Method for forming transistor devices having source region segments and body region segments
In one general aspect, an apparatus can include a first trench disposed in a semiconductor region and including a gate electrode and a second trench disposed in the semiconductor region. The apparatus can include a mesa region disposed between the first trench and the second trench. The apparatus can include a source region segment of a first conductivity type disposed in a first side of the mesa region where the source region segment is included in a plurality of source region segments and where the plurality of source region segments are aligned along the longitudinal axis. The apparatus can include a body region segment of a second conductivity type disposed in a second side of the mesa region opposite the first side of the mesa region and having a portion disposed above the source region segment where the body region segment is included in a plurality of body region segments.
1. A method, comprising:
forming a first trench and a second trench in a semiconductor region such that a mesa region is defined between the first trench and the second trench, the mesa region having a length aligned along a longitudinal axis orthogonal to a vertical axis aligned along a height of the mesa region;
forming a dielectric layer along a sidewall of each of the first trench and the second trench;
forming an electrode in each of the first trench and the second trench;
forming a plurality of source region segments of a first conductivity type in at least a portion of a side of the mesa region; and
forming a plurality of body region segments of a second conductivity type in the at least the side of the mesa region, the plurality of body region segments defining an alternating pattern with the plurality of source region segments along the side of the mesa region, the alternating pattern being aligned along the longitudinal axis.
2. The method of claim 1 , further comprising:
forming a body contact enhancement, using an implant process, along a portion of the mesa region.
3. The method of claim 1 , further comprising:
forming the plurality of source region segments using a first mask,
forming the plurality of body region segments using a second mask,
the first mask covering an area where the plurality of body region segments are formed and the second mask covering an area where the plurality of source region segments are formed.
4. The method of claim 1 , wherein each of the plurality of source region segments is separated from another of the plurality of source region segments by a body region segment from the plurality of body region segments.
5. The method of claim 1 , wherein each of the plurality of body region segments is connected to a channel region disposed between the first trench and the second trench, the channel region is disposed below the plurality of body region segments.
6. The method of claim 1 , wherein the plurality of source region segments are a first plurality of source region segments, the side of the mesa region is a first side of the mesa region,
the method further comprising:
forming a second plurality of source region segments disposed on a second side of the mesa region opposite the first side of the mesa region.
7. The method of claim 1 , wherein the plurality of body region segments are a first plurality of body region segments, the plurality of source region segments are a first plurality of source region segments, the side of the mesa region is a first side of the mesa region,
the method further comprising:
forming a second plurality of body region segments and a second plurality of body region segments disposed on a second side of the mesa region opposite the first side of the mesa region.
8. The method of claim 1 , wherein the plurality of body region segments are a first plurality of body region segments, the plurality of source region segments are a first plurality of source region segments, the side of the mesa region is a first side of the mesa region,
the method further comprising:
forming a second plurality of body region segments disposed on a second side of the mesa region opposite the first side of the mesa region, the second plurality of body region segments alternating with a second plurality of source region segments along the second side of the mesa region.
9. The method of claim 1 , wherein the plurality of body region segments are a first plurality of body region segments, the plurality of source region segments are a first plurality of source region segments, the side of the mesa region is a first side of the mesa region,
the method further comprising:
forming a second plurality of body region segments disposed on a second side of the mesa region opposite the first side of the mesa region, the second plurality of body region segments alternating with a second plurality of source region segments along the second side of the mesa region such that a checkerboard pattern is defined on a top surface of the mesa region by the first plurality of body region segments, the second plurality of body region segments, the first plurality of source region segments, and the second plurality of source region segments.
10. An method, comprising:
a first trench and a second trench in a semiconductor region with a continuous mesa region defined between the first trench and the second trench;
a dielectric layer along a sidewall of each of the first trench and the second trench;
an electrode disposed in each of the first trench and the second trench;
a plurality of source region segments of a first conductivity type disposed in at least a portion of a side of the continuous mesa region; and
a plurality of body region segments of a second conductivity type disposed in the at least the side of the continuous mesa region, the plurality of body region segments defining an alternating pattern with the plurality of source region segments along the side of the continuous mesa region.
11. The method of claim 10 , further comprising:
forming a body contact enhancement disposed along a portion of the continuous mesa region, the continuous mesa region being a single mesa region.
