IP Library Granted Patent US 12,072,152
Granted Patent B2
US 12,072,152 · App. 18/241,073 · Granted Aug 27, 2024

Vapor chamber

Inventors: Lei Lei Liu (Hui Zhou, CN); Xiao Min Zhang (Hui Zhou, CN); Xue Mei Wang (Hui Zhou, CN)
Assignee: VAST GLORY ELECTRONICS & HARDWARE & PLASTIC(HUI ZHOU) LTD.
F28D15/0233F28D15/046
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,072,152
App. No.
18/241,073
Granted
Aug 27, 2024
Kind
B2
Abstract

This disclosure relates to a vapor chamber configured to accommodate a cooling fluid. The vapor chamber includes a first cover, a second cover, a first capillary structure, and a second capillary structure. The second cover and the first cover are attached to each other to form a chamber therebetween. The chamber is configured to accommodate the cooling fluid. The first capillary structure is located in the chamber and stacked on the first cover. The second capillary structure is located in the chamber and stacked on the first capillary structure. The second capillary structure is different from the first capillary structure. A projection of the second capillary structure onto the first cover is smaller than a projection of the first capillary structure onto the first cover.

Claims (32)

1. A vapor chamber, configured to accommodate a cooling fluid, and the vapor chamber comprising:

a first cover, having a contact surface, wherein the contact surface is configured to be in thermal contact with a heat source, and;

a second cover, wherein the second cover and the first cover are attached to each other to form a chamber therebetween, and the chamber is configured to accommodate the cooling fluid;

a first capillary structure, wherein the first capillary structure is located in the chamber and stacked on the first cover;

a second capillary structure, wherein the second capillary structure is located in the chamber and stacked on the first capillary structure, the second capillary structure is different from the first capillary structure, and an entire projection of the second capillary structure onto the first cover is completely overlapped with a projection of the first capillary structure onto the first cover;

a plurality of supporting posts, wherein each of the plurality of supporting posts is in direct contact with the first cover and the second cover at two opposite sides thereof; and

first and second irregularly-shaped hollow parts, formed through the first cover and the second cover, wherein the contact surface is located between the first and second irregularly-shaped hollow parts, and the second capillary structure surrounds the first irregularly-shaped hollow part.

2. The vapor chamber according to claim 1 , wherein the chamber has an evaporation area and a condensation area, the evaporation area is wider than the condensation area, a side of the second capillary structure is located in the condensation area, another side of the second capillary structure extends towards the evaporation area, the contact surface corresponds to the evaporation area, and part of the projection of the second capillary structure onto the first cover is located in the contact surface of the first cover.

3. The vapor chamber according to claim 2 , wherein the second capillary structure is in a ring-shape.

4. The vapor chamber according to claim 3 , wherein the second capillary structure has a first curved section, a second curved section, two extension sections, and a bridge section, the first curved section and the second curved section are located opposite to each other, the first curved section is located in the condensation area, at least part of the second curved section is located in the evaporation area, a projection of the second curved section onto the first cover is located out of the contact surface of the first cover, the two extension sections are located opposite to each other, the two extension sections are respectively located between and connected to the first curved section and the second curved section, an end of the bridge section is connected to the second curved section, and a projection of another end of the bridge section onto the first cover is located in the contact surface of the first cover.

5. The vapor chamber according to claim 2 , wherein the second capillary structure is in a U-shape.

6. The vapor chamber according to claim 5 , wherein the second capillary structure has a curved section and two extension sections, the curved section is located in the condensation area, the two extension sections are located opposite to each other, the two extension sections are respectively connected to two opposite ends of the curved section and extend towards the evaporation area, and a projection of an end of each of the two extension sections located away from the curved section onto the first cover is located in the contact surface of the first cover.

7. The vapor chamber according to claim 6 , wherein the two extension sections are spaced apart from each other.

8. The vapor chamber according to claim 1 , wherein the chamber has an evaporation area and a condensation area, the evaporation area is wider than the condensation area, a side of the second capillary structure is located in the condensation area, another side of the second capillary structure extends towards the evaporation area, the contact surface corresponds to the evaporation area, the projection of the second capillary structure onto the first cover is located out of and substantially located next to the contact surface of the first cover, and the second capillary structure is in a U-shape.

