Substrate processing module and method of moving a workpiece
Embodiments disclosed herein include a substrate processing module and a method of moving a workpiece. The substrate processing module includes a shutter stack and two process stations. The shutter stack is disposed between the process stations. The method of moving a workpiece includes moving a supporting portion from a first location to a shutter stack in a first direction, retrieving the workpiece from the shutter stack, and moving the supporting portion to a second location. The transfer chamber assembly and method allows for moving workpieces to and from the shutter stack to the two process stations. A central transfer robot of the substrate processing module is configured to grip both substrates and shutter discs, allowing for one robot when typically two robots would be required.
1 . A substrate processing module, comprising:
a plurality of walls that partially define a transfer region, the plurality of walls comprising:
a first wall; and
a second wall disposed opposite the first wall;
a process station coupled to the first wall and connected to the transfer region, the process station comprising:
a processing region; and
a process station opening disposed in the first wall and between the processing region and a pedestal assembly having a lift assembly configured to translate a substrate supporting element of the pedestal assembly between the process station opening and the second wall;
a robot disposed in the transfer region, the robot comprising:
a supporting portion comprising a surface configured to secure a workpiece thereon;
a shutter stack disposed in the transfer region, the shutter stack configured to support one or more of a shutter disc and a substrate, the shutter stack comprising:
a stack base comprising a shutter disc support;
a substrate support coupled to the stack base, the substrate support comprising a top portion; and
a stack actuator coupled to the stack base, the stack actuator configured to move the stack base between the first wall and the second wall.
2 . The substrate processing module of claim 1 , wherein the shutter stack is disposed adjacent the process station.
3 . The substrate processing module of claim 1 , wherein a Z direction is defined as an axis between the first wall and the second wall and the stack actuator moves the stack base in the Z direction.
4 . The substrate processing module of claim 1 , wherein the substrate support is disposed between the stack base and the first wall.
5 . The substrate processing module of claim 1 , wherein stack base is disposed on the second wall.
6 . The substrate processing module of claim 1 , wherein the shutter stack is configured to simultaneously support the shutter disc on the shutter disc support and the substrate on the top portion.
7 . The substrate processing module of claim 1 , wherein the supporting portion is configured to grasp a workpiece.
8 . The substrate processing module of claim 1 , wherein the supporting portion is configured to maintain an orientation of a workpiece.
9 . The substrate processing module of claim 1 , wherein the supporting portion extends from the robot and comprises a first grasper and a second grasper, the second grasper disposed further from the robot than the first grasper.
10 . The substrate processing module of claim 1 , wherein the shutter disc support is disposed between the stack base and the top portion.
11 . A substrate processing module, comprising:
a plurality of walls that partially define a transfer region, the plurality of walls comprising:
a first wall; and
a second wall disposed opposite the first wall;
a process station coupled to the first wall and connected to the transfer region, the process station comprising:
a processing region; and
a process station opening disposed in the first wall and between the processing region and a pedestal assembly having a lift assembly configured to translate a substrate supporting element of the pedestal assembly between the process station opening and the second wall;
a supporting portion comprising a surface configured to secure a workpiece thereon;
a shutter stack disposed in the transfer region, the shutter stack configured to support one or more of a shutter disc and a substrate, the shutter stack comprising:
a stack base comprising a shutter disc support; and
a substrate support coupled to the stack base, the substrate support comprising a top portion; and
an actuator configured to move one of the supporting portion or the stack base in relation to the other.
12 . The substrate processing module of claim 11 , wherein the supporting portion comprises a first grasper and a second grasper, the second grasper disposed opposite the first grasper.
13 . The substrate processing module of claim 11 , wherein the supporting portion is configured to translate between the top portion and the stack base.
14 . The substrate processing module of claim 11 , wherein the top portion is configured to secure the substrate.
15 . A substrate processing module, comprising:
a plurality of walls that partially define a transfer region, the plurality of walls comprising:
a first wall; and
a second wall disposed opposite the first wall;
a process station coupled to the first wall and connected to the transfer region, the process station comprising:
a processing region; and
a process station opening disposed in the first wall and between the processing region and a pedestal assembly having a lift assembly configured to translate a substrate supporting element of the pedestal assembly between the process station opening and the second wall;
a robot disposed in the transfer region, the robot comprising:
a supporting portion comprising a surface configured to secure a workpiece thereon;
a shutter stack disposed in the transfer region, the shutter stack configured to support one or more of a shutter disc and a substrate, the shutter stack comprising:
a stack base comprising a shutter disc support; and
a substrate support coupled to the stack base, the substrate support comprising a top portion; and
an actuator configured to move the robot or the stack base in relation to the other.
16 . The substrate processing module of claim 15 , wherein a Z direction is defined as an axis between the first wall and the second wall and the actuator moves the robot or the stack base in the Z direction.
17 . The substrate processing module of claim 15 , wherein the shutter disc support is disposed between the stack base and the top portion.
18 . The substrate processing module of claim 15 , wherein the stack base is coupled to the second wall.
19 . The substrate processing module of claim 15 , wherein the process station is adjacent the shutter stack.
20 . The substrate processing module of claim 15 , wherein the first wall is disposed between the process station and the shutter stack.