Light emitting element, light emitting device, and electronic apparatus
An organic EL element includes a pixel electrode, a light emitting function layer that is formed on the pixel electrode, an electron injection layer formed on the light emitting function layer, and a counter electrode that is formed on the electron injection layer and that has semi-transmissive reflectivity, in which the counter electrode contains a reductive material that reduces material of the electron injection layer and Ag with atomic ratio of 75% or more, and an adsorption layer is formed on the counter electrode.
1. A light emitting element comprising:
a first electrode, that functions as a positive electrode, wherein the first electrode comprises a transparent conductive film;
a light emitting function layer formed above the first electrode;
a first layer formed above the light emitting function layer, the first layer having an electron injection function and comprising an element having a low work function;
a second electrode, that functions as a negative electrode, formed above the first layer, wherein the second electrode comprises Ag with Ag having an atomic ratio of 90% or more and 98% or less; and
an adsorption layer comprising Mg that is formed on and in direct contact with the second electrode, wherein the adsorption layer is not in contact with the first layer, and wherein the thickness of the adsorption layer is less than 5 nm.
2. The light emitting element according to claim 1 , wherein the thickness of the adsorption layer is less than 3 nm.
3. The light emitting element according to claim 2 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
4. The light emitting element according to claim 1 , wherein the thickness of the adsorption layer is less than 2 nm.
5. The light emitting element according to claim 4 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
6. The light emitting element according to claim 1 , wherein the thickness of the adsorption layer is approximately 1 nm.
7. The light emitting element according to claim 6 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
8. The light emitting element according to claim 1 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
9. The light emitting element according to claim 1 , wherein the second electrode further comprises a reductive material comprising Mg.
10. The light emitting element according to claim 9 , wherein the adsorption layer is formed of the reductive material of the second electrode using the same deposition method.
11. The light emitting element according to claim 10 , wherein the adsorption layer reacts to form magnesium oxide.
12. The light emitting element according to claim 1 , wherein the first layer comprises a material which includes LiQ or LiF.
13. The light emitting element according to claim 1 , wherein the thickness of the second electrode is not greater than approximately 15 nm.
14. The light emitting element according to claim 13 , wherein the thickness of the second electrode is approximately 15 nm.
15. The light emitting element according to claim 1 , wherein the transparent conductive film comprises ITO.
16. A light emitting device, comprising:
a plurality of pixels, each of the plurality of pixels including the light emitting element according to claim 1 ,
wherein a pixel arrangement pitch of the plurality of pixels is 10 μm or less.
17. A light emitting device comprising the light emitting element according to claim 1 .
18. A light emitting element comprising:
a first electrode, that functions as a positive electrode, wherein the first electrode comprises a transparent conductive film;
a light emitting function layer formed above the first electrode;
a first layer formed above the light emitting function layer, the first layer having an electron injection function and comprising an element having a low work function;
a second electrode, that functions as a negative electrode, formed above the first layer, wherein the second electrode comprises Ag with Ag having an atomic ratio of 90% or more and 98% or less, wherein the thickness of the second electrode is not greater than approximately 15 nm; and
an adsorption layer comprising Mg that is formed on and in direct contact with the second electrode, wherein the adsorption layer is not in contact with the first layer, and wherein the thickness of the adsorption layer is less than 5 nm.
19. The light emitting element according to claim 18 , wherein the thickness of the second electrode is approximately 15 nm.
20. The light emitting element according to claim 18 , wherein the thickness of the adsorption layer is less than 3 nm.
21. The light emitting element according to claim 20 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
22. The light emitting element according to claim 18 , wherein the thickness of the adsorption layer is less than 2 nm.
23. The light emitting element according to claim 22 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
24. The light emitting element according to claim 18 , wherein the thickness of the adsorption layer is approximately 1 nm.
25. The light emitting element according to claim 24 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
26. The light emitting element according to claim 18 , wherein a light absorption rate of the adsorption layer is approximately 30% or less.
27. The light emitting element according to claim 18 , wherein the second electrode further comprises a reductive material comprising Mg, and wherein the adsorption layer is formed of the reductive material of the second electrode using the same deposition method.
28. The light emitting element according to claim 27 , wherein the adsorption layer reacts to form magnesium oxide.
29. The light emitting element according to claim 18 , wherein the first layer comprises a material which includes LiQ or LiF.
30. The light emitting element according to claim 18 , wherein the transparent conductive film comprises ITO.