IP Library › Granted Patent US 11,990,317
Granted Patent B2
US 11,990,317 · App. 18/086,406 · Granted May 21, 2024

High-frequency power supply system

Inventor: Yuichi Hasegawa (Osaka, JP)
Assignee: DAIHEN CORPORATION
H01J37/32165H01J37/32183H01J2237/327
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Quick Facts
Patent No.
US 11,990,317
App. No.
18/086,406
Granted
May 21, 2024
Kind
B2
Abstract

To simplify a process of suppressing an increase in a reflected wave power caused by IMD, provided is a high-frequency power supply system for providing a high-frequency power to a load, including: a first power supply for supplying a first high-frequency power to the load; a second power supply for supplying a second high-frequency power to the load; and a matching device. The matching device provides a system clock to each of the first power supply and the second power supply. The second power supply outputs a second high-frequency voltage at a control period determined based on the system clock provided from the matching device. The first power supply outputs a first high-frequency voltage obtained by frequency modulation of a fundamental wave signal having a first fundamental frequency and through amplification, in each control period determined based on the system clock provided from the matching device.

Claims (10)

1. A high-frequency power supply system for providing a high-frequency power to a connected load, the system comprising:

a first power supply configured to output a first high-frequency voltage having a first fundamental frequency so as to supply a first high-frequency power to the load;

a second power supply configured to output a second high-frequency voltage having a second fundamental frequency that is lower than the first fundamental frequency so as to supply a second high-frequency power to the load; and

a matching device including a first matching part connected between the first power supply and the load and a second matching part connected between the second power supply and the load,

wherein:

the matching device provides a system clock to each of the first power supply and the second power supply,

the second power supply outputs a second high-frequency voltage at a control period determined based on the system clock provided from the matching device, and

the first power supply outputs a first high-frequency voltage obtained by frequency modulation of a fundamental wave signal having a first fundamental frequency and through amplification, in each control period determined based on the system clock provided from the matching device.

2. The high-frequency power supply system according to claim 1 , wherein frequency modulation in the first power supply is for performing frequency modulation on the fundamental wave signal with a signal for which a modulation start phase and a modulation amount gain are set.

3. The high-frequency power supply system according to claim 2 , wherein the first power supply generates a trigger signal based on the system clock and, in response to the trigger signal, updates the modulation start phase and the modulation amount gain.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 22, 2022
From: HASEGAWA, YUICHI
To: DAIHEN CORPORATION
Reel/Frame 062191/0713 →
Priority Claims (1)
JP 2021-214221 · Dec 28, 2021 · national
Continuity (1)
Related Publication 20230207264A1 · Jun 29, 2023
Cited By (3)
US 12,244,286 US 12,451,330 US 12,476,084