12. The method of claim 10 , further comprising:
forming the plurality of source region segments using a first mask,
forming the plurality of body region segments using a second mask,
the first mask covering an area where the plurality of body region segments are formed and the second mask covering an area where the plurality of source region segments are formed.
13. The method of claim 10 , wherein the continuous mesa region spans at least two of the plurality of source region segments.
14. A method, comprising:
forming a first trench disposed in a semiconductor region and including a gate electrode;
forming a second trench disposed in the semiconductor region;
forming a mesa region disposed between the first trench and the second trench;
forming a channel region disposed in the mesa region;
forming a plurality of source region segments of a first conductivity type on a first side of the mesa region;
forming a plurality of body region segments of a second conductivity type alternating with the plurality of source region segments on the first side of the mesa region; and
forming a continuous source region disposed on a second side of the mesa region, the continuous source region being disposed above the channel region and having a length greater than a length of a source region segment of the plurality of source region segments, each of the plurality of body region segments being connected to the channel region, the channel region being a continuous region disposed below each of the plurality of source region segments.
15. The method of claim 14 , wherein each of the plurality of source region segments is connected, on the second side of the mesa region, with the continuous source region.
16. A method, comprising:
forming a first trench disposed in a semiconductor region and including a gate electrode;
forming a second trench disposed in the semiconductor region;
forming a mesa region disposed between the first trench and the second trench, the mesa region having a length aligned along a longitudinal axis orthogonal to a vertical axis aligned along a height of the mesa region;
forming a source region segment of a first conductivity type disposed in a first side of the mesa region, the source region segment being included in a plurality of source region segments, the plurality of source region segments being aligned along the longitudinal axis; and
forming a body region segment of a second conductivity type disposed in a second side of the mesa region opposite the first side of the mesa region and having a portion disposed above the source region segment, the body region segment being included in a plurality of body region segments, the plurality of body region segments being aligned along the longitudinal axis.
17. The method of claim 16 , wherein the source region segment is a first source region segment of the plurality of source region segments, the body region segment is a first body region segment of the plurality of body region segments,
the method further comprising:
forming a second source region segment disposed on the second side of the mesa region; and
forming a second body region segment disposed on the first side of the mesa region and having a portion disposed above the second source region segment.
18. The method of claim 17 , further comprising:
forming a third source region segment extending to a top of the mesa region and across a width of the mesa region.
19. The method of claim 17 , further comprising:
forming a third body region segment extending to a top of the mesa region and across a width of the mesa region, the third body region segment being aligned along the longitudinal axis at a location from the first source region segment.
20. The method of claim 16 , wherein the source region segment is a first source region segment of the plurality of source region segments,
the method further comprising:
forming a second source region segment extending to a top of the mesa region.
21. The method of claim 20 , further comprising:
forming a third source region segment extending to a top of the mesa region and across a width of the mesa region.
22. The method of claim 20 , wherein the body region segment is a first body region segment of the plurality of body region segments,
the method further comprising:
forming a second body region segment extending to a top of the mesa region and across a width of the mesa region, the second body region segment being aligned along the longitudinal axis at a location separate from the first source region segment.
23. The method of claim 16 , wherein the source region segment is a first source region segment of the plurality of source region segments,
the method further comprising:
forming a second source region segment extending to a top of the mesa region and across a width of the mesa region.
24. A method, comprising:
forming a first trench disposed in a semiconductor region and including a gate electrode;
forming a second trench disposed in the semiconductor region;
forming a mesa region disposed between the first trench and the second trench, the mesa region having a length aligned along a longitudinal axis orthogonal to a vertical axis aligned along a height of the mesa region;
forming a first source region segment of a first conductivity type disposed in a first side of the mesa region, the first source region segment being included in a plurality of source region segments;
forming a body region segment of a second conductivity type disposed in a second side of the mesa region opposite the first side of the mesa region, the body region segment being included in a plurality of body region segments, the plurality of body region segments being aligned along the longitudinal axis; and
forming a second source region segment disposed in the mesa region and having a portion extending across a width of the mesa region.
25. The method of claim 24 , wherein the second source region segment extends to a top of the mesa region.