Effective work function tuning via silicide induced interface dipole modulation for metal gates
A semiconductor structure includes a substrate and a semiconductor channel layer over the substrate. The semiconductor structure includes a high-k gate dielectric layer over the semiconductor channel layer, a work function metal layer over the high-k gate dielectric layer, and a bulk metal layer over the work function metal layer. The work function metal layer includes a first portion and a second portion over the first portion. Both the first portion and the second portion are conductive. Materials included in the second portion are also included in the first portion. The first portion is doped with silicon at a first dopant concentration, and the second portion is not doped with silicon or is doped with silicon at a second dopant concentration lower than the first dopant concentration.
1. A device, comprising:
a plurality of channel components arranged in a vertical stack in a cross-sectional side view, wherein each of the channel components is spaced apart vertically from other channel components in the cross-sectional side view;
a plurality of gate dielectric components that circumferentially surround the plurality of channel components in the cross-sectional side view, respectively; and
a plurality of work function metal components that circumferentially surround the plurality of gate dielectric components and the plurality of channel components in the cross-sectional side view, respectively;
wherein:
the work function metal components each contains a dopant; and
within each of the work function metal components, a concentration of the dopant varies as a function of a proximity with the respective channel component encircled by the work function metal component.
2. The device of claim 1 , further comprising a plurality of interfacial layers that encircle the plurality of channel components in the cross-sectional side view, respectively, wherein the plurality of interfacial layers are encircled by the plurality of gate dielectric components in the cross-sectional side view, respectively.
3. The device of claim 2 , wherein:
inner surfaces of the interfacial layers are in direct contact with the channel components; and
outer surfaces of the interfacial layers are in direct contact with the gate dielectric components.
4. The device of claim 1 , further comprising a bulk metal component circumferentially surrounds the plurality of work function metal components, the plurality of gate dielectric components, and the plurality of channel components in the cross-sectional side view.
5. The device of claim 4 , where an inner surface of the bulk metal component is in direct contact with outer surfaces of the work function metal components.
6. The device of claim 1 , wherein the dopant is a semiconductor material.
7. The device of claim 6 , wherein the dopant is silicon.
8. The device of claim 1 , wherein for each of the work function metal components and the respective channel component circumferentially surrounded therewithin:
the work function metal component has a first concentration of the dopant at a first position and a second concentration of the dopant at a second position;
the first concentration is greater than the second concentration; and
the first position is located closer to the channel component encircled by the work function metal component than the second position.
9. The device of claim 8 , wherein the first concentration is at least ten times greater than the second concentration.
10. The device of claim 1 , wherein for each of the work function metal components, the dopant is not present at portions of the work function metal component at or near an outer surface thereof.
11. The device of claim 1 , wherein the work function metal components each include a nitride-based metallic material.
12. A device, comprising:
a semiconductor channel layer located over a substrate;
a gate dielectric layer located over the semiconductor channel layer;
a work function metal layer located over, and directly contacting, the gate dielectric layer; and
a bulk metal layer located over, and directly contacting, the work function metal layer;
wherein:
the work function metal layer, but not the bulk metal layer, is doped with silicon;
a first portion of the work function metal layer forms an interface with the gate dielectric layer;
a second portion of the work function metal layer interfaces with the bulk metal layer; and
the first portion has a higher silicon dopant concentration than the second portion.
13. The device of claim 12 , wherein the work function metal layer contains TiN, TaN, WN, TiCN, TaCN, WCN, TiAlN, or TaAlN.
14. The device of claim 12 , wherein:
the first portion of the work function metal layer has a silicon dopant concentration of about 1% to 10%; and
the second portion of the work function metal layer has a silicon dopant concentration of about 0.1% or lower.
15. The device of claim 12 , wherein:
the second portion of the work function metal layer is thicker than the first portion of the work function metal layer; and
the first portion of the work function metal layer has a thickness in a range between about 2 angstroms and about 4 angstroms.
16. A method, comprising:
forming a gate dielectric layer that circumferentially surrounds a channel in a cross-sectional side view;
forming a work function metal layer that circumferentially surrounds the gate dielectric layer in the cross-sectional side view;
forming a silicide layer that circumferentially surrounds the work function metal layer in the cross-sectional side view; and
causing silicon elements of the silicide layer to be driven into the work function metal layer.
17. The method of claim 16 , wherein an annealing process is performed to cause the silicon elements to be driven into the work function metal layer.
18. The method of claim 16 , wherein the causing comprises causing the silicon elements to be driven to a portion of the work function metal layer adjacent to the gate dielectric layer.
19. The method of claim 16 , further comprising:
removing the silicide layer after the causing the silicon elements of the silicide layer to be driven into the work function metal layer; and
forming a bulk metal layer that circumferentially surrounds the work function metal layer, the gate dielectric layer, and the channel in the cross-sectional side view.
20. The method of claim 16 , wherein the forming the silicide layer comprises forming titanium silicide, zirconium silicide, or yttrium silicide as the silicide layer.