IP Library › Patent Application 60439808
Patent Application Provisional
App. No. 60/439,808 · Confirmation No. 8267

Method of optical proximity correction design & optimization for deep sub-wavelength contact hole mask

Provisional Application Expired
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 Code Description Pages PDF
2003-01-14 TRNA Transmittal of New Application 1 View
2003-01-14 SPEC Specification 10 View
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Quick Facts
App. No.
60/439,808
Filed
2003-01-14