Vacuum chamber arrangement for charged particle beam generator
The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
1. A collimator electrode stack, comprising:
a plurality of stacked collimator electrodes for collimating a charged particle beam along an optical axis, wherein each collimator electrode of the plurality of stacked collimator electrodes comprises an electrode body with an electrode aperture for permitting passage of the charged particle beam, wherein the electrode bodies are mutually spaced along an axial direction that is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and
a stack support system for supporting the collimator electrode stack with respect to an external reference frame, and connected to a lateral region of the collimator electrode stack.
2. The collimator electrode stack of claim 1 , wherein the stack support system comprises stack support members that are distributed along a periphery of the collimator electrode stack, the periphery extending in an angular direction around the optical axis.
3. The collimator electrode stack of claim 2 , wherein each stack support member of the stack support members comprises at least one of:
a joint for connecting the stack support member to the lateral region of the collimator electrode stack; and
a base for connecting the stack support member to the external reference frame.
4. The collimator electrode stack of claim 2 , wherein each stack support member of the stack support members comprises a stack support leg that is connected to a collimator electrode located in a mid-region of the collimator electrode stack.
5. The collimator electrode stack of claim 2 , wherein the collimator electrode stack comprises at least nine stacked collimator electrodes, and each stack support member of the stack support members has a stack support leg comprising:
a leg member that is connected to a second or a third collimator electrode, and
a further leg member that is connected to an eighth or a ninth collimator electrode.
6. The collimator electrode stack of claim 1 , wherein the stack support system is connected to a mid-region of the collimator electrode stack.
7. The collimator electrode stack of claim 1 , further comprising spacing structures of an electrically insulating material between adjacent collimator electrodes among the plurality of stacked collimator electrodes.
8. The collimator electrode stack of claim 7 , wherein at least one of the collimator electrodes comprises three support portions along an outer electrode perimeter.
9. The collimator electrode stack of claim 8 , wherein the electrode support portions of adjacent collimator electrodes of the collimator electrodes and interposed spacing structures are axially aligned to define a support column parallel with the axial direction.
10. The collimator electrode stack of claim 9 , wherein the support column is provided with a clamping member.
11. The collimator electrode stack of claim 10 , wherein the support portions and the spacing structures of the support column comprise axially aligned through holes that accommodate the clamping member.
12. The collimator electrode stack of claim 8 , wherein the collimator electrodes comprise three radially movable electrode support members along the outer electrode perimeter.
13. The collimator electrode stack of claim 12 , wherein the electrode support members comprise a radially movable elongated arm that is connected at a first end to the outer electrode perimeter and connected with a second end to the electrode support portion.
14. A charged particle beam generator, comprising:
a beam source for generating a charged particle beam along an optical axis; and
a collimator electrode stack comprising:
a plurality of stacked collimator electrodes for collimating the charged particle beam along the optical axis, wherein each collimator electrode of the plurality of stacked collimator electrodes comprises an electrode body with an electrode aperture for permitting passage of the charged particle beam, wherein the electrode bodies are mutually spaced along an axial direction that is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and
a stack support system for supporting the collimator electrode stack with respect to an external reference frame, and connected to a lateral region of the collimator electrode stack,
wherein a first collimator electrode of the collimator electrodes is provided at an upstream end of the collimator electrode stack, wherein the beam source is provided upstream of the first collimator electrode, and wherein the beam source and the electrode apertures of the collimator electrodes are coaxially aligned along the optical axis.
15. The charged particle beam generator of claim 14 , further comprising:
a generator vacuum chamber for accommodating the collimator electrode stack on an inside thereof, wherein the generator vacuum chamber comprises chamber apertures adapted for passing through protruding support portions of the stack support system, to allow the protruding support portions to establish a separate support interface with the external reference frame outside of the generator vacuum chamber.
16. The charged particle beam generator of claim 15 , wherein the charged particle beam generator is formed as a beam generator module, wherein the generator vacuum chamber is insertable into, supportable by, and removable from the reference frame provided inside a vacuum chamber of a charged particle lithography system.
17. The charged particle beam generator of claim 14 , further comprising:
a source chamber located on an upstream end of the collimator electrode stack, and adapted for accommodating the beam source on an inside thereof.
18. A charged particle lithography system for processing a target, the system comprising:
a vacuum chamber enclosing a carrier frame; and
a charged particle beam generator accommodated by the carrier frame, the charged particle beam generator comprising:
a beam source for generating a charged particle beam along an optical axis; and
a collimator electrode stack comprising:
a plurality of stacked collimator electrodes for collimating the charged particle beam along the optical axis, wherein each collimator electrode of the plurality of stacked collimator electrodes comprises an electrode body with an electrode aperture for permitting passage of the charged particle beam, wherein the electrode bodies are mutually spaced along an axial direction that is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and
a stack support system for supporting the collimator electrode stack with respect to the carrier frame, and connected to a lateral region of the collimator electrode stack,
wherein a first collimator electrode of the collimator electrodes is provided at an upstream end of the collimator electrode stack, wherein the beam source is provided upstream of the first collimator electrode, and wherein the beam source and the electrode apertures of the collimator electrodes are coaxially aligned along the optical axis,
wherein the stack support system of the collimator electrode stack comprises three stack support members, each stack support member of the three stack support members being connected to a mid-region of the collimator electrode stack at a first end, and to the carrier frame at a second end.
19. The charged particle lithography system of claim 18 , wherein the charged particle beam generator is formed to be insertable into, supportable by, and removable from the carrier frame provided inside the vacuum chamber.
20. The charged particle lithography system of claim 18 , wherein the stack support members are distributed along a periphery of the collimator electrode stack, the periphery extending in an angular direction around the optical axis.