9. The vapor chamber according to claim 8 , wherein the second capillary structure has a curved section and two extension sections, the curved section is located in the condensation area, the two extension sections are located opposite to each other, the two extension sections are respectively connected to two opposite ends of the curved section and extend towards the evaporation area, and a projection of an end of each of the two extension sections located away from the curved section onto the first cover is located out of and substantially located next to the contact surface of the first cover.

10. The vapor chamber according to claim 9 , wherein the two extension sections are spaced apart from each other.

11. A vapor chamber, configured to accommodate a cooling fluid, and the vapor chamber comprising:

a first cover, having a contact surface, wherein the contact surface is configured to be in thermal contact with a heat source, and;

a second cover, wherein the second cover and the first cover are attached to each other to form a chamber therebetween, and the chamber is configured to accommodate the cooling fluid;

a first capillary structure, wherein the first capillary structure is located in the chamber and stacked on the first cover;

a second capillary structure, wherein the second capillary structure is located in the chamber and stacked on the first capillary structure, the second capillary structure has a capability of transmitting the cooling fluid greater than that of the first capillary structure, and an entire projection of the second capillary structure onto the first cover is completely overlapped with a projection of the first capillary structure onto the first cover;

a plurality of supporting posts, wherein each of the plurality of supporting posts is in direct contact with the first cover and the second cover at two opposite sides thereof; and

first and second irregularly-shaped hollow parts, formed through the first cover and the second cover, wherein the contact surface is located between the first and second irregularly-shaped hollow parts, and the second capillary structure surrounds the first irregularly-shaped hollow part.

12. The vapor chamber according to claim 11 , wherein the chamber has an evaporation area and a condensation area, the evaporation area is wider than the condensation area, a side of the second capillary structure is located in the condensation area, another side of the second capillary structure extends towards the evaporation area, the contact surface corresponds to the evaporation area, and part of an orthogonal projection of the second capillary structure onto the first cover is located in the contact surface of the first cover.

13. The vapor chamber according to claim 12 , wherein the second capillary structure is in a ring-shape.

14. The vapor chamber according to claim 13 , wherein the second capillary structure has a first curved section, a second curved section, two extension sections, and a bridge section, the first curved section and the second curved section are located opposite to each other, the first curved section is located in the condensation area, at least part of the second curved section is located in the evaporation area, an orthogonal projection of the second curved section onto the first cover is located out of the contact surface of the first cover, the two extension sections are located opposite to each other, the two extension sections are respectively located between and connected to the first curved section and the second curved section, an end of the bridge section is connected to the second curved section, and an orthogonal projection of another end of the bridge section onto the first cover is located in the contact surface of the first cover.

15. The vapor chamber according to claim 12 , wherein the second capillary structure is in a U-shape.

16. The vapor chamber according to claim 15 , wherein the second capillary structure has a curved section and two extension sections, the curved section is located in the condensation area, the two extension sections are located opposite to each other, the two extension sections are respectively connected to two opposite ends of the curved section and extend towards the evaporation area, and an orthogonal projection of an end of each of the two extension sections located away from the curved section on the first cover is located in the contact surface of the first cover.

17. The vapor chamber according to claim 16 , wherein the two extension sections are spaced apart from each other.

18. The vapor chamber according to claim 11 , wherein the chamber has an evaporation area and a condensation area, the evaporation area is wider than the condensation area, a side of the second capillary structure is located in the condensation area, another side of the second capillary structure extends towards the evaporation area, the contact surface corresponds to the evaporation area, an orthogonal projection of the second capillary structure onto the first cover is located out of and substantially located next to the contact surface of the first cover, and the second capillary structure is in a U-shape.

19. The vapor chamber according to claim 18 , wherein the second capillary structure has a curved section and two extension sections, the curved section is located in the condensation area, the two extension sections are located opposite to each other, the two extension sections are respectively connected to two opposite ends of the curved section and extend towards the evaporation area, and an orthogonal projection of an end of each of the two extension sections located away from the curved section onto the first cover is located out of and substantially located next to the contact surface of the first cover.

20. The vapor chamber according to claim 19 , wherein the two extension sections are spaced apart from each other.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 7, 2023
From: LIU, LEI LEI; ZHANG, XIAO MIN; WANG, XUE MEI
To: VAST GLORY ELECTRONICS & HARDWARE & PLASTIC(HUI ZHOU) LTD.
Reel/Frame 064828/0725 →
Priority Claims (1)
CN 201911340537.1 · Dec 23, 2019 · national
Continuity (2)
Division 16899495 · Jun 11, 2020
Related Publication 20230408205A1 · Dec 21, 2023