wherein adjusting the at least one parameter of the one or more parameters for the electrochromic device comprises adjusting the deposition temperature to change phase morphology of the electrochromic device.

7 . The method of claim 6 , wherein adjusting the phase morphology of the electrochromic device comprises adjusting a fraction of crystalline phase of tungsten oxide (WOx) within the electrochromic device.

8 . The method of claim 1 , wherein the desired optical property of the electrochromic device comprises a desired level of transparency of the electrochromic device with respect to at least one of a specified voltage applied across the electrochromic device or a specified leakage current flowing through the electrochromic device.

9 . The method of claim 1 , wherein the desired electrical property of the electrochromic device comprises a value of at least one of a desired voltage across the electrochromic device or a desired leakage current flowing through the electrochromic device with respect to a specified level of transparency for the electrochromic device.

10 . An electrochromic device design system, comprising:

a storage unit configured to store one or more models representing relationships of at least one of a desired optical property of an electrochromic device, or a desired electrical property of the electrochromic device with respect to one or more parameters of the electrochromic device, wherein the desired optical property includes at least one of a level of transparency in a clear state, a level of transparency in a dark state, a contrast, a coloration efficiency, a color in the clear state, or a color in the dark state, and wherein the desired electrical property includes at least one of a control voltage, a current, or a leakage current; and

a processing unit configured to:

receive, via an interface, an input indicative of at least one of the desired optical property or the desired electrical property of the electrochromic device;

obtain, from the storage unit, at least one model of the one or more models representing the relationships of the desired optical property or the desired electrical property with respect to the one or more parameters of the electrochromic device;

determine, using the obtained at least one model and according to the received input, at least one value of at least one parameter of the one or more parameters for the electrochromic device to specify a new a deposition temperature parameter, a new thickness of a counter-electrode (CE) layer parameter, a new thickness of an electrochromic electrode (EC) layer parameter, a new ratio of the thickness between the CE layer and the EC layer parameter, or new an amount of lithium doping parameter for use in forming the electrochromic device to achieve the one or more desired properties for the electrochromic device; and

provide, via the interface, an output indicative of the at least one determined value of the at least one parameter of the one or more parameters for the electrochromic device to reach at least one of the desired optical property for the electrochromic device or the desired electrical property for the electrochromic device.

11 . The system of claim 10 , wherein the at least one value of the at least one parameter of the one or more parameters for the electrochromic device comprises the thickness of the CE layer for the electrochromic device.

12 . The system of claim 10 , wherein the at least one value of the at least one parameter of the one or more parameters for the electrochromic device comprises the thickness of the EC layer for the electrochromic device.

13 . The system of claim 10 , wherein the at least value of the at least one parameter of the one or more parameters for the electrochromic device comprises the amount of lithium doping for the electrochromic device.

14 . The system of claim 10 , wherein the at least value of the at least one parameter of the one or more parameters for the electrochromic device comprises the ratio between the thickness of the EC layer and the thickness of the CE layer with respect to the amount of lithium doping for the electrochromic device.

15 . The system of claim 10 , wherein the at least one value of the at least one parameter of the one or more parameters for the electrochromic device comprises the deposition temperature to change phase morphology for the electrochromic device.

16 . The system of claim 15 , wherein changing the phase morphology for the electrochromic device comprises adjusting a fraction of crystalline phase of tungsten oxide (WOx) within the electrochromic device.

17 . The system of claim 10 , wherein the desired optical property of the electrochromic device comprises a desired level of transparency of the electrochromic device with respect to at least one of a specified voltage applied across the electrochromic device or a specified leakage current flowing through the electrochromic device.

18 . The system of claim 10 , wherein the desired electrical property of the electrochromic device comprises a desired voltage across the electrochromic device or a desired leakage current flowing through the electrochromic device with respect to a specified level of transparency for the electrochromic device.

19 . A system, comprising:

at least one processor; and

memory storing program instructions that are executable by the at least one processor, wherein, in response to receiving, via an interface, an input indicative of a desired value for at least one of a desired optical property of an electrochromic device and including at least one of a level of transparency in a clear state, a level of transparency in a dark state, a contrast, a coloration efficiency, a color in the clear state, or a color in the dark state, or a desired electrical property of the electrochromic device and including at least one of a control voltage, a current, or a leakage current, the program instructions are configured to cause the at least one processor to:

obtain one or more models representing relationships between property values of the electrochromic device and one or more parameters of the electrochromic device, wherein the one or more parameters including at least one of a deposition temperature, a thickness of a counter-electrode (CE) layer, a thickness of an electrochromic electrode (EC) layer, a ratio of the thickness between the CE layer and the EC layer, or an amount of lithium doping within the electrochromic device;

determine, using the obtained one or more models and according to the desired value of the received input, at least one value of at least one parameter of the one or more parameters of the electrochromic device to specify a new deposition temperature parameter, a new thickness of a counter-electrode (CE) layer parameter, a new thickness of an electrochromic electrode (EC) layer parameter, a new ratio of the thickness between the CE layer and the EC layer parameter, or new an amount of lithium doping parameter for use in forming the electrochromic device to achieve the one or more desired properties for the electrochromic device; and

provide, via the interface, an output indicative of the desired value for the electrochromic device to reach at least one of the desired optical property for the electrochromic device or the desired electrical property for the electrochromic device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 2, 2022
From: RAY, HANNAH LEUNG; LI, WEN; CHEVALLIER, THEO; MCGROGAN, FRANK; WANG, YIGANG; BOUARD, CHLOE; PATISSIER, AMAURY; PERRIN, ELSA; PANSE, SHEFALI; SOLIGNAC, MARIE-CAROLINE
To: SAGE ELECTROCHROMICS, INC.
Reel/Frame 061630/0128 →
Continuity (2)
Provisional Application 63274906 · Nov 2, 2021
Related Publication 20230168559A1 · Jun 1, 2023
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