IP Library Granted Patent US 12,133,394
Granted Patent B2
US 12,133,394 · App. 18/229,133 · Granted Oct 29, 2024

Magnetic memory device

Inventors: Masayoshi Iwayama (Seoul, KR); Tatsuya Kishi (Seongnam-si, KR); Masahiko Nakayama (Kanagawa, JP); Toshihiko Nagase (Tokyo, JP); Daisuke Watanabe (Mie, JP); Tadashi Kai (Tokyo, JP)
Assignee: Kioxia Corporation
H10B61/10H10N50/01H10N50/80H10N50/85
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Quick Facts
Patent No.
US 12,133,394
App. No.
18/229,133
Granted
Oct 29, 2024
Kind
B2
Abstract

A magnetic memory device including a first memory cell which includes a first stacked structure including a magnetic layer and a second memory cell which is provided on the first memory cell and includes a second stacked structure including a magnetic layer. Each of the first stacked structure and the second stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer. A concentration of iron (Fe) contained in the first magnetic layer included in the first stacked structure and a concentration of iron (Fe) contained in the first magnetic layer included in the second stacked structure are different from each other.

Claims (27)

1. A magnetic memory device comprising:

a first memory cell which includes a first stacked structure; and

a second memory cell which is provided on the first memory cell and includes a second stacked structure,

wherein:

each of the first stacked structure and the second stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, and a resistance adjustment layer which adjusts a resistance of a respective one of the first stacked structure and the second stacked structure,

the first magnetic layer, the second magnetic layer, the nonmagnetic layer, and the resistance adjustment layer included in each of the first stacked structure and the second stacked structure are stacked in one direction, and

a thickness of the resistance adjustment layer included in the first stacked structure and a thickness of the resistance adjustment layer included in the second stacked structure are different from each other.

2. The magnetic memory device according to claim 1 , wherein the thickness of the resistance adjustment layer included in the second stacked structure is larger than the thickness of the resistance adjustment layer included in the first stacked structure.

3. The magnetic memory device according to claim 1 , wherein the thickness of the resistance adjustment layer included in the second stacked structure is smaller than the thickness of the resistance adjustment layer included in the first stacked structure.

4. The magnetic memory device according to claim 1 , wherein:

the first memory cell further includes a first switching element connected to the first stacked structure, and

the second memory cell further includes a second switching element connected to the second stacked structure.

5. The magnetic memory device according to claim 1 , wherein the resistance adjustment layer contains a metal oxide.

6. The magnetic memory device according to claim 5 , wherein the metal oxide is a magnesium oxide or an aluminum oxide.

7. A magnetic memory device comprising:

a first memory cell which includes a first stacked structure; and

a second memory cell which is provided on the first memory cell and includes a second stacked structure,

wherein:

each of the first stacked structure and the second stacked structure includes a first magnetic layer having a variable magnetization direction, a second magnetic layer having a fixed magnetization direction, and a nonmagnetic layer provided between the first magnetic layer and the second magnetic layer,

one of the first stacked structure and the second stacked structure further includes a resistance adjustment layer which adjusts a resistance of the one of the first stacked structure and the second stacked structure,

the other of the first stacked structure and the second stacked structure includes no resistance adjustment layer, and

the first magnetic layer, the second magnetic layer, the nonmagnetic layer, and the resistance adjustment layer included in the one of the first stacked structure and the second stacked structure are stacked in one direction.

8. The magnetic memory device according to claim 7 , wherein the resistance adjustment layer contains a metal oxide.

9. The magnetic memory device according to claim 8 , wherein the metal oxide is a magnesium oxide or an aluminum oxide.

10. The magnetic memory device according to claim 7 , wherein:

the first memory cell further includes a first switching element connected to the first stacked structure, and

the second memory cell further includes a second switching element connected to the second stacked structure.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 1, 2023
From: IWAYAMA, MASAYOSHI; KISHI, TATSUYA; NAKAYAMA, MASAHIKO; NAGASE, TOSHIHIKO; WATANABE, DAISUKE; KAI, TADASHI
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 064458/0240 →
CHANGE OF NAME Recorded Aug 1, 2023
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 064464/0001 →
Priority Claims (1)
JP 2018-173557 · Sep 18, 2018 · national
Continuity (3)
Division 17371138 · Jul 9, 2021
Division 16353069 · Mar 14, 2019
Related Publication 20230380183A1 · Nov 23, 2023