Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture
Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.
1. An aqueous inorganic patterning composition comprising water, metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, wherein the composition comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.
2. The aqueous composition of claim 1 wherein the metal suboxide cations comprise ZrO +2 cations, HfO +2 cations or a combination thereof.
3. The aqueous composition of claim 1 wherein the polyatomic anions comprise tungstate, phosphate, nitrate, silicate, aluminate, borate or combinations thereof.
4. The aqueous composition of claim 1 wherein the polyatomic anion comprises sulfate.
5. The aqueous composition of claim 1 further comprising NH 3 , OH − , F − , Cl − , Br − , I − , or a combination thereof.
6. A method for forming a pattern of an inorganic material deposited on a substrate by solution deposition, comprising:
providing a substrate having a coating composition, the coating composition comprising metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, the coating composition further comprising Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof; and
exposing the coating composition to radiation in a pattern such that first portions of the coating are exposed to the radiation and second portions of the coating are not exposed to the radiation, thereby forming an exposed patterned coating.
7. The method of claim 6 wherein the radiation comprises an electron beam or ultraviolet light.
8. The method of claim 6 wherein exposing the coating composition to the radiation condenses exposed first portions of the coating composition.
9. The method of claim 6 wherein the metal suboxide cations comprise ZrO +2 cations, HfO +2 cations or a combination thereof, wherein the polyatomic anions comprise sulfate anions, and wherein the coating composition further comprises F − , Cl − , Br − , I − , or a combination thereof.
10. The method of claim 6 further comprising etching after exposure to the radiation to remove unexposed second portions of the coating composition.
11. The method of claim 10 wherein the etching is performed with tetramethyl ammonium hydroxide.
12. The method of claim 6 further comprising heating the coating composition prior to exposure with radiation.
13. The method of claim 6 wherein the coating composition is heated to a temperature above about 100° C. after exposing the coating composition to the radiation pattern and prior to etching the exposed coating composition with an acid or a base to remove unexposed second portions of the coating composition.
14. The method of claim 6 further comprising contacting the exposed coating composition with a composition selected from hydrochloric acid, sulfuric acid, hydrogen peroxide, sodium hydroxide, or tetramethyl ammonium hydroxide, to remove a portion of the material to form the pattern.
15. The method of claim 6 wherein the coating composition has a thickness of from about 1 nm to about 100 nm.
16. The method of claim 15 further comprising developing the exposed coating composition to remove the exposed material.
17. The method according to claim 6 where providing a substrate having a coating composition comprises acquiring the coated substrate.
18. The method according to claim 6 where providing a substrate having a coating composition comprises:
forming an aqueous composition comprising water, metal suboxide cations, polyatomic anions, and a coordinating species comprising a peroxide group, wherein the composition comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof; and
depositing the aqueous composition onto the substrate.
19. A method for forming an inorganic patterning composition, the method comprising mixing an aqueous solution comprising metal suboxide cations, polyatomic anions and a coordinating species comprising a peroxide group, to form an inorganic patterning composition, wherein the composition comprises Cu, Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Zn, Y, Zr, Nb, Mo, In, Sn, Sb, Hf, Ta, W, Ir, Pt, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu or a combination thereof.
20. The method of claim 19 wherein the coordinating species comprises hydrogen peroxide.
21. The method of claim 19 wherein the polyatomic anions comprise sulfate anions.
22. The method of claim 19 wherein the metal suboxide cations comprise ZrO +2 cations, HfO +2 cations or a combination thereof, and wherein the polyatomic anions comprise sulfate, phosphate, nitrate, silicate, aluminate, borate or combinations thereof.
23. The method of claim 7 wherein the exposed patterned coating comprises features having a size≦100 nm.