IP Library › Granted Patent US 12,717,228
Granted Patent B2
US 12,717,228 · App. 18/199,843 · Granted Aug 25, 2026

Semiconductor photoresist composition and method of forming patterns using the composition

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Quick Facts
Patent No.
US 12,717,228
App. No.
18/199,843
Filed
May 19, 2023
Granted
Aug 25, 2026
Kind
B2
Art Unit
2899
USPC
430/270.1
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 27, 2023
From: HAN, SEUNG; IM, SANGKYUN; LEE, MINYOUNG; KIM, JIMIN; SEO, YAEUN; OH, BUKEUN
To: SAMSUNG SDI CO., LTD.
Reel/Frame 063780/0986 →
Priority Claims (1)
KR 10-2022-0085855 · Jul 12, 2022 · national
Continuity (1)
Related Publication 20240027899A1 · Jan 25, 2024
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