Overlay mark forming Moire pattern, overlay measurement method using same, overlay measurement apparatus using same, and manufacturing method of semiconductor device using same

1. An overlay mark for measuring an overlay based on an image, the overlay mark being configured to determine a relative misalignment between at least two pattern layers, and the overlay mark comprising:

a first overlay mark comprising a pair of first grating patterns, the pair of first grating patterns being formed together with a first pattern layer, and the pair of first grating patterns having a first pitch along a first direction and being rotationally symmetrical by 180 degrees with each other; and

a second overlay mark comprising a pair of second grating patterns and a pair of third grating patterns, the pair of second grating patterns being formed together with a second pattern layer, the pair of second grating patterns having a second pitch along the first direction in which the second pitch is different from the first pitch, the pair of second grating patterns partially overlapping the first grating patterns and being rotationally symmetrical by 180 degrees with each other, the pair of third grating patterns being formed together with the second pattern layer, the pair of third grating patterns having a third pitch along the first direction in which the third pitch is different from the first pitch and the second pitch, and the pair of third grating patterns partially overlapping the first grating patterns and being rotationally symmetrical by 180 degrees with each other,

wherein the first grating patterns and the second grating patterns that overlap each other form a pair of first Moire patterns rotationally symmetrical by 180 degrees with respect to a first center of symmetry,

wherein the first grating patterns and the third grating patterns that overlap each other form a pair of second Moire patterns rotationally symmetrical by 180 degrees with respect to a second center of symmetry,

wherein the first grating patterns comprise a plurality of first bars having a first bar length, the second grating patterns comprise a plurality of second bars having a second bar length, the third grating patterns comprise a plurality of third bars having a third bar length, and the first bar length is equal to or more than a sum of the second bar length and the third bar length,

wherein the first center of symmetry and the second center of symmetry coincide with each other when an overlay error is zero, and

wherein an error in the first direction between the first center of symmetry and the second center of symmetry represents an overlay error in the first direction between the first pattern layer and the second pattern layer.

2. The overlay mark of claim 1 , wherein the second grating patterns and the third grating patterns are disposed parallel to each other.

3. The overlay mark of claim 1 , wherein one of the second pitch and the third pitch is larger than the first pitch and the other of the second pitch and the third pitch is smaller than the first pitch.

4. The overlay mark of claim 1 , wherein pitches of the first and the second Moire patterns are larger than an optical resolution of an overlay measurement apparatus, and the first to the third pitches of the first to the third grating patterns are smaller than the optical resolution of the overlay measurement apparatus.

5. The overlay mark of claim 1 , wherein:

the first overlay mark further comprises a pair of fourth grating patterns, the pair of fourth grating patterns being formed together with the first pattern layer, and the pair of fourth grating patterns having a fourth pitch along a second direction orthogonal to the first direction and being rotationally symmetrical by 180 degrees with each other,

the second overlay mark comprises a pair of fifth grating patterns and a pair of sixth grating patterns, the pair of fifth grating patterns being formed together with the second pattern layer, the pair of fifth grating patterns having a fifth pitch along the second direction in which the fifth pitch is different from the fourth pitch, the pair of fifth grating patterns partially overlapping the fourth grating patterns and being rotationally symmetrical by 180 degrees with each other, the pair of sixth grating patterns being formed together with the second pattern layer, the pair of sixth grating patterns having a sixth pitch along the second direction in which the sixth pitch is different from the fourth pitch and the fifth pitch, and the pair of sixth grating patterns partially overlapping the fourth grating patterns and being rotationally symmetrical by 180 degrees with each other,

the fourth grating patterns and the fifth grating patterns that overlap each other form a pair of third Moire patterns rotationally symmetrical by 180 degrees with respect to a third center of symmetry,

the fourth grating patterns and the sixth grating patterns that overlap each other form a pair of fourth Moire patterns rotationally symmetrical by 180 degrees with respect to a fourth center of symmetry,

the third center of symmetry and the fourth center of symmetry coincide with each other when the overlay error is zero, and

an error in the second direction between the third center of symmetry and the fourth center of symmetry represents the overlay error in the second direction between the first pattern layer and the second pattern layer.