Patterned nanoparticle structures
Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.
1. A method of forming a patterned nanostructure, comprising:
applying a first nanoparticle composition to a surface of a substrate, wherein the first nanoparticle composition includes a plurality of first nanoparticles, and wherein the plurality of first nanoparticles has an average particle size of less than 100 nm;
using a first patterned mold to form the first nanoparticle composition into a first patterned nanostructure layer, wherein a first feature size of the first patterned nanostructure layer is less than 5 microns; and
depositing a coating onto the first patterned nanostructure layer using atomic layer deposition, wherein the coating is disposed at least partially within pores of the first patterned nanostructure layer.
2. The method of claim 1 comprising treating the patterned nanostructure to remove organics.
3. The method of claim 2 , wherein organics are removed from the patterned nanostructure by thermal processes, hydrothermal processes, treatments with plasmas or UV irradiation.
4. The method of claim 2 , wherein organics are removed from the patterned nanostructure prior to atomic layer deposition.
5. The method of claim 2 , wherein organics are removed from the patterned nanostructure after atomic layer deposition.
6. The method of claim 1 , wherein the first patterned nanostructure layer includes features with an aspect ratio of height to width between or equal to 1.5:1 and 10:1.
7. The method of claim 1 , wherein using the first patterned mold to form the first nanoparticle composition into the first patterned nanostructure layer comprises pressing the first patterned mold into the first nanoparticle composition.
8. The method of claim 1 , wherein forming the first patterned nanostructure layer further comprises using electromagnetic radiation to cure the first nanoparticle composition.
9. The method of claim 1 , wherein the first patterned nanostructure layer has an index of refraction of between 1.5 and 5.0.
10. The method of claim 1 , wherein a geometry of the first patterned nanostructure layer is constructed and arranged to manipulate electromagnetic radiation.
11. A method of forming a patterned nanostructure, comprising:
applying a first nanoparticle composition to a surface of a substrate, wherein the first nanoparticle composition includes a plurality of first nanoparticles, and wherein the plurality of first nanoparticles has an average particle size of less than 100 nm;
using a first patterned mold to form the first nanoparticle composition into a first patterned nanostructure layer, wherein a first feature size of the first patterned nanostructure layer is less than 5 microns; and
depositing a coating at least partially within pores of the first patterned nanostructure layer so as to reduce porosity within the first patterned nanostructure layer.
12. The method of claim 11 , wherein the coating is deposited using atomic layer deposition.
13. The method of claim 11 , comprising treating the patterned nanostructure to remove organics.
14. The method of claim 13 , wherein organics are removed from the patterned nanostructure by thermal processes, hydrothermal processes, treatments with plasmas or UV irradiation.
15. The method of claim 11 , wherein the first patterned nanostructure layer includes features with an aspect ratio of height to width between or equal to 1.5:1 and 10:1.
16. The method of claim 11 , wherein using the first patterned mold to form the first nanoparticle composition into the first patterned nanostructure layer comprises pressing the first patterned mold into the first nanoparticle composition.
17. The method of claim 11 , wherein forming the first patterned nanostructure layer further comprises using electromagnetic radiation to cure the first nanoparticle composition.
18. The method of claim 11 , wherein the first patterned nanostructure layer has an index of refraction of between 1.5 and 5.0.
19. The method of claim 11 , wherein a geometry of the first patterned nanostructure layer is constructed and arranged to manipulate electromagnetic radiation.
20. The method of claim 11 , wherein the first patterned nanostructure layer is substantially optically transparent at at least one wavelength.