CMP composition including anionic and cationic inhibitors
A chemical mechanical polishing composition for polishing tungsten or molybdenum comprises, consists essentially of, or consists of a water based liquid carrier, abrasive particles dispersed in the liquid carrier, an amino acid selected from the group consisting of arginine, histidine, cysteine, lysine, and mixtures thereof, an anionic polymer or an anionic surfactant, and an optional amino acid surfactant. A method for chemical mechanical polishing a substrate including a tungsten layer or a molybdenum layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten layer or the molybdenum layer from the substrate and thereby polish the substrate.
1 . A method of chemical mechanical polishing a substrate having a tungsten layer or a molybdenum layer, the method comprising:
(a) contacting the substrate with a polishing composition comprising:
(i) a water based liquid carrier;
(ii) abrasive particles dispersed in the liquid carrier;
(iii) an amino acid selected from the group consisting of arginine, histidine, cysteine, lysine, and mixtures thereof; and
(iv) an anionic polymer or an anionic surfactant, wherein the polishing composition further comprises an amino acid surfactant;
(b) moving the polishing composition relative to the substrate; and
(c) abrading the substrate to remove a portion of the tungsten layer or the molybdenum layer from the substrate and thereby polish the substrate.
2 . The method of claim 1 , further comprising:
an iron-containing accelerator;
a stabilizer bound to the iron-containing accelerator.
3 . The method of claim 1 , wherein the anionic polymer or the anionic surfactant comprises an anionic surfactant including an alkyl group and a negative charged sulfate or sulfonate group.
4 . The method of claim 1 , wherein:
the amino acid is selected from the group consisting of arginine, histidine, and mixtures thereof;
the anionic polymer or the anionic surfactant comprises an anionic surfactant including an alkyl group and a negative charged sulfate or sulfonate group; and
the amino acid surfactant comprises an amino acid group selected from the group consisting of glycine, alanine, arginine, histidine, lysine, aspartic acid, and glutamic acid.