METHOD FOR MANUFACTURING TRENCH-TYPE MOSFET
Disclosed is a method for manufacturing a trench-type MOSFET, which comprises: providing a semiconductor structure, forming a trench in the semiconductor structure; forming a side oxide layer and dielectric layer in the trench; forming a shielding conductor in the trench; removing the hard mask; performing wet etching to remove the side oxide layer and dielectric layer; depositing an oxide layer from above the trench; etching the oxide layer to make an upper surface of the oxide layer lower than that of the shielding conductor; forming a gate dielectric layer and a gate conductor on the oxide layer, wherein the gate dielectric layer is located on an upper-portion side wall of the trench and separates the gate conductor from the semiconductor structure. By improving gate poly morphology, figure of merit of the device is optimized.
1 . A method for manufacturing a trench-type MOSFET, comprising:
providing a semiconductor structure, depositing a hard mask and performing etching to form a trench extending from an upper surface of the semiconductor structure to an interior of the semiconductor structure;
forming a side oxide layer and a dielectric layer in the trench;
forming a shielding conductor in the trench, wherein the side oxide layer and the dielectric layer separate the shielding conductor from the semiconductor structure;
removing the hard mask;
performing wet etching to remove a portion, which is located at an upper portion of the trench, of the side oxide layer and the dielectric layer;
depositing an oxide layer from above the trench, wherein the oxide layer covers the side oxide layer and dielectric layer, and the oxide layer is adjacent to the shielding conductor;
etching the oxide layer so as to make an upper surface of the oxide layer lower than an upper surface of the shielding conductor;
forming a gate dielectric layer and a gate conductor on the oxide layer in the trench, wherein the gate dielectric layer is located on an upper-portion side wall of the trench and separates the gate conductor from the semiconductor structure; and
forming a body region, a source region and a drain electrode based on the semiconductor structure.
2 . The method according to claim 1 , wherein step of forming the side oxide layer in the trench comprises:
forming the side oxide layer by thermal oxidation and forming the dielectric layer by chemical vapor deposition.
3 . The method according to claim 1 , wherein before step of forming a shielding conductor in the trench, the method further comprises: after forming the side oxide layer and the dielectric layer, performing a rapid thermal annealing process, and then depositing polysilicon as the shielding conductor.
4 . The method according to claim 1 , wherein step of removing the hard mask comprises:
performing chemical mechanical planarization to remove the hard mask.
5 . The method according to claim 1 , wherein the semiconductor structure comprises a semiconductor substrate layer and an epitaxial semiconductor layer on the semiconductor substrate layer, wherein the trench is located in the epitaxial semiconductor layer.
6 . The method according to claim 1 , wherein the shielding conductor and the gate conductor are respectively polysilicon layers formed by low-pressure chemical vapor deposition.
7 . The method according to claim 1 , wherein the gate dielectric layer is an oxide layer formed by thermal oxidation.
8 . The method according to claim 1 , wherein,
the source region is formed in the body region and is of a first dopant type;
the body region is formed in an upper portion, which is adjacent to the trench, of the semiconductor structure and is of a second dopant type, wherein the second dopant type is opposite to the first dopant type, wherein the first dopant type is one of N type and P type, and the second dopant type is the other one of N type and P type; and
the drain electrode is formed on a second surface of the semiconductor structure, and the second surface and the upper surface of the semiconductor structure are opposite to each other.
9 . The method according to claim 8 , wherein after forming the source region, the method further comprises:
forming an interlayer dielectric layer on the source region; and
forming a source electrode on the interlayer dielectric layer.
10 . The method according to claim 9 , wherein before forming the source electrode, the method further comprises:
forming, in the body region, a body contact region of the second dopant type, and
forming a conductive channel penetrating through the interlayer dielectric layer and the source region to reach the body contact region, wherein the source electrode is connected to the body contact region via the conductive channel.