Systems and methods for measurement of optical workpieces
An analytic tool for supporting alignment of an optical component in preparation for an interferometric test and performance of such a test. Apparatus and methods involve employment of the datum features on the optical component and/or metrology frame supporting such component. The metrology frame may include a secondary set of holograms (provided for use with a conventional system already employing a primary hologram that forms the testing optical wavefront). The conventional primary hologram is preferably substituted with a set of primary holograms (contained in the same, unitary or spatially-complementary housing sets) that perform different but complementary functions and that facilitate the alignment of the metrology frame with or without the tested optical component.
1. An apparatus for aligning an optical workpiece with a measurement system for measurement, the apparatus comprising:
the measurement system comprising:
a metrology system comprising a light source configured to produce light and a detector configured to detect return light; and
an optical system aligned with the optical metrology system, the optical system comprising:
an alignment hologram configured to produce alignment light in response to the light produced by the metrology system; and
a measurement hologram configured to produce measurement light in response to the light produced by the metrology system for measurement of the optical workpiece;
a measurement frame that locates the optical workpiece with respect to the measurement light produced by the measurement hologram for measurement of the optical workpiece; and
at least one alignment feature coupled to the measurement frame and configured to return the alignment light produced by the alignment hologram to the detector to align the measurement frame with respect to the measurement system.
2. The apparatus of claim 1 , wherein the metrology system is a wavefront sensor and the alignment light produced by the alignment hologram is an alignment wavefront and the measurement light produced by the measurement hologram is a measurement wavefront.
3. The apparatus of claim 2 , wherein the wavefront sensor comprises an optical interferometer.
4. The apparatus of claim 1 , wherein the optical system further comprises a second alignment hologram configured to return second alignment light to the detector in response to the light produced by the metrology system to align the optical system with respect to the metrology system.
5. The apparatus of claim 1 , wherein the measurement frame comprises at least one fiduciary feature configured to locate the optical workpiece with respect to the measurement frame for measurement of the optical workpiece.
6. The apparatus of claim 5 , wherein the at least one alignment feature is the at least one fiduciary feature.
7. The apparatus of claim 5 , wherein the at least one alignment feature is separate from the at least one fiduciary feature.
8. The apparatus of claim 1 , wherein the at least one alignment feature is on the measurement frame.
9. The apparatus of claim 1 , wherein the at least one alignment feature is on a removable optical component that is held in a position with respect to the measurement frame for the at least one alignment feature to return the alignment light from the alignment hologram to the detector to align the measurement frame with respect to the measurement system.
10. The apparatus of claim 9 , wherein the measurement frame comprises at least one fiduciary feature configured to locate the removable optical component with respect to the measurement frame to align the measurement frame with respect to the measurement system and configured to locate the optical workpiece with respect to the measurement frame for measurement of the optical workpiece.
11. The apparatus of claim 1 , wherein the measurement system comprises a plurality of measurement holograms that produce the measurement light, and the measurement frame is configured to simultaneously locate a plurality of optical workpieces with respect to the measurement light produced by the plurality of measurement holograms for measurement of the plurality of optical workpieces.
12. The apparatus of claim 11 , further comprising a plurality of fiduciary features coupled to the measurement frame to locate the plurality of optical workpieces with respect to the measurement frame for measurement of the plurality of optical workpieces.
13. The apparatus of claim 12 , further comprising a plurality of removable mounts comprising the plurality of fiduciary features, wherein the plurality of removable mounts are mounted to the measurement frame to locate the plurality of optical workpieces with respect to the measurement frame for measurement of the plurality of optical workpieces.
14. A method for aligning an optical workpiece with a measurement system for measurement, the method comprising:
positioning an optical system with respect to a metrology system in the measurement system, the metrology system comprising a light source configured to produce light and a detector configured to detect return light, the optical system comprising an alignment hologram configured to produce alignment light in response to the light produced by the measurement system and a measurement hologram configured to produce measurement light in response to the light produced by the measurement system for measurement of the optical workpiece;
aligning a measurement frame with respect to the measurement system based on the alignment light produced by the alignment hologram in response to the light produced by the metrology system and returned to the detector in the metrology system by at least one alignment feature that is coupled to the measurement frame; and
positioning the optical workpiece in the measurement frame, wherein the measurement frame locates the optical workpiece with respect to the measurement light produced by the measurement hologram in response to the light produced by the metrology system for measurement of the optical workpiece.
15. The method of claim 14 , metrology system is a wavefront sensor and the alignment light produced by the alignment hologram is an alignment wavefront and the measurement light produced by the measurement hologram is a measurement wavefront.
16. The method of claim 15 , wherein the wavefront sensor comprises an optical interferometer.
17. The method of claim 14 , wherein the optical system further comprises a second alignment hologram, the method further comprising aligning the optical system with respect to the metrology system by returning second alignment light produced by the second alignment hologram to the detector in response to the light produced by the metrology system.
18. The method of claim 14 , further comprising locating the optical workpiece with respect to the measurement frame for measurement of the optical workpiece with at least one fiduciary feature.
19. The method of claim 18 , wherein the at least one alignment feature is the at least one fiduciary feature.
20. The method of claim 18 , wherein the at least one alignment feature is separate from the at least one fiduciary feature.
21. The method of claim 14 , wherein the at least one alignment feature is on the measurement frame.
22. The method of claim 14 , further comprising holding a removable optical component comprising the at least one alignment feature in a position with respect to the measurement frame for aligning the measurement frame with respect to the measurement system.
23. The method of claim 22 , further comprising:
locating the removable optical component with respect to the measurement frame with at least one fiduciary feature on the measurement frame configured to locate for aligning the measurement frame with respect to the measurement system; and
locating the optical workpiece with respect to the measurement frame with the at least one fiduciary feature on the measurement frame for measurement of the optical workpiece.
24. The method of claim 14 , wherein the measurement system comprises a plurality of measurement holograms that produce the measurement light, and wherein the measurement frame simultaneously locates a plurality of optical workpieces with respect to the measurement light produced by the plurality of measurement holograms for measurement of the plurality of optical workpieces.
25. The method of claim 24 , further comprising locating the plurality of optical workpieces with respect to the measurement frame for measurement of the plurality of optical workpieces using a plurality of fiduciary features coupled to the measurement frame.
26. The method of claim 25 , wherein locating the plurality of optical workpieces with respect to the measurement frame comprises:
seating the plurality of optical workpieces in a plurality of removable mounts using the plurality of fiduciary features; and
mounting the plurality of removable mounts to the measurement frame to locate the plurality of optical workpieces with respect to the measurement frame for measurement of the plurality of optical workpieces.