METHOD FOR SELECTING PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, CURED FILM, SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
The present disclosure relates to a method for selecting a photosensitive resin composition, the method including: a step of applying a photosensitive resin composition on a substrate and drying the photosensitive resin composition to form a resin film; a step of heat-treating the resin film in a nitrogen atmosphere to obtain a cured film; and a step of raising the temperature from 25° C. to 300° C. at a rate of 10° C./min in a nitrogen atmosphere and then measuring weight loss of the cured film, in which a photosensitive resin composition capable of producing the cured film having a weight loss ratio at 300° C. of 1.0% to 6.0% is selected.
1 . A method for selecting a photosensitive resin composition, the method comprising:
a step of applying a photosensitive resin composition on a substrate and drying the photosensitive resin composition to form a resin film;
a step of heat-treating the resin film in a nitrogen atmosphere to obtain a cured film; and
a step of raising temperature from 25° C. to 300° C. at a rate of 10° C./min in a nitrogen atmosphere and then measuring weight loss of the cured film,
wherein a photosensitive resin composition capable of producing the cured film having a weight loss ratio at 300° C. of 1.0% to 6.0% is selected.
2 . The method for selecting a photosensitive resin composition according to claim 1 , wherein a temperature for heat-treating the resin film is 170° C. to 260° C.
3 . The method for selecting a photosensitive resin composition according to claim 1 , wherein a storage modulus at 130° C. of the cured film is 1.0 GPa or more.
4 . The method for selecting a photosensitive resin composition according to claim 1 , wherein a moisture absorption rate obtained after leaving the cured film to stand for 24 hours under conditions of 130° C. and 85 RH % is 1.2% or less.
5 . The method for selecting a photosensitive resin composition according to claim 1 , wherein a glass transition temperature of the cured film is 200° C. or higher.
6 . A method for producing a patterned cured film, the method comprising:
a step of applying a photosensitive resin composition selected by the method for selecting a photosensitive resin composition according to claim 1 on a portion or an entire surface of a substrate and drying the photosensitive resin composition to form a resin film;
a step of exposing at least a portion of the resin film;
a step of developing the resin film after exposure to form a patterned resin film; and
a step of heating the patterned resin film to obtain a patterned cured film.
7 . The method for producing a patterned cured film according to claim 6 , wherein the substrate has a wiring pattern having a line width of 3 μm or less and an interline distance of 3 μm or less.
8 . A method for producing a semiconductor device including a patterned cured film formed by the method for producing a patterned cured film according to claim 6 as an interlayer insulating layer or a surface protection layer.
9 . A cured film of a photosensitive resin composition used for filling spaces between wiring lines with a line width of 3 μm or less and an interline distance of 3 μm or less,
wherein a weight loss ratio measured by raising temperature of the cured film from 25° C. to 300° C. at a rate of 10° C./min in a nitrogen atmosphere is 1.0% to 6.0%.
10 . The cured film according to claim 9 , wherein a storage modulus at 130° C. is 1.0 GPa or more.
11 . The cured film according to claim 9 , wherein a moisture absorption rate after leaving the cured film to stand for 24 hours under conditions of 130° C. and 85 RH % is 1.2% or less.
12 . The cured film according to claim 9 , wherein a glass transition temperature is 200° C. or higher.
13 . A semiconductor device comprising the cured film according to claim 9 as an interlayer insulating layer or a surface protection layer.