EUV light source with a beam positioning device

1. An extreme ultraviolet (EUV) light source comprising:

a providing device for providing a target material,

at least one pulsed laser source for emitting at least one pulsed laser beam,

a beam guidance device for supplying the at least one pulsed laser beam from the at least one pulsed laser source into a radiation generation chamber and for focused irradiation of the target material with the at least one pulsed laser beam within the radiation generation chamber,

the target material being configured to emit EUV radiation on account of the irradiation,

wherein

the beam guidance device comprises at least one beam positioning device comprising four mirrors as two mirror pairs for positioning the at least one pulsed laser beam, wherein each of the four mirrors is rotatable about exactly one axis of rotation, the axes of rotation of the two mirrors of a first mirror pair are aligned along a first spatial direction, and the axes of rotation of the two mirrors of a second mirror pair are aligned along a second spatial direction.

2. The EUV light source as claimed in claim 1 , wherein the first spatial direction and the second spatial direction are perpendicular to each other.

3. The EUV light source as claimed in claim 1 , wherein the two mirrors of the first mirror pair immediately follow one another in a beam path.

4. The EUV light source as claimed in claim 3 , wherein a distance between the two mirrors of the first mirror pair is less than 150 mm.

5. The EUV light source as claimed in claim 1 , wherein the two mirrors of the second mirror pair immediately follow one another in a beam path.

6. The EUV light source as claimed in claim 5 , wherein a distance between the two mirrors of the second mirror pair is less than 150 mm.

7. The EUV light source as claimed in claim 3 , wherein a first mirror of the second mirror pair is arranged in the beam path upstream of the first mirror pair and a second mirror of the second mirror pair is arranged in the beam path downstream of the first mirror pair.

8. The EUV light source as claimed in claim 1 , wherein the beam positioning device comprises at least one galvanometer drive for the rotation of one of the four mirrors about the respective axis of rotation.

9. The EUV light source as claimed in claim 1 , further comprising:

at least one beam position detection device for detecting a spatial pose of the at least one pulsed laser beam, and

at least one closed-loop controller for controlling the spatial pose of the at least one pulsed laser beam by using the at least one beam positioning device.

10. The EUV light source as claimed in claim 1 , wherein a deflection angle of the pulsed laser beam at at least one of the four mirrors lies in an angular range of between 30° and 90°.

11. The EUV light source as claimed in claim 1 , wherein a deflection angle of the pulsed laser beam at at least one of the four mirrors lies in an angular range of between 60° and 90°.

12. The EUV light source as claimed in claim 1 , wherein a front side of at least one of the four mirrors has a reflective coating for the pulsed laser beam.

13. The EUV light source as claimed in claim 1 , wherein a back side of at least one of the four mirrors has an anti-reflective coating for the at least one pulsed laser beam.

14. The EUV light source as claimed in claim 1 , wherein a substrate of at least one of the four mirrors has a low absorption for the at least one pulsed laser beam.

15. The EUV light source as claimed in claim 1 , wherein the beam guidance device is configured to supply the pulsed laser beam to the beam positioning device in a collimated or divergent form.