Supporting sealant layer structure for stacked die application
Some implementations described herein provide techniques and apparatuses for forming a stacked die product including two or more integrated circuit dies. A bond interface between two integrated circuit dies that are included in the stacked die product includes a layered structure. As part of the layered structure, respective layers of a sealant material are directly on co-facing surfaces of the two integrated circuit dies. The layered structure further includes one or more bonding layers between the respective layers of the sealant material that are directly on the co-facing surfaces of the two integrated circuit dies. The layered structure may reduce lateral stresses throughout the bond interface to reduce a likelihood of warpage of the two integrated circuit dies.
1 . A method, comprising:
dispensing a layer of a siloxane-based compound across a first semiconductor substrate;
curing the layer of the siloxane-based compound;
forming, after curing the layer of the siloxane-based compound, a first bonding layer over the layer of the siloxane-based compound; and
joining the first bonding layer to a second bonding layer that is associated with a second semiconductor substrate.
2 . The method of claim 1 , further comprising:
forming a dielectric layer over the layer of the siloxane-based compound prior to forming the first bonding layer over the layer of the siloxane-based compound.
3 . The method of claim 1 , further comprising:
forming a first set of interconnect structures through the first bonding layer and the layer of the siloxane-based compound; and
joining the first set of interconnect structures to a second set of interconnect structures associated with the second semiconductor substrate.
4 . The method of claim 1 , further comprising:
forming one or more stress-relief cavities in the first semiconductor substrate prior to dispensing the layer of the siloxane-based compound across the first semiconductor substrate.
5 . The method of claim 4 , further comprising:
filling the one or more stress-relief cavities with the layer of the siloxane-based compound.
6 . A method, comprising:
forming a first layer of a silazane-based compound, to a thickness that is included in a range of approximately one micron to approximately twenty microns, over a portion of a first integrated circuit die;
forming a first dielectric layer over the first layer of the silazane-based compound;
forming a second layer of the silazane-based compound over a portion of a second integrated circuit die;
forming a second dielectric layer over the second layer of the silazane-based compound; and
joining the first dielectric layer and the second dielectric layer.
7 . The method of claim 6 ,
wherein forming the first layer of the silazane-based compound over the portion of the first integrated circuit die comprises:
forming the first layer of the silazane-based compound over beveled edges only of the first integrated circuit die.
8 . The method of claim 6 ,
wherein forming the first layer of the silazane-based compound over the portion of the first integrated circuit die comprises:
forming the first layer of the silazane-based compound over an entire width of the first integrated circuit die.
9 . The method of claim 6 ,
wherein joining the first dielectric layer and the second dielectric layer comprises:
joining the first dielectric layer and the second dielectric layer using a eutectic bonding process.
10 . A device, comprising:
a first bonding layer;
a first layer of a siloxane-based compound or a silazane-based compound between the first bonding layer and a first integrated circuitry,
wherein the first integrated circuitry is associated with a first integrated circuit die;
a second bonding layer joined with the first bonding layer;
a second layer of the siloxane-based compound or the silazane-based compound between the second bonding layer and a second integrated circuitry,
wherein the second integrated circuitry is associated with a second integrated circuit die;
a first set of connection structures interspersed through the first bonding layer and the first layer of the siloxane-based compound or the silazane-based compound; and
a second set of connection structures interspersed through the second bonding layer and the first layer of the siloxane-based compound or the silazane-based compound,
wherein the second set of connection structures joins with the first set of connection structures.
11 . The device of claim 10 , further comprising:
one or more stress-relief structures within the first integrated circuitry.
12 . The device of claim 10 ,
wherein the first layer of the siloxane-based compound or the silazane-based compound and the second layer of the siloxane-based compound or the silazane-based compound comprise:
composite filler particulates.
13 . The device of claim 10 , further comprising:
a beveled region,
wherein the first layer of the siloxane-based compound or the silazane-based compound and the second layer of the siloxane-based compound or the silazane-based compound are directly joined within the beveled region.
14 . The device of claim 10 , further comprising:
an interposer, and
wherein a stacked die structure including the first bonding layer, the first layer of the siloxane-based compound or the silazane-based compound, the second bonding layer, and the second layer of the siloxane-based compound or the silazane-based compound is attached to the interposer.
15 . The device of claim 10 further comprising:
a beveled region,
wherein a bond interface structure is located between the first layer of the siloxane-based compound or the silazane-based compound, and the second layer of the siloxane-based compound or the silazane-based compound, within the beveled region.
16 . The device of claim 15 ,
wherein the bond interface structure comprises:
the first bonding layer joined directly with the second bonding layer.
17 . The device of claim 16 , further comprising:
a dielectric layer between the first bonding layer and the first layer of the siloxane-based compound or the silazane-based compound within the beveled region.
18 . The method of claim 1 , wherein the layer of the siloxane-based compound comprises composite filler particulates selected from silicon carbide (SiC), aluminum dioxide (Al 2 O 3 ), zirconium tungsten phosphate (Zr 2 WP 2 O 12 ), silica (SiO 2 ), or ceramic particulates.
19 . The method of claim 6 , wherein the first dielectric layer comprises a material selected from silicon dioxide (SiO 2 ), silicon oxycarbide (SiOC), aluminum dioxide (Al 2 O 3 ), undoped silicon glass, or phosphosilicate glass.
20 . The device of claim 10 , wherein at least one of the first layer of the siloxane-based compound or the silazane-based compound or the second layer of the siloxane-based compound or the silazane-based compound has a thickness in a range of approximately one micron to approximately twenty microns.