Conducting coatings for anodes, methods of making and using same, and uses thereof
Conducting coatings disposed on a metal member. The conducting coatings may have a desired texture and provide homoepitaxial or heteroepitaxial coating of an electrodeposited layer. A conducting coating may be formed by applying a shear force during deposition of the conducting coating. The conducting coatings may be used in anodes of various electrochemical devices. A conducting coating, which may be part of an electrochemical device, may have an electrochemically deposited layer disposed on at least a portion of a surface of the conducting coating. The electrochemically deposited layer may be reversibly electrochemically deposited.
1. An electrode comprising:
an epitaxial substrate;
an electrodeposited layer disposed on at least a portion of the epitaxial substrate, and a coherent interface having a lattice misfit of less than 15% between the epitaxial substrate and the electrodeposited layer, and wherein:
i) the epitaxial substrate comprises graphene, functionalized graphene, or reduced graphene oxide and the electrodeposited layer comprises Zn;
ii) the epitaxial substrate comprises Au and the electrodeposited layer comprises Al; or
iii) the epitaxial substrate comprises Zr or Ti and the electrodeposited layer comprises Mg.
2. The electrode of claim 1 , wherein the epitaxial substrate comprises an epitaxial templating material chosen from a conducting coating, an FCC metal, an HCP metal, a BCC metal, or any combination thereof, and wherein the epitaxial templating material is chemically inert and/or electrochemically stable under electrochemical cycling conditions.
3. The electrode of claim 1 , wherein the epitaxial substrate comprises a metal member and a conducting coating comprising graphene, functionalized graphene, reduced graphene, Au, Zr, or Ti disposed on at least a portion of the metal member.
4. The electrode of claim 3 , wherein the conducting coating comprises graphene, functionalized graphene, or reduced graphene oxide and the electrodeposited layer comprises Zn.
5. The electrode of claim 1 , wherein the epitaxial substrate comprises Au and the electrodeposited layer comprises Al.
6. The electrode of claim 1 , wherein the epitaxial substrate comprises Zr or Ti and the electrodeposited layer comprises Mg.
7. The electrode of claim 3 , wherein the conducting coating comprises Au and the electrodeposited layer comprises Al.
8. The electrode of claim 3 , wherein the conducting coating comprises Zr or Ti, and the electrodeposited layer comprises Mg.
9. The electrode of claim 1 , wherein the epitaxial substrate comprises a substrate and an aligned coating of a plurality of graphene sheets on at least a portion of the substrate and wherein the graphene sheets are parallel to the substrate.
10. The electrode of claim 1 , wherein the electrodeposited layer comprises an FCC metal selected from Al; or an HCP metal selected from Mg and Zn.
11. The electrode of claim 1 , wherein the coherent interface has a lattice misfit of less than about 10% between the epitaxial substrate and the electrodeposited layer.
12. The electrode of claim 1 , wherein the coherent interface has a lattice misfit of less than about 5% between the epitaxial substrate and the electrodeposited layer.
13. A device comprising one or more electrode(s) of claim 1 .
14. The device of claim 13 , wherein the device is a battery, a supercapacitor, a fuel cell, an electrolyzer, an electrolytic cell, or an electrochemical device.
15. The device of claim 13 , wherein the device is a battery and the battery exhibits one or more of the following:
i). at least 1,000 charging/discharging cycles without failure;
ii). a plating and/or stripping Coulombic efficiency of 95% or greater for at least 1,000 cycles at a rate of 40 mA/cm2 or greater; and/or
iii). at least 1,000 charging/discharging cycles with a Coulombic efficiency of 90% or greater.
16. The electrode of claim 1 , wherein the epitaxial substrate comprises graphene, functionalized graphene, or reduced graphene oxide and the electrodeposited layer comprises Zn.