CMP composition including anionic and cationic inhibitors
A chemical mechanical polishing composition for polishing tungsten or molybdenum comprises, consists essentially of, or consists of a water based liquid carrier, abrasive particles dispersed in the liquid carrier, an amino acid selected from the group consisting of arginine, histidine, cysteine, lysine, and mixtures thereof, an anionic polymer or an anionic surfactant, and an optional amino acid surfactant. A method for chemical mechanical polishing a substrate including a tungsten layer or a molybdenum layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten layer or the molybdenum layer from the substrate and thereby polish the substrate.
1. A chemical mechanical polishing composition comprising:
a water based liquid carrier;
abrasive particles dispersed in the liquid carrier;
an amino acid selected from the group consisting of arginine, histidine, cysteine, lysine, and mixtures thereof;
an amino acid surfactant; and
an anionic polymer or an anionic surfactant, wherein the anionic polymer is selected from the group consisting of polysulfonic acids, polyacrylic acids, and polyphosphoric acids, and further comprising:
an iron-containing accelerator from about 20 to about 2000 ppm Fe at point of use; and a stabilizer bound to the iron-containing accelerator, wherein the stabilizer comprises phosphoric acid, acetic acid, phthalic acid, citric acid, adipic acid, oxalic acid, malonic acid, aspartic acid, succinic acid, glutaric acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, maleic acid, glutaconic acid, muconic acid, ethylenediaminetetraacetic acid EDTA), propylenediaminetetraacetic acid (PDTA), and mixtures thereof.
2. The composition of claim 1 , further comprising a hydrogen peroxide oxidizer.
3. The composition of claim 1 , wherein the anionic polymer is a polysulfonic acid polymer selected from the group consisting of polyvinyl sulfonic acid, polystyrene sulfonic acid, poly(2-acrylamido-2-methylpropane sulfonic acid), poly(styrenesulfonic acid-co-maleic acid), and mixtures thereof.
4. The composition of claim 3 , wherein the anionic polymer is polyvinyl sulfonic acid (PVSA) or polystyrenesulfonic acid (PSSA).
5. The composition of claim 4 , wherein the amino acid is selected from the group consisting of arginine, histidine, and mixtures thereof.
6. The composition of claim 1 , wherein the anionic surfactant comprises an alkyl group and a negative charged sulfate or sulfonate group.
7. The composition of claim 1 , wherein the anionic surfactant is selected from the group consisting of disodium hexadecyldiphenyloxide disulfonate, ammonium lauryl polyoxyethylene ether sulfate, ammonium polyoxyethylene styrenated aryl sulfate, and combinations thereof.
8. The composition of claim 1 wherein the abrasive particles comprise anionic silica or anionic alumina.
9. The composition of claim 1 , wherein the amino acid surfactant comprises an amino acid group selected from the group consisting of glycine, alanine, arginine, histidine, lysine, aspartic acid, and glutamic acid.
10. The composition of claim 1 , wherein the amino acid surfactant comprises Triethanolamine N-Cocoyl-DL-alaninate, L-Arginine Cocoate, Glycine, N-methyl-N-(1-oxododecyl), and mixtures thereof.
11. The composition of claim 1 , comprising from about 100 ppm by weight to about 1000 ppm by weight of the anionic surfactant and about 30 ppm by weight to about 300 ppm by weight of the amino acid surfactant.
12. The composition of claim 1 , wherein:
the abrasive particles comprise anionic silica or anionic alumina;
the amino acid is selected from the group consisting of arginine, histidine, and mixtures thereof; and
the anionic polymer or the anionic surfactant comprises an anionic surfactant including an alkyl group and a negative charged sulfate or sulfonate group.
13. The composition of claim 12 , wherein the amino acid surfactant includes an amino acid group selected from the group consisting of glycine, alanine, arginine, histidine, lysine, aspartic acid, and glutamic acid.