Fabrication of asymmetric mandrel structures in semiconductor device
A semiconductor structure includes a first plurality of mandrel structures extending outwardly from a substrate. Each of the first plurality of mandrel structures includes a first side at a first inclination angle with respect to a surface plane of the substrate and a second side at a second inclination angle with respect to the surface plane of the substrate. A second plurality of mandrel structures extend outwardly from the substrate. Each of the second plurality of mandrel structures include a third side at a third inclination angle with respect to the surface plane of the substrate and a fourth side at a fourth inclination angle with respect to the surface plane of the substrate. A template structure for an imprint mask is formed by the first plurality of mandrel structures and the second plurality of mandrel structures.
1 . A semiconductor structure, comprising:
a first plurality of mandrel structures extending outwardly from a substrate, each of the first plurality of mandrel structures including a first side and a second side, the second side opposing the first side, the first side of each of the first plurality of mandrel structures being at a first inclination angle with respect to a surface plane of the substrate, and the second side of each of the first plurality of mandrel structures being at a second inclination angle with respect to the surface plane of the substrate; and
a second plurality of mandrel structures extending outwardly from the substrate, each of the second plurality of mandrel structures including a third side and a fourth side, the fourth side opposing the third side, the third side of each of the second plurality of mandrel structures being at a third inclination angle with respect to the surface plane of the substrate, and the fourth side of each of the second plurality of mandrel structures being at a fourth inclination angle with respect to the surface plane of the substrate,
wherein at least one of the first inclination angle or the second inclination angle differs from at least one of the third inclination angle or the fourth inclination angle, the first plurality of mandrel structures and the second plurality of mandrel structures are adapted for use as a template structure for an imprint mask, the first plurality of mandrel structures and the second plurality of mandrel structures include an epitaxially grown graded semiconductor material, and a first portion of the substrate includes the first plurality of mandrel structures and a second portion of the substrate includes the second plurality of mandrel structures.
2 . The semiconductor structure of claim 1 , further comprising:
a layer of a conformal dielectric material covering the first plurality of mandrel structures and the second plurality of mandrel structures, the layer of conformal dielectric material providing stability and uniformity to the first plurality of mandrel structures and the second plurality of mandrel structures.
3 . The semiconductor structure of claim 1 , wherein the first inclination angle and the second inclination angle are different from 90 degrees, and the third inclination angle and the fourth inclination angle are equal to 90 degrees.
4 . The semiconductor structure of claim 1 , wherein the first inclination angle, the second inclination angle, and the third inclination angle are different from 90 degrees, and the fourth inclination angle is equal to 90 degrees.
5 . The semiconductor structure of claim 1 , wherein the first inclination angle is similar to the third inclination angle and both are different from 90 degrees, and wherein the second inclination angle is similar to the fourth inclination angle and both are different from 90 degrees and different from the first inclination angle and the third inclination angle.
6 . The semiconductor structure of claim 1 , wherein the epitaxially grown graded semiconductor material includes a graded silicon-germanium layer, wherein a germanium concentration in the graded silicon-germanium layer is higher at a top end of the graded silicon-germanium layer and lower at a bottom end of the graded silicon-germanium layer.
7 . The semiconductor structure of claim 6 , wherein the graded silicon-germanium layer has an inverse germanium gradient in which the germanium concentration of the graded silicon-germanium layer is lower at the top end of the graded silicon-germanium layer and higher at the bottom end of the graded silicon-germanium layer.
8 . The semiconductor structure of claim 1 , further comprising:
a first portion of each of the first plurality of mandrel structures and a first portion of each of the second plurality of mandrel structures including the epitaxially grown graded semiconductor material; and
a second portion of each of the first plurality of mandrel structures and a second portion of each of the second plurality of mandrel structures including a doped semiconductor material, the first portion of each of the first plurality of mandrel structures opposing and being in contact with the second portion of each of the first plurality of mandrel structures, and the first portion of each of the second plurality of mandrel structures opposing and being in contact with the second portion of each of the second plurality of mandrel structures.
9 . The semiconductor structure of claim 8 , wherein the doped semiconductor material includes boron-doped silicon.
10 . The semiconductor structure of claim 8 , wherein an inclination angle of the second portion of the first plurality of mandrel structures and the second portion of the second plurality of mandrel structures is determined by a dopant concentration.
11 . The semiconductor structure of claim 1 , wherein the first plurality of mandrel structures and the second plurality of mandrel structures include a step graded layer including two or more steps having a different chemical composition.
12 . The semiconductor structure of claim 11 , wherein a first step of the two or more steps include a silicon layer, a second step of the two or more steps include a first silicon-germanium layer with a first germanium concentration and located above the silicon layer, and a third step of the two or more steps include a second silicon-germanium layer with a second germanium concentration and located above the first silicon-germanium layer, the second germanium concentration being higher than the first germanium concentration.
13 . The semiconductor structure of claim 12 , wherein the first side of the first plurality of mandrel structures and the third side of the second plurality of mandrel structures include a stepped profile, and the second side of the first plurality of mandrel structures and the fourth side of the second plurality of mandrel structures include an even and vertical profile with respect to the substrate.
14 . A semiconductor structure, comprising:
a first plurality of mandrel structures extending outwardly from a substrate, each of the first plurality of mandrel structures including a first side and a second side, the second side opposing the first side, the first side of each of the first plurality of mandrel structures being at a first inclination angle with respect to a surface plane of the substrate, and the second side of each of the first plurality of mandrel structures being at a second inclination angle with respect to the surface plane of the substrate; and
a second plurality of mandrel structures extending outwardly from the substrate, each of the second plurality of mandrel structures including a third side and a fourth side, the fourth side opposing the third side, the third side of each of the second plurality of mandrel structures being at a third inclination angle with respect to the surface plane of the substrate, and the fourth side of each of the second plurality of mandrel structures being at a fourth inclination angle with respect to the surface plane of the substrate,
wherein the first plurality of mandrel structures and the second plurality of mandrel structures are adapted for use as a template structure for an imprint mask, and wherein the first inclination angle and the second inclination angle are different from 90 degrees, and the third inclination angle and the fourth inclination angle are equal to 90 degrees.
15 . A semiconductor structure, comprising:
a first plurality of mandrel structures extending outwardly from a substrate, each of the first plurality of mandrel structures including a first side and a second side, the second side opposing the first side, the first side of each of the first plurality of mandrel structures being at a first inclination angle with respect to a surface plane of the substrate, and the second side of each of the first plurality of mandrel structures being at a second inclination angle with respect to the surface plane of the substrate; and
a second plurality of mandrel structures extending outwardly from the substrate, each of the second plurality of mandrel structures including a third side and a fourth side, the fourth side opposing the third side, the third side of each of the second plurality of mandrel structures being at a third inclination angle with respect to the surface plane of the substrate, and the fourth side of each of the second plurality of mandrel structures being at a fourth inclination angle with respect to the surface plane of the substrate,
wherein the first plurality of mandrel structures and the second plurality of mandrel structures are adapted for use as a template structure for an imprint mask, and wherein the first inclination angle, the second inclination angle, and the third inclination angle are different from 90 degrees, and the fourth inclination angle is equal to 90 degrees.