X-ray apparatus, electron emission device and manufacturing method
In an embodiment an X-ray apparatus includes at least one of an X-ray source configured for generating X-rays or an X-ray detector configured for detecting X-rays, a housing in which the at least one of the X-ray source or the X-ray detector is located, the housing having an opening and a window covering the opening, wherein the window is configured to be passed by the X-rays, wherein the window comprises a transmission layer, and wherein the transmission layer is a carbon layer of glassy carbon.
1 . An electron emission device comprising:
an electrically conductive base layer;
an intermediate layer directly on the base layer, wherein the intermediate layer is of a material having a band gap leading to a higher energy of a conduction band edge of the intermediate layer compared to the base layer; and
an electrically conductive gate layer directly on a side of the intermediate layer remote from the base layer,
wherein a breakdown voltage of the intermediate layer exceeds a work function of the gate layer divided by an elementary charge,
wherein the gate layer is a carbon layer of glassy carbon, and
wherein the electron emission device is configured to emit electrons through the gate layer upon applying a voltage between the base layer and the gate layer.
2 . The electron emission device according to claim 1 ,
wherein a thickness of the carbon layer is at least one monolayer and is at most 20 nm, and
wherein the band gap of the intermediate layer is at least 4 eV.
3 . The electron emission device according to claim 1 ,
wherein the glassy carbon is an amorphous material.
4 . The electron emission device according to claim 3 ,
wherein, seen in top view and by transmission electron microscopy, the carbon layer comprises filaments with a length-to-width ratio of at least 10.
5 . The electron emission device according to claim 1 ,
wherein the base layer is also of glassy carbon.
6 . The electron emission device according to claim 5 ,
wherein the intermediate layer is of hexagonal boron nitride.
7 . The electron emission device according to claim 1 ,
further comprising a first electric contact structure,
wherein the first electric contact structure comprises at least one of a grid structure or a bar structure extending across the gate layer and directly located at the gate layer,
wherein a thickness of the first electric contact structure exceeds a thickness of the carbon layer by at least a factor of 10 2 , and
wherein the first electric contact structure is also of glassy carbon.
8 . The electron emission device according to claim 1 ,
wherein the gate layer has a specific electric conductivity of at least 10 3 S/m.
9 . The electron emission device according to claim 1 ,
wherein the electron emission device is configured for a bending radius of 1 cm or less.