Open Czochralski furnace for single crystal growth
View Patent ↗The present disclosure provides a temperature field device for crystal growth. The temperature field device may include a first drum; a second drum located inside the first drum; a filler filled in a space between the first drum and the second drum; a bottom plate mounted on a bottom of the temperature field device and covering a bottom end of the first drum; and a first cover plate mounted on a top of the temperature filed device and covering a top end of the first drum.
1. A temperature field device for crystal growth, comprising:
a first drum;
a second drum located inside the first drum;
a filler filled in a space between the first drum and the second drum;
a bottom plate mounted on a bottom of the temperature field device and covering a bottom end of the first drum;
a first cover plate mounted on a top of the temperature field device and covering a top end of the first drum;
an observation unit mounted on the first cover plate, wherein the observation unit includes a through hole opened on the observation unit, and the through hole is configured for gas passing; and
a gas channel mounted on the observation unit, wherein a size of the gas channel is matched with a size of the through hole.
2. The temperature field device of claim 1 , wherein the filler is further filled in the second drum and configured to support a crucible.
3. The temperature field device of claim 2 , wherein a filling height of the filler filled in the second drum is adjusted to make that a vertical distance between an upper edge of the crucible and an upper edge of a heater located outside the temperature field device is within 0˜∓50 mm.
4. The temperature field device of claim 2 , wherein a tightness of the filler filled in the second drum is adjusted to adjust a temperature gradient in the temperature field device.
5. The temperature field device of claim 1 , wherein a particle size of the filler is 5-200 mesh.
6. The temperature field device of claim 1 , wherein the filler includes at least one of a granule shaped material, a brick shaped material, or a felt shaped material.
7. The temperature field device of claim 1 , wherein a height of the second drum is smaller than a height of the first drum.
8. The temperature field device of claim 1 , wherein a thickness of the first drum is 1-15 mm.
9. The temperature field device of claim 1 , wherein a height of the first drum is 600-1600 mm.
10. The temperature field device of claim 1 , wherein a thickness of the second drum is 8-30 mm.
11. The temperature field device of claim 1 , wherein a height of the second drum is 500-1500 mm.
12. The temperature field device of claim 1 , wherein a level requirement of the bottom plate is less than 0.5 mm/m, wherein the level requirement of the bottom plate refers to a height difference between two ends of the bottom plate per unit length.
13. The temperature field device of claim 1 , wherein a thickness of the first cover plate is within 10-40 mm.
14. The temperature field device of claim 1 , wherein the first cover plate includes:
a second through hole configured to allow a gas to enter into the temperature field device; and
a third through hole configured to allow the gas to exit from the temperature field device.
15. The temperature field device of claim 14 , wherein a diameter of the second through hole or a diameter of the third through hole is within 15-30 mm.
16. The temperature field device of claim 14 , wherein a distance between the second through hole and the third through hole is within 70-150 mm.
17. The temperature field device of claim 14 , wherein a rotation central axis of the second through hole or the third through hole is perpendicular to a horizontal plane or forms an angle of 3-20 degrees with a vertical line of the horizontal plane.
18. The temperature field device of claim 1 , further comprising a second cover plate mounted inside the first drum and covering a top end of the second drum, wherein a thickness of the second cover plate is within 20-35 mm.
19. The temperature field device of claim 1 , wherein a concentricity among the first drum, the second drum, the bottom plate, and the first cover plate is less than 1 mm.
20. The temperature field device of claim 1 , wherein a perpendicularity among the first drum, the second drum, the bottom plate, and the first cover plate is less than 0.2°.