IP Library › Patent Application 60439807
Patent Application Provisional
App. No. 60/439,807 · Confirmation No. 8265

OPC mask design method for deep sub-wavelength optical lithography

Provisional Application Expired
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 Code Description Pages PDF
2003-01-14 TRNA Transmittal of New Application 1 View
2003-01-14 SPEC Specification 14 View
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Quick Facts
App. No.
60/439,807
Filed
2003-01-14