Photo resist as opaque aperture mask on multispectral filter arrays
An apparatus (e.g., a multi-spectral optical filter array, an optical wafer, an optical component) has an aperture mask printed directly thereon, the aperture mask including a positive or negative photoresist. The apparatus includes a substrate having the aperture mask printed on at least one of a light entrance surface or a light exit surface of the substrate so as to provide an aperture over a portion of the substrate. The photoresist from which the aperture mask is formed is photo-definable or non-photo-definable, and is deposited/printed to form the aperture mask on the substrate.
1. An optical apparatus, comprising:
a substrate having a light entrance surface and a light exit surface, wherein the substrate comprises an optical wafer; and
an aperture mask printed on the light entrance surface of the substrate so as to provide an opening over a portion of the substrate for light to travel therethrough and between the light entrance surface and the light exit surface of the substrate,
wherein the aperture mask includes a photoresist and does not include a dark mirror coating, and
wherein a dark mirror coating is not present between the substrate and the aperture mask.
2. The optical apparatus of claim 1 , wherein the substrate comprises a filter layers stack on the light entrance surface of the substrate, and wherein the aperture mask is arranged on the filter layers stack.
3. The optical apparatus of claim 1 , wherein the substrate comprises a first optical filter element bonded together at a boundary with a second optical filter element, and wherein the aperture mask is printed directly on the boundary.
4. The optical apparatus of claim 3 , wherein the substrate comprises an adhesive at the boundary between the first and second optical filter elements.
5. The optical apparatus of claim 1 , wherein the photoresist is opaque.
6. The optical apparatus of claim 1 , wherein the aperture mask is printed on both the light entrance surface and the light exit surface of the substrate.
7. The optical apparatus of claim 1 , wherein the photoresist is photo-definable.
8. An optical apparatus comprising:
an optical substrate having a light entrance surface and a light exit surface and comprising a filter layers stack arranged on the light entrance surface; and
an aperture mask printed on the filter layers stack of the light entrance surface of the optical substrate to define openings for light to travel through the openings and between the light entrance surface and the light exit surface of the optical substrate, wherein the aperture mask is formed from a photoresist and is not a dark mirror coating, and wherein a dark mirror coating is not present between the optical substrate and the aperture mask.
9. The optical apparatus of claim 8 , wherein the aperture mask is also arranged on the light exit surface of the optical substrate.
10. The optical apparatus of claim 8 , wherein the optical substrate comprises a first optical filter element bonded together at a boundary with a second optical filter element, and wherein the aperture mask is printed directly on the boundary.
11. The optical apparatus of claim 10 , wherein the optical substrate comprises an adhesive at the boundary between the first and second optical filter elements.
12. An optical device comprising:
an optical substrate having a light entrance surface and a light exit surface, wherein the optical substrate comprises a filter layers stack forming an interference filter having a pass band or stop band; and
an aperture mask formed on the light exit surface of the optical substrate, wherein openings in the aperture mask are configured to allow light to travel therethrough and between the light entrance surface and the light exit surface of the optical substrate, wherein the aperture mask comprises a photoresist or a non-photo-definable polyimide, wherein the aperture mask does not comprise a dark mirror coating, and wherein a dark mirror coating is not present between the optical substrate and the aperture mask.
13. The optical device of claim 12 , wherein the aperture mask comprises a positive photoresist or a negative photoresist.
14. The optical device of claim 12 , wherein the aperture mask comprises a non-photo-definable polyimide.
15. The optical device of claim 12 , wherein the filter layers stack is arranged on the light entrance surface of the optical substrate.
16. The optical device of claim 12 , wherein the aperture mask is also arranged on the filter layers stack, and wherein no dark mirror coating is present between the filter layers stack and the aperture mask.
17. The optical device of claim 12 , wherein the aperture mask is also arranged on the light entrance surface of the optical substrate.
18. The optical device of claim 17 , wherein the optical substrate comprises a first optical filter element bonded together at a boundary with a second optical filter element, and wherein the aperture mask is printed directly on the boundary.