IP Library Patent Application 60425323
Patent Application Provisional
App. No. 60/425,323 · Confirmation No. 3860

Model-based layout conversion method for double dipole lithography

Provisional Application Expired
⬇ PDF
Code Description Pages PDF
2002-11-12 TRNA Transmittal of New Application 2 View
2002-11-12 SPEC Specification 10 View
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Quick Facts
App. No.
60/425,323
Filed
2002-11-12