IP Library Granted Patent US 12,195,872
Granted Patent B2
US 12,195,872 · App. 18/151,992 · Granted Jan 14, 2025

Ingot puller apparatus that use a solid-phase dopant

Inventors: William L. Luter (St. Charles, MO); Hariprasad Sreedharamurthy (Ballwin, MO); Stephan Haringer (Kastelbell/Tschars, IT); Richard J. Phillips (St. Peters, MO); Nan Zhang (O'Fallon, MO); Yu-Chiao Wu (Frontenac, MO)
Assignee: GlobalWafers Co., Ltd.
C30B15/04C30B15/10C30B15/14C30B29/06C30B35/002C30B35/007Y10T117/00Y10T117/10
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Quick Facts
Patent No.
US 12,195,872
App. No.
18/151,992
Granted
Jan 14, 2025
Kind
B2
Abstract

Methods for producing a single crystal silicon ingot are disclosed. The ingot is doped with boron using solid-phase boric acid as the source of boron. Boric acid may be used to counter-dope the ingot during ingot growth. Ingot puller apparatus that use a solid-phase dopant are also disclosed. The solid-phase dopant may be disposed in a receptacle that is moved closer to the surface of the melt or a vaporization unit may be used to produce a dopant gas from the solid-phase dopant.

Claims (26)

1. An ingot puller apparatus for producing a doped single crystal silicon ingot, the ingot puller apparatus comprising:

an ingot puller outer housing;

an ingot puller inner chamber formed within the ingot puller outer housing;

a crucible disposed within the ingot puller inner chamber;

a dopant conduit having a gas inlet disposed exterior to the ingot puller inner chamber and a gas outlet disposed in the ingot puller inner chamber; and

a dopant vaporization unit disposed exterior to the ingot puller inner chamber and comprising:

a dopant chamber for holding solid-phase dopant;

a heating device for heating the solid-phase dopant and producing a dopant gas;

an outlet through which the dopant gas passes, the outlet being in fluid communication with the dopant conduit;

a first inlet for introducing a process gas, the first inlet being exterior to the ingot puller outer housing, the first inlet being in fluid communication with the dopant chamber, the process gas passing through the dopant chamber and through the outlet;

a second inlet for introducing a process gas, the second inlet being exterior to the ingot puller outer housing, the second inlet being in fluid communication with the dopant chamber; and

an isolation valve within a process gas pathway downstream of the dopant chamber for isolating the vaporization unit from the ingot puller inner chamber.

2. The ingot puller apparatus as set forth in claim 1 comprising one or more heaters disposed below or to the side of the crucible, the heating device being separate from the one or more heaters disposed below or to the side of the crucible.

3. An ingot puller apparatus for producing a doped single crystal silicon ingot, the ingot puller apparatus comprising:

an ingot puller outer housing;

an ingot puller inner chamber formed within the ingot puller outer housing;

a crucible disposed within the ingot puller inner chamber;

one or more heaters disposed below or to the side of the crucible;

a dopant conduit having a gas inlet disposed exterior to the ingot puller inner chamber and a gas outlet disposed in the ingot puller inner chamber; and

a dopant vaporization unit disposed exterior to the ingot puller inner chamber and comprising:

a dopant chamber for holding solid-phase dopant;

a heating chamber that surrounds the dopant chamber;

a heating device for heating the solid-phase dopant and producing a dopant gas, the heating device being separate from the one or more heaters disposed below or to the side of the crucible;

a thermal shield to reduce heat lost through the heating chamber;

an outlet through which the dopant gas passes, the outlet being in fluid communication with the dopant conduit; and

an inlet for introducing a process gas, the inlet being exterior to the ingot puller outer housing, the inlet being in fluid communication with the dopant chamber, the process gas passing through the dopant chamber and through the outlet.

Assignments (7)
CORRECTIVE ASSIGNMENT TO CORRECT THE CONVEYING PARTY DATA PREVIOUSLY RECORDED ON REEL 62525 FRAME 674. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECTIVE ASSIGNMENT. Recorded Dec 2, 2024
From: LUTER, WILLIAM L.; SREEDHARAMURTHY, HARIPRASAD; HARINGER, STEPHAN; PHILLIPS, RICHARD J.; WU, YU-CHIAO
To: GLOBALWAFERS CO., LTD.
Reel/Frame 069470/0077 →
CORRECTIVE ASSIGNMENT TO CORRECT THE 3RD INVENTOR STEPHEN HARINGER WAS LISTED ON THE ASSIGNMENT AND NEEDS ADDED TO THE NOTICE OF RECORDATION PREVIOUSLY RECORDED AT REEL: 062357 FRAME: 0050. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jan 27, 2023
From: LUTER, WILLIAM L.; SREEDHARAMURTHY, HARIPRASAD; HARINGER, STEPHAN; PHILLIPS, RICHARD J.; WU, YU-CHAIO
To: GLOBALWAFERS CO., LTD.
Reel/Frame 062525/0674 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 12, 2023
From: LUTER, WILLIAM L.; SREEDHARAMURTHY, HARIPRASAD; PHILLIPS, RICHARD J.; WU, YU-CHAIO
To: GLOBALWAFERS CO., LTD.
Reel/Frame 062357/0050 →
EMPLOYEE AGREEMENT Recorded Jan 12, 2023
From: ZHANG, NAN
To: MEMC ELECTRONIC MATERIALS, INC.
Reel/Frame 062378/0661 →
SEPARATION AGREEMENT Recorded Jan 12, 2023
From: SUNEDISON, INC.
To: SUNEDISON SEMICONDUCTOR LIMITED
Reel/Frame 062378/0738 →
CHANGE OF NAME Recorded Jan 12, 2023
From: MEMC ELECTRONIC MATERIALS, INC.
To: SUNEDISON, INC.
Reel/Frame 062378/0869 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 12, 2023
From: SUNEDISON SEMICONDUCTOR LIMITED; MEMC JAPAN LTD; MEMC ELECTRONIC MATERIALS, S.P.A.
To: GLOBALWAFERS CO., LTD.
Reel/Frame 062378/0885 →
Continuity (3)
Division 16875468 · May 15, 2020
Provisional Application 62868573 · Jun 28, 2019
Related Publication 20230160094A1 · May 25, 2023
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